Bluetooth Low Energy

A SEMINAR REPORT Submitted by

NITHIN THOMAS KANNANMANNIL

In partial fulfillment for the award of the degree Of

BACHELOR OF TECHNOLOGY
IN

ELECTRONICS AND COMMUNICATION ENGINEERING DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING MUSALIAR COLLEGE OF ENGINEERING AND TECHNOLOGY, PATHANAMTHITTA, KERALA-689653 MG UNIVERSITY: KOTTAYAM APRIL 2011

SPIN TORQUE TRANSFER RAM

A SEMINAR REPORT Submitted by

NITHIN THOMAS KANNANMANNIL

In partial fulfillment for the award of the degree Of

BACHELOR OF TECHNOLOGY
IN

ELECTRONICS AND COMMUNICATION ENGINEERING DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING MUSALIAR COLLEGE OF ENGINEERING AND TECHNOLOGY, PATHANAMTHITTA, KERALA-689653 MG UNIVERSITY: KOTTAYAM APRIL 2011
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MUSALIAR COLLEGE OF ENGINEERING AND TECHNOLOGY, PATHANAMTHITTA

BONAFIDE CERTIFICATE

This is to certify that the seminar report entitled SPIN TORQUE TRANSFER RAM has been submitted by NITHIN THOMAS KANNANMANNIL in partial fulfillment of the requirements for the award of degree of Bachelor of Technology in Electronics and Communication Engineering is a bonafide record of the work carried out by him under my guidance and supervision.

Prof. PAUL A J Head of the Department ECE, MCET

Asst.Prof.LIJESH L SUPERVISOR ECE, MCET

ACKNOWLEDGEMENT

First of all I express my thanks to GOD the Almighty for showering infinite blessing on me throughout the life and making me come up to this level. Also for the immense grace, that strengthened me through the successful completion of this seminar work. I wish to convey my deep sense of gratitude to our beloved and respected principal Dr. P G MATHEWS who helped me during the entire process of work. I express my heartfelt gratitude to our Head of the Department of Electronics and Communication Engineering, Prof .PAUL A J for the insight he has given for me which has resulted in this prestigious seminar of my career. I am grateful to my guide Mrs. DHANYA R, Assistant Professor, Department of Electronics and Communication Engineering, for the valuable help and service she has rendered to me and inspiring me during each stage of this work. Last but not the least I express my love and gratitude for all my friends who showed great support and help.

ABSTRACT
Spin-Transfer Torque RAM (STT-RAM) is an emerging non-volatile memory technology that is a potential universal memory that could replace SRAM in processor caches. Magneto resistive RAM (MRAM) is a non-volatile memory technology in which a bit is stored as the magnetic orientation of the free layer of a magnetic tunnel junction (MTJ). As the free layer needs no current to maintain its state.The MTJ results in a high or low current depending on whether the free layer is currently parallel or antiparallel to the magnetic orientation of the hard layer. STT-RAM is a form of MRAM that uses spin transfer torque to reorient the free layer by passing a large, directional write current through the MTJ. The emerging Spin Torque Transfer memory (STT-RAM) is a promising candidate for future on-chip caches due to STT-RAMs high density, low leakage, long endurance and high access speed. However, one of the major challenges of STT-RAM is its high write current, which is disadvantageous when used as an on-chip cache.

STT-RAM cell uses magnetic tunnel junction (MTJ) to store binary data. An mtj consists of two ferromagnetic layers reference layer and free layer and one tunnel barrier layer. The magnetic direction of reference layer is fixed, while the magnetic direction of free layer can be changed. The relative magnetization direction between the reference layer and free layer results in different resistance of MTJ, which is used to represent the binary data stored in the cell. When the magnetic field of the free layer and reference layer are parallel, the MTJ resistance is low representing a logical 0. When these two layers are in antiparallel direction, the MTJ resistance is high which represents a logical 1. STT-RAM combines the advantages of all conventional memory. It combines the speed of SRAM. It is cost effective and low-power memory solution like DRAM. There is no limit for write-read cycles and radiation-resistant. It has greater performance, reliability and scalability.

TABLE OF CONTENTS

Introduction

1.1 1.2 1.3

Non volatile RAM................................................................................................ 4 Spin .............................................................................................................................. 6 Spin Transfer

Introduction
1.4
Spintronics .................................................................................................................. 7 1.4.1 Metal based spintronics devices .....................................................................7 1.4.2 Semiconductor based spintronics devices ......................................................9 Tunnel Magneto resistance effect (TMR) .................................................................. 10 STTRAM .....................................................................................................................10

1.5 1.6

1.7 History .........................................................................................................................13 1.8 Universal memory concept ..........................................................................................14 2

Working of STTRAM

2.1 Spin torque transfer RAM ...........................................................................................15 2.2 Writing '0' and '1' ........................................................................................................ 16 2.3 Reading '0' and '1' ........................................................................................................18
Fabrication of STTRAM... 22

Research undergoing on STTRAM 23 Scope of STTRAM.. 28

Comparison with conventional memory RAM 30

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Applications STTRAM in Aviations and Military.. 32 IC designers benefits 34

Conclusions . 35
References...36

LIST OF FIGURES & TABLES FIGURE 1.2 : FIGURE 2.3 : FIGURE 4.1.1: FIGURE 4.1.2: FIGURE 4.1.3: SPIN .................................................................................................. MAGNETIC TUNNEL JUNCTION ................................................. NANOMAGNETS USED TO CONTROL THE SPIN ..................... 4 11 13

MATERIAL USED IN MTJ .............................................................. ...... 14 THE MTJ STATE CHANGES FROM PARALLEL TO ANTIPARALLEL ............................................................

FIGURE 4.1.4:

SIMULATION MODEL SYMBOL IN THE SPECTRE SIMULATOR..................................................................

FIGURE 4.1.5: FIGURE 4.1.6: FIGURE 4.1.7: FIGURE 4.1.8: FIGURE 4.2.1: FIGURE 4.2.2: FIGURE 4.2.3: FIGURE 4.2.4: FIGURE 4.2.5:

RESISTANCE EQUIVALENT CIRCUIT ....................................... STT-RAM ARCHITECTURE ......................................................... WRITING LOGIC 0 AND LOGIC 1 IN STT-RAM ......................... CONVENTIONAL MRAM AND STT-RAM................................... ION MILLING AND LIFT-OFF METHOD ..................................... STT-RAM OVERCOMING POWER TRADE OFF PROBLEM DC AND TRANSIENT SIMULATION ............................................ DC SIMULATION OF MTJ (PARALLEL) ...................................... TRANSIENT SIMULATION OF MTJ FOR PARALLEL AND ANTI-PARALLEL ............................................................................

15 15 16 18 19 20 21 21

22

FIGURE 6.4.1: FIGURE 6.4.2:

INPUT SPIN-LUT ARCHITECTURE

31

THE FULL SCHEMATIC OF SPIN-MTJ BASED NON-VOLATILE FLIP-FLOP (SPIN-FF). 31 MTJ MEMORY CELLS ARE IMPLEMENTED ABOVE THE CMOS CIRCUITS

FIGURE 6.4.3:

FIGURE 6.4.4: FULL LAYOUT (5.65UMx10.15UM) OF SPIN-FF ......................................... 32 TABLE 6.2.1 : STT-RAM PROTOTYPE VERSUS EXISTING MEMORY CHIP................... 28

LIST OF SYMBOLS & ABBREVIATIONS

1. : INTRINSIC MAGNETIC MOMENT OF THE SPIN

POLARIZED ELECTRON. 2. : 3. CMOS : 4. DRAM: 5. ESPV : 6. F: 7. FPGA : 8. GMR : 9. MCP : 10 MRAM : 11 MTJ : 12 NVRAM : 13 RAP : ANGSTROM=10-10 meters. COMPLEMENTARY METAL OXIDE SEMICONDUCTOR. DYNAMIC RANDOM ACCESS MEMORY. EXCHANGE-BIASED SPIN VALVES. FERMI= 10 -15 meters. FIELD PROGRAMMABLE GATE ARRAY. GAINT MAGNETO RESISTANCE. MULTI-CHIP PACKAGES. MAGNETIC RANDOM ACCESS MEMORY. MAGNETIC TUNNEL JUNCTIONS. NON- VOLATILE RANDOM ACCESS MEMORY. RESISTANCE INTRODUCED IN TMR DUE TO ANTI PARALLEL ACTION IN THE FREE FERROMAGNETIC LAYER. 14 Rp : RESISTANCE INTRODUCED IN TMR DUE TO PARALLEL ACTION IN THE FREE FERROMAGNETIC LAYER. 15 SPIN-LUT : 16 SPIN-FF : 17 SOC : . 18. SRAM : 19.STS: 20.STT-RAM: 21.TMR: 22.VLSI: STATIC RANDOM ACCESS MEMORY SPIN TRANSFER SWITCHING SPIN TORQUE TRANSFER RANDOM ACCESS MEMORY TUNNEL MAGNETO RESISTANCE VERY LARGE SCALE INTEGRATION SPIN LOOK UP TABLE. SPIN FLIP FLOP SYSTEM ON CHIP

CHAPTER-1:

BASIC TERMINOLOGIES
1.1

NON-VOLATILE RAM
Non-Volatile Random Access Memory (NVRAM) is the general name used to describe

any type of random access memory which does not lose its information when power is turned off. This is in contrast to the most common forms of random access memory today, DRAM and SRAM, which both require continual power in order to maintain their data. NVRAM is a subgroup of the more general class of non-volatile memory types, the difference being that NVRAM devices offer random access, like hard disks.

1.2

SPIN
In quantum mechanics, spin is a fundamental property of atomic nuclei, hadrons, and

elementary particles. For particles with non-zero spin, spin direction (also called spin for short) is an important intrinsic degree of freedom. As the name indicates, the spin has originally been thought of as a rotation of particles around their own axis. This picture is correct insofar as spins obey the same mathematical laws as do quantized angular momenta. On the other hand, spins have some peculiar properties that distinguish them from orbital angular momenta: spins may have half-integer quantum numbers, and the spin of charged particles is associated with a magnetic dipole moment in a way (g-factor different from 1) that is incompatible with classical physics.

The electron spin is the key to the Pauli Exclusion Principle and to the understanding of the periodic system of chemical elements. Spin-orbit coupling leads to the fine structure of atomic spectra, which is used in atomic clocks and in the modern definition of the fundamental unit second. Precise measurements of the g-factor of the electron have played an important role in the development and verification of quantum electrodynamics. Electron spins play an important role in magnetism, with applications for instance in computer memories. Manipulation of spins in semiconductor devices is the subject of the developing field of spintronics. The manipulation of nuclear spins by radiofrequency waves (nuclear magnetic resonance) is important in chemical spectroscopy and medical imaging. The photon spin is associated with the polarization of light. The head-on collision of a quark (red ball) from one proton (orange ball) with a gluon (green ball) from another proton with opposite spin, spin is represented by the blue arrows circling the protons and the quark. The blue question marks circling the gluon represent the question: Are gluons polarized? Ejected from the collision are a shower of quarks and a photon of light (purple ball).

Figure 1.2 SPIN Particles with spin can possess a magnetic dipole moment, just like a rotating electrically charged body in classical electrodynamics. These magnetic moments can be experimentally observed in several ways, e.g. by the deflection of particles by inhomogeneous magnetic fields in a Stern-Gerlach experiment, or by measuring the magnetic fields generated by the particles themselves. The intrinsic magnetic moment p of an elementary particle with charge q, mass m, and spin S, is Where the dimensionless quantity g is called the g-factor. For exclusively orbital rotations it would be 1. In ordinary materials, the magnetic dipole moments of individual atoms produce magnetic fields that cancel one another, because each dipole points in a random direction. Ferromagnetic materials below their Curie temperature, however, exhibit magnetic domains in which the atomic dipole moments are locally aligned, producing a macroscopic, non-zero magnetic field from the domain. These are the ordinary "magnets" with which we are all familiar.

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The study of the behavior of such "spin models" is a thriving area of research in condensed matter physics. For instance, the Ising model describes spins (dipoles) that have only two possible states, up and down, whereas in the Heisenberg model the spin vector is allowed to point in any direction. These models have many interesting properties, which have led to interesting results in the theory of phase transitions.

1.3 SPIN TRANSFER

Spin transfer is the phenomenon in which the spin angular momentum of the charge carriers (usually electrons) gets transferred from one location to another. This phenomenon is responsible for several important and observable physical effects. Most famously, spin polarized current passing into a nanoscale magnet tends to deposit some of its spin angular momentum into the magnet, thereby applying a large torque to the magnetization. This enables magnetic manipulations far more efficiently than can be achieved with magnetic fields alone, especially as device applications shrink in scale. In the hard disk industry, where a series of nanoscale magnetic layers called a spin valve is often used to measure the small local magnetic fields above the disk surface, this is an undesirable effect, as it hinders the ability to measure the state of the valve without disturbing it. In the MRAM industry, however, this effect may prove incredibly useful in reducing power consumption.

CHAPTER 2:

INTRODUCTION
2.1. SPINTRONICS:
Spintronics (a neologism meaning "spin transport electronics"), also known as magneto electronics, is an emerging technology which exploits the intrinsic spin of electrons and its associated magnetic moment, in addition to its fundamental electronic charge, in solid-state devices. Electrons are spin-1/2 fermions and therefore constitute a two-state system with spin "up" and spin "down". To make a spintronic device, the primary requirements are to have a system that can generate a current of spin polarized electrons comprising more of one spin species - up or down - than the other (called a spin injector), and a separate system that is sensitive to the spin polarization of the electrons (spin detector). Manipulation of the electron spin during transport between injector and detector (especially in semiconductors) via spin precession can be accomplished using real external magnetic fields or effective fields caused by spin-orbit interaction.

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Spin polarization in non-magnetic materials can be achieved either through the Zeeman Effect in large magnetic fields and low temperatures, or by non-equilibrium methods. In the latter case, the non-equilibrium polarization will decay over a timescale called the "spin lifetime". Spin lifetimes of conduction electrons in metals are relatively short (typically less than 1 nanosecond) but in semiconductors the lifetimes can be very long (microseconds at low temperatures), especially when the electrons are isolated in local trapping potentials (for instance, at impurities, where lifetimes can be milliseconds).

9.1 2.1.1

Metals-based spintronic devices

The simplest method of generating a spin-polarized current in a metal is to pass the current through a ferromagnetic material. The most common application of this effect is a Giant Magneto Resistance (GMR) device. A typical GMR device consists of at least two layers of ferromagnetic materials separated by a spacer layer. When the two magnetization vectors of the ferromagnetic layers are aligned, the electrical resistance will be lower (so a higher current flows at constant voltage) than if the ferromagnetic layers are anti-aligned. This constitutes a magnetic field sensor. Two variants of GMR have been applied in devices: Current-In-Plane (CIP), where the electric current flows parallel to the layers. Current-Perpendicular-to-Plane (CPP), where the electric current flows in a direction perpendicular to the layers. Other metals-based spintronics devices: Tunnel Magneto Resistance (TMR), where CPP transport is achieved by using quantummechanical tunneling of electrons through a thin insulator separating ferromagnetic layers. Spin Torque Transfer, where a current of spin-polarized electrons is used to control the magnetization direction of ferromagnetic electrodes in the device.

9.1.1 The storage density of hard drives is rapidly increasing along an exponential
growth curve, in part because spintronics-enabled devices like GMR and TMR sensors have increased the sensitivity of the read head which measures the magnetic state of small magnetic domains (bits) on the spinning platter. The doubling period for the areal density of information storage is twelve months, much shorter than Moore's Law, which observes that the number of transistors that can cheaply be incorporated in an integrated circuit doubles every two years.

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MRAM, or magnetic random access memory, uses arrays of TMR or Spin torque transfer devices. MRAM is nonvolatile (unlike charge-based DRAM in today's computers) so information is stored even when power is turned off, potentially providing instant-on computing. Motorola has developed a 256 kb MRAM based on a single magnetic tunnel junction and a single transistor. This MRAM has a read/write cycle of fewer than 50 nanoseconds. Another design in development, called Racetrack memory, encodes information in the direction of magnetization between domain walls of a ferromagnetic metal wire.

9.2 2.1.2

Semiconductor-based spintronic devices

In early efforts, spin-polarized electrons are generated via optical orientation using circularly-polarized photons at the band gap energy incident on semiconductors with appreciable spin-orbit interaction (like GaAs and ZnSe). Although electrical spin injection can be achieved in metallic systems by simply passing a current through a ferromagnet, the large impedance mismatch between ferromagnetic metals and semiconductors prevented efficient injection across metal-semiconductor interfaces. A solution to this problem is to use ferromagnetic semiconductor sources (like manganese-doped gallium arsenide GaMnAs), increasing the interface resistance with a tunnel barrier, or using hot-electron injection. Spin detection in semiconductors is another challenge, which has been met with the following techniques: Faraday/Kerr rotation of transmitted/reflected photons Circular polarization analysis of electroluminescence Nonlocal spin valve (adapted from Johnson and Silsbee's work with metals) Ballistic spin filtering The latter technique was used to overcome the lack of spin-orbit interaction and materials issues to achieve spin transport in Silicon, the most important semiconductor for electronics. Because external magnetic fields (and stray fields from magnetic contacts) can cause large Hall effects and magneto resistance in semiconductors (which mimic spin-valve effects), the only conclusive evidence of spin transport in semiconductors is demonstration of spin precession and de-phasing in a magnetic field non-collinear to the injected spin orientation. This is called the Hanle effect.

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Advantages of semiconductor-based spintronics applications are potentially lower power use and a smaller footprint than electrical devices used for information processing. Also, applications such as semiconductor lasers using spin-polarized electrical injection have shown threshold current reduction and controllable circularly polarized coherent light output. Future applications may include a spin-based transistor having advantages over MOSFET devices such as steeper sub-threshold slope.

2.2

TUNNEL MAGNETORESISTANCE EFFECT (TMR)

In physics, the Tunnel Magneto Resistance effect (TMR), occurs when a current flows

between two ferromagnets separated by a thin (about 1 nm) insulator. Then the total resistance of the device, in which tunneling is responsible for current flowing, changes with the relative orientation of the two magnetic layers. The resistance is normally higher in the anti-parallel case. The effect is similar to Giant Magneto Resistance except that the metallic layer is replaced by an insulating tunnel barrier.

2.3

STT-RAM
STT-RAM is underway to fine tune a digital-data-recording technology, which will lead to

durable, high density memory chips impervious to radiation and capable of virtually unlimited read/write cycles called SPIN TRANSFER TORQUE RANDOM ACCESS MEMORY (STTRAM) chips, the devices are expected to be cost-competitive with conventional magnetic memory chips and provide a "revolution in military and space electronics". STT-RAM chips use SPINTRONICS, a technology that controls the spin of an electron to record binary data- the zeroes and ones of digital language. (Spintronics is short for "spin electronics"). An STT-RAM chip is somewhat similar, in manufacture at least, to the conventional magnetic memory chips used in computers known as SRAM (STATIC RANDOM ACCESS MEMORY), DRAM (DYNAMIC RANDOM ACCESS MEMORY) and MRAM

(MAGNETORESISTIVE RANDOM ACCESS MEMORY-a relatively recent nonvolatile chip technology), and to NOR and NAND flash memory chips. Toward the end of the manufacturing process, however, a magnet and thin film structure are added to the chip. Rather than using a magnetic field to write zeroes and ones as with conventional chips, an STT-RAM chip records digital data by passing a current through the magnet and then over the film structure, which is about 700A thick. As the current moves through the magnet, it becomes polarized. Transferring the current through a pre-layer of film 20A thick creates torque. The torque changes the direction of the polarized current and the orientation of the pre-layer to the film below.

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By adjusting the current that passes through the magnet, it can be made to move the pre-layer in parallel or low- resistance direction to the film, which is recorded zero. If the current is adjusted so the pre-layer moves counter parallel or in a high-resistance direction to the film, a one recorded. STT-RAM is a novel nonvolatile memory which utilizes spin torque transfer magnetization switching, the spin-RAM is programmed by magnetization reversal through an interaction of a spin momentum-torque-transferred current and a magnetic moment of memory layers in Magnetic Tunnel Junctions (MTJs), and therefore an external magnetic field is unnecessary as that for a conventional MRAM. In this spin transfer torque switching technique, data is written by re-orienting the magnetization of a thin magnetic layer in a Tunnel Magneto Resistance (TMR) element using a spin-polarized current. An electrical current is generally unpolarized (consisting of 50% spin-up and 50% spin-down electrons), a spin polarized current is one with more electrons of either spin. By passing a current through a thick magnetic layer one can produce a spin polarized current. It uses currents of spin-aligned electrons (spin-polarized currents) rather than fixed magnetic fields for processing and storing information. Spin-polarized currents can be generated by driving a current through a ferromagnetic layer. If the ferromagnetic electrode has a magnetization aligned in one direction, the magnetic moments of electrons passing through it become aligned in the same direction. It was theoretically predicted that such a spin-polarized current could transfer its angular momentum to a second magnetic layer and therefore switch the magnetization of this second layer into an alignment parallel with the reference layer, provided the dimensions of the device are about 100 nm or less. Further research into the STT phenomena has led to new materials and the replacement of metallic films with MTJs. MTJ resistance levels can be adjusted through material selection and MTJs also provide greater difference between the resistance states of the cell. Operation at room temperature has been reported using Aluminum Oxide as the tunneling barrier, and more recent efforts with Magnesium Oxide have shown promise for a reduction in power. Based on innovations in the MTJ, it is quite possible to develop a very compact and scalable memory that exploits spin and avoids the circuit issues surrounding prior art. With the optimal choice of materials, this STT memory would have fast read/write and be non-volatile, low power, and scalable. It would also be uncomplicated to fabricate and could conceivably be done in a silicon foundry if the process and materials were designed for compatibility as well. This seeks innovative research proposals for achieving a STT technology for dense solid-state memories for defense applications.

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Storage Layer ___ Tunnel Barrier -----Reference Layer ---------

Pinning layer

'0 "state

Magnetic Field (Oe)

Figure 2.3: Magnetic tunnel junction. Resistance is low when the magnetization of the reference and storage layer is aligned in same direction and high when the layers aligned in opposite direction.

CHAPTER 3:

HISTORY
Prior research in micro-magnetic and spintronics has led to the exploitation of Giant Magneto Resistance (GMR) effects for rotating magnetic disk drive memories, as well as Magnetic Tunneling Junctions (MTJ) for Magnetic Random Access Memory (MRAM). The Spin-Torque Transfer (STT) switching effect is a new physics phenomenon that exploits magnetic spin states to electrically change the magnetic orientation of a material that was theoretically predicted in 1996 and first demonstrated in metallic thin films as recently as 2000. Although STT switching currents were initially orders of magnitude too high for application in practical devices, Grandis was founded in 2002 with the goal of developing a novel non-volatile

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memory technology that applies the many benefits of STT switching to Magnetic Tunnel Junctions (MTJs). Researchers at Grandis undertook pioneering research in spintronics and pursued new magnetic materials and innovative MTJ structures to lower STT switching currents. Through these advances in materials research, coupled with its extensive modeling, simulation, integration, cell architecture, circuit and system design capabilities, Grandis has developed a package that enables its licensees to incorporate stand-alone or embedded STT-RAM nonvolatile memory into their products. The prototype chips are available for testing. The different companies are working hard to reduce Time-To-Market. The STT-RAM will be available in the market by this year or by 2010.

CHAPTER 4:

WORKING OF STT-RAM
4.1 SPIN-TRANSFER TORQUE RAM as universal memory
Nanomagnet are used to control the spin. By passing electrons through the nanomagnet, the spin of the the in same electrons can be aligned magnetization direction As shown in Figure Tunnel

as the nanomagnet. 4.1.1, below a

Magnetic

Page 14

Junction (MTJ) is at the heart of a STT-RAM bit cell. The MTJ consists of two ferromagnetic electrodes with a thin insulating layer in-between. The top nanomagnet is the storage layer or "free" layer; the middle is the barrier; and the bottom nanomagnet is the reference or "pinned" layer or spin filter.

Figure 4.1.1: Nanomagnets used to control the spin.

Spin Transfer Switching (STS) changes the MTJ's state from antiparallel or "1" to parallel or "0" and vice versa. This is performed by running current from the top to the bottom of the MTJ and vice versa. An STT-RAM chip addresses each bit individually by flowing current directly through the bit. Consequently, unintended writing errors are completely eliminated. A conventional CMOS transistor below the MTJ produces the current. In this instance, switching is performed via spin polarized currents. By polarizing the current, data is passed from the fixed MTJ layer that is the polarizer to the free MTJ layer. The materials used as ferromagnet in MTJ is CoFe and the layer in between the ferromagnet i.e., tunnel barrier layer is made of AlxO or MgO, as shown in figure4.1.2 below.

Figure 4.1.2: Material used in MTJ.

TMR= (Rap-Rp) / R a p , Tunnel Magneto Resistance Ratio

CoFe CoFe

CoFe CoFe

CoFe CoFe

CoFe CoFe

Figure 4.1.3: The MTJ state changes from Parallel (P) to Antiparallel (AP) if the positive direction current density I>Ic, on the contrast, its state will return if the negative direction current density I > Ic. Where Ic is critical current density.
This process is called spin-transfer torque switching. Current running through the fixed layer polarizes the electrons. Those polarized electrons then affect the switching of the free layer, hence the parallel and anti-parallel configurations. Unlike the STT-RAM cell that exploits electron spins for writing, the conventional MRAM cell, shown in Figure 4.1.8 at 20 to 30 F2 cell size uses a magnetic field to perform switching. When the cell is activated, the bit line and write word line become active with current pulses flowing through them, thus creating a magnetic field around the bit.

Figure. 4.1.4 Simulation model symbol in the specter simulator. Figure 4.1.5: Resistance equivalent circuit

Figure-4.1.6! STT-RAM architecture.

Figure 4.1.7: STT-RAM writing logic 0 and logic 1- it addresses each bit individually by flowing current directly through the bit. Unintended writing errors are completely eliminated.

It is this magnetic field that changes the state of the bit from "1" to "0" and vice versa. The scalability issue is exacerbated as a conventional MRAM chip is subjected to increasingly smaller geometries. As feature size shrinks, more current is required to create the magnetic field. In a conventional MRAM cell, conductors or wires above and below the MTJ are used to
generate the fields necessary to switch the state of the free magnetic layer. The additional write word line and bypass line required in this cell geometry translate into a more complicated architecture. Hence, more lithographic steps and a more costly manufacturing process are required.

Each conductor or wire requires a minimum of 5 to 10 mill amperes (mA) of current to perform a switch. Conversely, STT-RAM technology incurs a considerably lower switching current on the order of 100 microamperes, as a result of its more efficient spin-transfer torque techniques. A cell's thermal instability can erroneously trigger random switching to the opposite state. This means the cell stability in conventional MRAM demands an increasingly higher current flowing in the conductors or wires to efficiently switch states. Due to this bit or write disturbance, the number of bad bits in conventional MRAM is very high. Consequently MRAM vendors must resort to redundancy architectures with as much as 25 percent redundancy. Shown at a cell size of 6 F2, the STT-RAM cell, Figure 4.1.8 on the other hand, does not require the metal wire below the MTJ. The write word line, bypass line, and cladding associated with the conventional MRAM cell are eliminated. Instead, current flows perpendicular through the MTJ memory cell. As STT-RAM technology is scaled and its cells become increasingly smaller, the cross-sectional area becomes smaller and smaller.

20-30 P

Wrti Wyd Liu ( Pint-genenttoo WRAM cdl it* STT-RAM c*l Figure-4.1.8: Conventional MRAM and STT-RAM cell - Magnetic field, generated by the bit line and write word line, is used to switch between the '0' and '1' states. STT-RAM cell by eliminating the write word line and bypass line, it is considerably smaller than the first generation MRAM cell. Because STT-RAM uses a current running through the cell, the required writing current that flows through the smaller MTJs decreases. As a result, STT-RAM has superior scaling properties. That is the reason total required current in STT-RAM continues to be considerably less with

increasingly smaller geometries, whereas in conventional MRAM, the required switching current increases with scalability, as shown in Figure 4.2.2. Attempts have been made to correct the half-select bit write disturbance issue with conventional MRAM by modifying its bit cell. One such technique is the toggle MRAM bit cell. Its intent is to increase the operating window of the write operation. The objective is to create a significant margin between the level of fields required for switching all bits and the level at which write disturbs occur. The toggle MRAM bit cell adds a second free magnetic layer and an anti-ferro-magnetic coupling layer above the first free magnetic layer. Studies performed by the conventional MRAM vendor reveal an increasing percentage of bits properly switch as a result of applying the new toggle MRAM bit cell. However, it incurs higher currents (nearly 2X higher) and tighter thickness control is required (control within one atomic layer). DC and transient simulations have been performed to verify the bias-voltage dependent resistance, TMR effect, the switching current and performance from parallel configuration (P) to antiparallel configuration (AP) and AP to P (see Figure 4.2.3 to 4.2.5).

4.2 FABRICATION OF STT-RAM:

The fabrication of STT-RAM is done using Ion-milling and Lift-off Method.

Figure 4.2.1: ION MILLING AND LIFT-OFF METHOD

Figure 4.2.2: STT-RAM overcoming power trade off problem - "Total required current in STT-RAM continues to scale lower with increasingly smaller geometries. Conversely, conventional MRAM switching current increases with smaller geometries.

Figure 4.2.3: DC and Transient simulation.

{SUM I:IF.OS:IIP>

Parallel

Anti-Parallel

Figure 4.2.5 Transient simulation of MTJ, the critical current is about 153.206uA for parallel and -221.202uA for anti-parallel

CHAPTER5: RESEARCH UNDERGOING ON STT-RAM IN DIFFERENT ORGANISTION

A NOVEL NONVOLATILE MEMORY WITH SPIN TORQUE TRANSFER MAGNETIZATION SWITCHING: SPIN-RAM: Hosomi, M. Yamagishi, H. Yamamoto, T. Bessho, K. Higo, Y. Yamane, K. Yamada, H. Shoji, M. Hachino, H. Fukumoto, C. Nagao, H. Kano, H. Sony Corp., Kanagawa;This new programming mode has been accomplished owing to tailored MTJ, which has an oval shape of 100 times 150 nm. The memory cell is based on a 1-transistor and a 1-MTJ structure. The 4kbit spin-RAM was fabricated on a 4 level metal, 0.18 mum CMOS process. In this work, writing speed as high as 2 ns, and a write current as low as 200 muA were successfully demonstrated.

NANOELECTRONIC S RESEARCH INSTITUTE- JAPAN: To realize a large capacity Magnetic Random Access Memory (MRAM) that uses spintransfer switching for writing, it is essential to evaluate thermal durability and intrinsic critical currents correctly. Here, we examined the theoretically predicted logarithmic relationship between critical currents of spin-transfer switching and duration of injected pulsed currents using Giant Magneto Resistive (GMR) samples with different magnetic materials, e.g., Co, Co-Fe25, and CoFeB. This relationship was verified for the samples by giving reasonable thermal- durability coefficients and intrinsic critical currents as fitting parameters. We found that thermal durability was underestimated when an effective magnetic field acted on magnetic memory cells antiparallel to their magnetization. We then experimentally demonstrated that thermal assistance in spin-transfer switching decreased with increasing thermal durability.

 GRANDIS INC., 1123 CADILLAC COURT, MILPITAS, CALIFORNIA: Dual Magnetic Tunnel Junction (MTJ) structures consisting of two MgO insulating barriers of different resistances, two pinned reference layers aligned antiparallel to one another, and a free layer embedded between the two insulating barriers have been developed. The electron transport and spin dependent resistances in the dual MTJ structures are accounted for by sequential tunneling with some spin-flip relaxation in the central electrode (the free layer). With a tunneling magneto resistance ratio of 70%, a switching current density Jc (at 30 ms) of 0.52 MA/cm2 is obtained, corresponding to an intrinsic value of Jc0 (at 1ns) of 1.0 MA/cm2. This value of Jc0 is 2-3 times smaller than that of a single MgO insulating barrier MTJ structure and results from improvements in the spin-transfer torque efficiency. The asymmetry between

Jc and Jc
AP

mP

are significantly improved, which widens the read-write margin for

memory device design. In addition, the experimental results show that the switching current density can be further reduced when an external field is applied along the hard axis of the free layer. Grandis is looking for STT-RAM to replace existing memory technologies at 45nm and beyond. Since most processing at such advanced technology nodes is done on 300mm MTJ wafers.

JAPAN SCIENCE AND TECHNOLOGY AGENCY, SENDAI 980-8579, JAPAN: SUBSTANTIAL REDUCTION OF CRITICAL CURRENT FOR MAGNETIZATION

SWITCHING IN AN EXCHANGE-BIASED SPIN VALVEGreat interest in current-induced magnetic excitation and switching in a magnetic nanopillar has been caused by the theoretical predictions11, 12 of these phenomena. The concept of using a spin-polarized current to switch the magnetization orientation of a magnetic layer provides a possible way to realize future 'current-driven' devices13: in such devices, direct switching of the magnetic memory bits would be produced by a local current application, instead of by a magnetic field generated by attached wires. Until now, all the reported work on current- induced magnetization switching has been concentrated on a simple ferromagnet/Cu/ferromagnet trilayer. Here we report the observation of current-induced magnetization switching in Exchange-Biased Spin Valves (ESPVs) at room temperature. The ESPVs clearly show current- induced magnetization switching behavior under a sweeping direct current with a very high density. We show that insertion of a ruthenium layer between an ESPV nanopillar and the top electrode effectively decreases the critical current density

from about 108 to 107 Acm-2. In a well-designed 'antisymmetric' ESPV structure, this critical current density can be further reduced to 106 Acm-2. We believe that the substantial reduction of critical current could make it possible for current-induced magnetization switching to be directly applied in spintronic devices, such as magnetic random-access memory.

VORTEX POLARITY SWITCHING BY A SPIN--POLARIZED CURRENT Jean-Guy Caputo, Yuri Gaididei, Franz G. Mertens, Denis D. Sheka The spin-transfer effect is investigated for the vortex state of a magnetic nanodot. A spin current is shown to act similarly to an effective magnetic field perpendicular to the nanodot. Then a vortex with magnetization (polarity) parallel to the current polarization is energetically favorable. Following a simple energy analysis and using direct spinlattice simulations, we predict the polarity switching of a vortex. For magnetic storage devices, an electric current is more effective to switch the polarity of a vortex in a nanodot than the magnetic field.

DISTRIBUTION

OF

THE

MAGNETIZATION

REVERSAL

DURATION

IN

SUBNANOSECOND SPIN-TRANSFER SWITCHING T. Devolder, C. Chappert, J. A. Katine, M. J. Carey, and K. Ito Institute d'Electronic Fundamental, CNRS UMR 8622, University Paris Sud, Bat, 220, 91405 Orsay, France. Hitachi Cambridge Laboratory, Hitachi Europe, Ltd., Cavendish Laboratory, Madingley Road, Cambridge CB3 0HE, United Kingdom. Hitachi GST, San Jose Research Center, 650 Harry Road, San Jose, California 95120, USA.

The experimental distribution of switching times in spin-transfer switching induced by sub-ns current pulses in a pillar-shaped spin valve, whose free layer easy axis is parallel to the spin polarization of the current. The pulse durations leading to successful switching events follow a multiply stepped distribution. The step positions reflect the precessional nature of the switching. Modeling indicates that the switching proceeds through an integer number of gradually amplified precession cycles. This number is determined by the initial magnetization state. The switching probability distribution can be modeled considering the thermal variance of the initial magnetization

orientation and by analyzing the occurrence of a vanishing total torque condition in the set possible magnetization trajectories. Modeling helps us to understand why switching cannot happen with a reproducible sub-ns duration when the free layer easy axis is parallel to the spin polarization of the current. To circumvent that problem, we propose to bias the spin valve with a hard axis field, which could provide an increased reproducibility of the switching duration.

A NOVEL SPRAM (SPIN-TRANSFER TORQUE RAM) WITH A SYNTHETIC FERRIMAGNETIC FREE LAYER FOR HIGHER IMMUNITY TO READ DISTURBANCE AND REDUCING WRITE-CURRENT DISPERSION: Miura, K. Kawahara, T. Takemura, R. Hayakawa, J. Ikeda, S. Sasaki, R. Takahashi, H. Matsuoka, H. Ohno, H.Hitachi Ltd., Tokyo; A novel SPRAM (spin-transfer torque RAM) consisting of MgO-barrier-based Magnetic Tunnel Junctions (MTJs) with a Synthetic Ferromagnetic (SyF) structure in a free layer was demonstrated for both higher immunity to read disturbance and a sufficient margin between the read and write currents. Since magnetization of the free layer becomes stable against thermal fluctuation with increasing thermal-stability factor E/kBT, the SyF free layer of the MTJs realized magnetic information retention of over 10 years due to its high E/kBT of 67. Furthermore, it was found that the SyF free layer has an advantage of reducing dispersion of write-current density Jc, which is necessary for securing an adequate margin between the read and write currents.

CHAPTER 6:

SCOPE OF STT-RAM

6.1.

ADVANTAGES

OF

STT-RAM

CHIPS

OVER

CONVENTIONAL CHIPS
The magnetic film on which digital data are recorded in conventional chips is prone to "write disturbance" under some conditions, which affects accuracy and retention. But this is not in case of STT-RAM. Conventional magnetic films have a scalability problem, this not in case of STT-RAM. STT-RAM chip use less current as the technology becomes smaller in size, so their cells can shrink with no tradeoffs in power. This is all dependent on the concept "more current is needed as the chip sizes shrink to create magnetic film, which makes the cell size bigger because a higher current requirement affects the size of transistors". STT-RAM technology is the front runner because it offers embedded designers the best of all worlds. An external magnetic field is unnecessary as that for a conventional MRAM. The STT-RAM chips comparatively require less power than conventional chips. 1.2V is enough to run STT-RAM chip, where as DRAM chips require 2V, a NOR flash memory chip needs 6-8V and a NAND chip uses 16-20V. In terms of speed STT-RAM write as fast as 2 nanosecond, which is comparable to MRAM chips. The read/ write cycle for all practical purposes infinite (in excess of 10 15- 1,000 trillioncycles). The user won't need to move data from one format to another when using STT-RAM, because it as the ability to work with virtually all systems equally well.

6.2. STT-RAM versus other Conventional Memory Chip

As shown in Table 6.2.1 below, STT-RAM technology will provide embedded designers better features compared with conventional memory technologies and future "universal memory" candidates. With a two nanosecond (ns) write time, STT-RAM is as fast as SRAM, which currently has a write time ranging from 1 to 100 ns, depending on the technology used. As far as cell size, STT-RAM fares much better than SRAM cell size. When STT-RAM reaches the 32 nm technology node, the cell will be equal to or smaller than DRAM or NOR flash.

ftHAH Flash(N0A) Nan-volatilit y

Cell Silt

Y i Y Y 1640 6 1? 16 34 I D 3-20 20-50 2080 3-1S 3 20 JO/30 SO/SO lnVlOrns >10 10U I011 Mid-Htgh Low Hid High Refre None None Hone None 10*

Re1d Time Write/ Efatc Time (nj) Endurance

Write power

Other power MOS Subsh consumption tfrHltttt tea it curat

It has the capacity to preserve data under radiation and other hazards. Table 6.2.1-Overall STT-RAM is superior to other memory technologies. Today, STT-RAM can replace both NOR flash and SRAM in many embedded

applications. Non-volatile storage uses NOR flash for storing code, with that data being transferred to SRAM acting as buffer or cache memory. Low-end cell phones for example use both NOR and SRAM, which can easily be replaced with a single STT-RAM chip.

Comparing STT-RAM with recent universal memory candidates, read and write/erase time are each at 2 to 20 nanoseconds (ns) for STT-RAM, while phase-change RAM (PRAM) takes 20 to 50 ns for a read, 30 ns for write. Further, STT-RAM endurance is unlimited at >1015 while PRAM is less than 1012. Although it is not a new technology, PRAM has recently received considerable attention. A number of leading semiconductor companies are investing in PRAM and developing their own sets of IP. While it is an admirable technology, PRAM has limited endurance and slow speed compared with STT-RAM. Chalcogenide material, usually Ge2Sb2Te5 also known as GST, is used in a PRAM for data storage. The PRAM uses the reversible phase change between the crystalline and amorphous states of Chalcogenide GST by applying heat. Crystalline GST has low resistivity and amorphous GST has high resistivity. The data "0" corresponds to the crystalline state, while data "1" is associated with the amorphous state. Switching time between states is larger than 20 ns, which means PRAM cannot replace SRAM since it is considerably slower. The time required to reset the state of the bit must be made long. If it is not, the phase change material cools too fast to achieve the crystalline state. Further, due to the constantly changing of the phases and the heat applied to them, there is material degradation and therefore limited endurance. RRAM, or resistive memory, relies on a resistance change caused by an electric field. It is in an earlier state of development compared with PRAM, but suffers similar problems in terms of reliability and endurance. In addition, the switching mechanisms involved in the many proposed RRAM materials are not well understood. FRAM, or ferroelectric RAM, uses a ferroelectric material to store a polarization. It suffers from limited read endurance and a destructive read process. Also, its endurance of around 1012 cycles, while suitable for a flash replacement, cannot be used as universal memory.

6.3. STT-RAM Application Outlook:

STT-RAM is a disruptive technology that can revolutionize the performance of products in many areas, from consumer electronics and personal computers to automotive, medical, military and space. It also has the potential to create new sectors in the semiconductor industry and enable entirely new products not yet envisaged. STT-RAM has key initial markets replacing embedded technologies such as SRAM, Flash and DRAM, and providing new functionality at 65 nm and beyond. In automotive applications, it has higher speed and lower power than Flash and is denser than SRAM. In portable and handset applications, it can eliminate Multi-Chip Packages (MCPs), provide a unified memory subsystem, and reduce system power consumption for extended battery life. In personal computers, it can replace SRAM for high-speed cache, Flash for non-volatile cache, and PSRAM and DRAM for high-speed program execution.

6.4. STT-RAM in AVIONICS and MILITARY Application:

We have investigated two non-volatile logic circuits based on Spin-MTJ for Field Programmable Gate Array (FPGA) and System On Chip (SOC). The first one is a Spin-MTJ based non-volatile Look Up Table (Spin-LUT) (Figure 6.4.1). Working as a programmable and reconfigurable logic function generator, it memorizes all the configuration data in the MTJ arrays; and thus allows the FPGA logic circuit to reduce significantly its start-up latency from some microseconds down to some nanoseconds. It also allows realizing a sub-ns dynamical reconfiguration of the LUT during the signal processing. Spin-LUT non-volatile logic circuit has great potential in the field of complex logic digital system such as high performance game console and radar signal processing. The second one is Spin-MTJ based non-volatile Flip-Flop (Spin-FF) (Figure 6.4.2), data register and synchronizer, it stores permanently all the intermediate data processed in the FPGA or SOC circuit, thereby improves the data security and enable the complex logic system to restart immediately. Spin-FF could be advantageously used in the field of aviation and space where the security of data is one of the most important considerations. The lower critical current of STT writing approach makes these logic circuits work in less power and occupy smaller chip surface than with other writing techniques. Therefore the reduction of critical current has a strong impact on the performance of these Spin-MTJ based non-volatile logic circuits. Another advantage of Spin-MTJ

technology is that the storage element does not take much die area, because it is processed over the chip surface (see Figure 6.4.3). By using STMicroelectronics 90nm CMOS technology and a behavior Spin-MTJ simulation Model, Spin-LUT and Spin-FF have been demonstrated that they could work with high speed performance and small layout surface.

Figure 6.4.1: Input Spin-LUT architecture

Figure 6.4.2: The full schematic of Spin-MTJ based Non-Volatile Flip-Flop (Spin -FF)

Figure 6.4.4: Full layout (5.65umx10.15um) of Spin-FF, MTJs are placed above the two points ML and MR, see also Figure 14

6.5. IC DESIGNERS BENEFITS:

STT-RAM is a more appropriate technology for future MRAM produced using ultra-fine processes and can be efficiently embedded in subsequent generations of such semiconductor devices as FPGAs, microprocessors, microcontrollers and Systems-On-Chip (SOC). A special bonus for embedded designers is the fact that the internal voltage STT-RAM requires is only 1.2 Volts.Hence, it can operate with a single 1.5 Volt battery, whereas DRAM and flash require charge pumps to supply higher voltages. Existing NAND flash technology requires the internal voltage to be raised to 10 to 12 volts for write operations. That voltage is boosted with the help of a charge pump, which requires considerable power and presents adverse design conditions for embedded designers. Another major benefit STT-RAM technology hands embedded designers is low writing current on the order of 100 to 200 microamperes at the 90 nm node, thanks to its efficient spintransfer torque techniques. At the 45 nm semiconductor node and beyond, writing current continues to scale down significantly below 100 micro amps. This lower current translates to a denser, less expensive memory.

SUMMARY OF WORK
Finally, STT-RAM combines the capacity and cost benefits of DRAM, the fast read and write performance of SRAM, and the non-volatility of Flash, coupled with essentially unlimited endurance. Its performance exceeds that of other prospective non-volatile memory technologies, and it solves the key drawbacks of first-generation, field-switched MRAM. It has excellent write selectivity, excellent scalability beyond the 45 nm technology node, low power consumption, and a simpler architecture and manufacturing process than first-generation MRAM.

FUTURE SCOPE OF WORK

Continuous exploration of VOx-MTJ (Vortex Magnetic Tunnel Junction); focusing on barrier growth and interface quality. Re-visit of AlOx-MTJs to better understand the dependence of interface and barrier quality on TMR. New barrier materials exploration: Oxides like TiOx, TaOx, Nitrides like BN, etc. Further optimization of lithographic patterning process.

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. . . . . . . . . .

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http://www.automotivedesignline.com/showArticle.jhtml;jsessionid=CEHFFSV3FFZX4 QSNDLOSKHSCJUNN2JVN?articleID=197008084&queryText=stt-ram.

[11]

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[13]

.
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Technology International magazine).