Designand Analysisof Low Power MTCMOS

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Design and Analysis of Low Power MTCMOS using SRAM cell

Article · March 2019

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International Journal of Management, Technology And Engineering ISSN NO : 2249-7455

Design and Analysis of Low Power MTCMOS using


SRAM cell
1Dr.S.A.Sivakumar, 2S.Geetha

1Assistant Professor, Department of ECE, Info Institute of Engineering,


Coimbatore, Tamilnadu.
2PG Scholar, Department of ECE, Info Institute of Engineering, Coimbatore,
Tamilnadu.
[email protected], [email protected]

Abstract
A rapid growth of portable battery operated devices has made low power IC design a
priority in recent years. Conventional SRAM cell designs are power hungry and poor
performers in this new fast mobile computing. In this paper, low power SRAM cell
designs have been analyzed for power consumption and write power delay. Gated VDD
and MTCMOS design techniques have been employed to reduce the power consumed by
the SRAM cell. These designs are compared with the conventional 6T SRAM cell. The
result show that the MTCMOS based SRAM cell is the best performer in terms of power
consumption and write delay. It is less power than the conventional 6T SRAM cell.
Furthermore, the MTCMOS based SRAM cell is faster than the conventional 6T SRAM
cell. The Gated VDD SRAM cell also less power than the conventional 6T SRAM cell
and is faster than the conventional 6T SRAM cell.

Keywords: Low Power SRAM; Gated VDD SRAM Cell; MTCMOS; MTCMOS SRAM
Cell; 6T SRAM; Power Reduction in SRAM Cell.

1. Introduction
The rapid development and usage of portable devices, battery life is a major concern.
As new devices are developed like smart watches, small sensor nodes, wireless
communication units, etc. Energy efficient hardware architecture is required. Random
Access Memory (RAM) chips are used virtually in every digital system.
Static Random Access Memory (SRAM) cells don’t require constant refreshing to
retain its contents as long as power is supplied to the cell. SRAM’s integration with
standard CMOS technology gives it the opportunity to become the highest area consumer
on System on Chips (SoCs).
As the current technologies are scaling down to deep submicron levels, leakage power
is a major source of power consumption. Furthermore, majority of the transistors on a
chip sit in the SRAM unit. Since cache memory uses array architecture, power reduction
in a single SRAM cell can contribute to huge power savings in the overall system.
The conventional 6 transistor (6T) SRAM cell is widely used primarily because of its
simple design. The 6T SRAM cell is a good performer in terms of delay and power. The
analysis of the conventional 6T SRAM architecture good performer shows a lot of room
for improvement in terms of power consumption.
Extensive research has been performed on 6T SRAM cells to improve delay and power
consumption so it can be adopted widely in industry. The total energy consumption of a
SRAM array can be modelled as: E (Switching) and E(leakage).

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E (Switching) represents the energy consumed in switching activities (read and write
operations) and represents the static energy consumption due to the leakage current in the
SRAM cell. It has analyzed various other SRAM architectures like 7T, 8T and a novel 9T
design, the overall complexity of these circuits compared to the conventional 6T SRAM
cell makes it more difficult to implement and ensure stable operation. Multi Threshold
CMOS (MTCMOS) technique has been applied to a 7T SRAM cell achieving promising
results in terms of power reduction.
In a 10T SRAM cell is designed achieving high Static Noise Margin (SNM) and a
power reduction compared to the conventional 6T SRAM cell. The major drawback with
this design is the increased area. When implementing this design in an array, due to the
huge multiplying factor, the area of the overall memory chip increases. It explores a
9TSRAM cell which includes Stacking and Dual Threshold Voltage implementations to
reduce leakage power.
In a two SRAM cells are presented: one structure using NMOS pass transistors to
reduce gate leakage current and the other structure using PMOS pass transistors.
Additionally, Dual Threshold Voltage technology with forward body biasing is used,
reporting a considerable reduction in power with a very slight access time degradation.
It presents various power reduction techniques in CMOS circuits concluding
MTCMOS as one of the best techniques to combat leakage power. A 10T SRAM cell
using the Column Line Assist (CLA) scheme shows considerable area reduction
compared with other 10T designs and improved delay. Low leakage SRAM cells have
been developed using Upper Self-Controllable Voltage Level (SVL) and Lower SVL.
In this paper, various SRAM cells have been designed and analyzed for delay and
power consumption. Gated VDD and MTCMOS design techniques have been used to
compare the delay and power parameters with those of the conventional 6T SRAM cell.

2. Conventional 6T SRAM Cell


The conventional 6T SRAM cell uses two cross coupled inverters and two access
transistors as shown in Figure 1.These access transistors connect the cell to the
outside. The inverters are the storage element and reinforce the data bit within the
cell as long as the power is supplied (VDD). P1, P2 are PMOS transistors and N1,
N2, N3, N4 are NMOS transistors. N3 and N4 are the access transistors (or pass
transistors) connecting the cell to the Bit Lines (BL and BL). The different modes of
operation of the SRAM cell are detailed below

Figure 1. Conventional 6T SRAM cell

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2.1 Standby/Hold Mode

When the Word Line (WL) is at logic ‘0’, the access transistors N3 and N4
disconnect the cell from the Bit Line(BL and BL).The two cross coupled inverters in
the cell continue to reinforce the data bit present in the cell as long as power is
supplied(VDD). The current drawn in this mode from VDD is termed as standby
current.

2.2 Write Mode


For a write operation, the Word Line (WL) is set to logic ‘1’ enabling the access
transistors N3 and N4 thereby connecting the cell to the outside of (BL and BL).
The contents from the Bit Lines (BL and BL) are then transferred into the cell via
the access transistors. After a successful write operation, the Word Line (WL) is set
to logic ‘0’. For example, to write logic ‘0’ into the cell, initially BL is set to logic
‘0’ and BL is set to logic ‘1’. The Word Line (WL) is then set to logic‘1’ thereby
allowing the access transistors to pass the logic value from (BL and BL) into the
cell. After the data bit is successfully written into the cell, the Word Line (WL) is
set to logic ‘0’ thereby disconnecting the cell from the outside(BL and BL).

2.3 Read Mode


To read the data bit present in the cell, Bit Lines (BL and BL) are initially pre
charged to VDD i.e. logic ‘1’. The Word Line (WL) is then enabled by setting it to
logic ‘1’. Depending on the data bit stored in the cell, a Bit Line (BL or BL) gets
discharged slightly (and slowly) via an access transistor and pull down transistor
thereby developing a differential voltage drop between the Bit Lines (BL and
BL).This small differential voltage drop across BL and BL is then detected by a
Sense Amplifier which determines the data bit stored in the cell. Charging and
Discharging of large capacitive loads is done by the Sense Amplifier. The higher
sensitivity of the Sense Amplifier, the faster the read operation. However, the
differential voltage should not be too large as it could flip the state of the cross
coupled inverters.

3. Power Reduction Techniques for SRAM Cell

Two important and effective power reduction techniques are employed: Gated
VDD and MTCMOS. Detailed discussions of the two methods are presented below.

3.1 Gated VDD


This technique introduces a control mechanism which can disable the supply
voltage (VDD) when the SRAM cell is not in use thereby eliminating any leakage
current. It reduces the leakage power dissipation by a great amount. In order to
achieve this control mechanism, a High Threshold Voltage (High Vt) transistor is
introduced in the supply (VDD) or the ground path of the SRAM cell while
modelling all other transistors as Low Threshold Voltage (Low Vt) transistors. Low
Vt transistors are used as they switch faster than High Vt transistors. This makes the
SRAM cell operate fast. This configuration results in optimum power consumption
and delay.

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Figure 2. Gated VDD SRAM cell

Figure 2 shows a Gated VDD SRAM design. The ‘Gated VDD Control’ signal is
used to turn on or turn off the SRAM cell. The primary advantage of this technique
is the maintenance of system performance even when supply voltage and threshold
voltages of the transistors are reduced.

3.2 MTCMOS (Multi Threshold CMOS)


In this technique uses transistors with multiple threshold voltages to optimize
delay and power. Low Vt transistors switch faster but have higher static power
leakage and High Vt transistors reduce static power leakage but switch slower.
MTCMOS design techniques used to design the circuits to optimize the power and
delay without incurring penalties.
The most common implementation of MTCMOS to reduce leakage power uses
sleep transistors. With the help of sleep transistors, virtual power rails are created
which supply the logic. High Vt sleep transistors are used to connect the physical
power rails to the virtual power rails. These transistors are turned on in active mode
and off in sleep mode by the Clock signal. These sleep transistors help reduce static
leakage power by a great amount when the SRAM cell is not in use.

Figure 3. SRAM cell using MTCMOS technique

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In Figure 3 shown below, a PMOS (High Vt) transistor is used between the pull
up network and VDD while a NMOS (High Vt) transistor is used between the pull
down network and ground.
The critical path transistors are required to switch fast in order to avoid incurring
a penalty in delay times, all the transistors in the SRAM cell are modeled as Low
Vt. Only the sleep transistors are modeled as High Vt to reduce leakage power. This
configuration gives an optimized result in terms of power consumption and
write/read delay.
In power gating techniques, such as Gated VDD and MTCMOS, the formation of
virtual power rails (virtual VDD and ground) is very important and these are formed
only when the sleep transistors are turned off. Due to the cross coupled inverters,
data bits ‘0’ (ground) and ‘1’ (VDD) are present on either side of the SRAM cell at
all times. So when the sleep transistors are turned off, VDD and ground get
disconnected from the cell, and the data bits ‘0’ and ‘1’ on either side of the SRAM
cell create the virtual power rails by charging them via the pass transistors of the
inverters. These virtual power rails will always have a lower potential than VDD. To
perform an operation (read/write), we switch the sleep transistors on, thereby
restoring the actual VDD and ground.
In sleep mode, virtual VDD and virtual ground are responsible for data retention
in the cell and as time progresses in sleep mode, the virtual VDD slowly discharges.
This phenomenon thus only allows for a particular amount of time, in sleep mode,
for which data in the SRAM cell can be retained after which it will be lost. To solve
this problem, the sleep transistors can be turned on before this particular amount of
time elapses. This then restores actual VDD and ground thereby preventing data loss
in the cell. Therefore, the designer must take great care in setting the frequency of
the Clock pulse that controls the sleep transistors. Alternatively, a smart power
management unit can be designed which provides the Clock signal to the sleep
transistors as and when required.

Figure 4. MTCMOS SRAM Cell array of data storage on row and column
selected cell

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4. Results

The average power consumption and average write power delay are calculated for
various SRAM cells: Conventional 6T SRAM cell, Gated VDD SRAM cell,
MTCMOS based SRAM cell and MTCMOS based SRAM array cell. Schematics of
the circuits are designed and simulated in 45nm technology using tanner EDA tool.
The transistors are sized in a way to obtain equal delay for the pull up and pull down
networks. NMOS and PMOS transistors are sized at 45nm. The sleep transistors
(High Vt PMOS and High Vt NMOS) in the MTCMOS based SRAM cells are both
sized at 45nm to obtain optimum delay and power consumption.

Figure 5. Conventional 6T Cell simulation

Figure 6. Gated VDD Simulation

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Figure 7. MTCMOS Simulation

Figure 8. MTCMOS SRAM Cell array simulation

Table 1. Comparison of Various Parameters

Conventional Gated VDD MTCMOS

Average Power 2.410e-009watts 1.231e-009watts 3.778e-010watts

Write power delay 2.25e-008watts 1e-008watts 4.18e-007watts

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From TABLE I, the average power is computed for one clock cycle during which
one write or one read operation can take place. Average power consumed by the
conventional 6T SRAM cell is 2.410e-009watts, Gated VDD SRAM cell is 1.231e-
009watts and MTCMOS based SRAM cell is 3.778e-010watts.

Table 2. MTCMOS based SRAM cell array parameters

MTCMOS based SRAM Cell array

Average Power 8.251e-011watts

Write power delay 2e-008watts

The average write power delay for the conventional 6T SRAM cell is 2.25e-
008watts, Gated VDD SRAM cell is 1e-008watts and MTCMOS based SRAM cell
is 4.18e-007watts as shown in TABLE I.
From TABLE II, Average power consumed by total MTCMOS based SRAM Cell
array (memory) is 8.251e-011watts and average write power delay is 2e-008watts as
shown in TABLE II.

5. Conclusion
Two power reduction techniques for SRAM cells have been analyzed Gated VDD
and MTCMOS based designs in 45nm technology. The MTCMOS based SRAM cell
uses the least power and is the fastest among the three designs discussed in this
paper. The MTCMOS based SRAM cell is faster than the conventional 6T SRAM
cell while the Gated VDD SRAM cell is faster than the conventional 6T SRAM cell.
In Gated VDD and MTCMOS designs, the transistor count increases which in turn
increases the area overhead. This is the main trade off associated with these designs.
With the huge reduction in power and higher speeds of operation of these SRAM
cells, engineers should be motivated to use the power reduction techniques outlined
in this paper for designing SRAM architectures.

Acknowledgments
Our sincere thanks to the Management of Info Institute of Engineering for providing
the research lab for our work.

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[1] AbhishekAgal, Pardeep, Bal Krishnan, “6T SRAM Cell: Design and Analysis”, International Journal of
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Using Cadence Tool in 180nm Technology”, International Journal of Computer Science and Technology,
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[3] Bo Wang, Jun Zhou, Tony T Kim, “Maximization of SRAM Energy Efficiency Utilizing MTCMOS
Technology”, 4th Asia Symposium on Quality Electronic Design, 2012, Page(s): 35-40.
[4] NagendraSah, NitishGoyal, “Analysis of Leakage Power Reduction in 6T SRAM Cell”, International
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[5] P. Shiny Grace, N.M. Sivamangai, “Design of 10T SRAM Cell for High SNM and Low Power”, Third
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[6] Vijay Singh Baghel, ShyamAkashe, “Low power Memristor Based 7T SRAM Using MTCMOS
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Technologies, 2015, Page(s): 222-226.

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