Metallization
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Recent papers in Metallization
The paper presents some tests in the field of through-hole plating process using special solderable conductive pastes in order to metallize the barrel of drilled holes for vias. The process consists of dispensing the special paste into... more
A driving force to achieve increased speed and performance along with higher I/O count is the Flip Chip (FC) Technology which has therefore an high level of importance for a variety of applications. A breakthrough, however, will be the... more
We present the results of the differences observed between evaporated and sputtered backside metallization processes on silicon wafers: These two methods of fabricating metal layers and the activation of the backside semiconductor-metal... more
Under similar test conditions, the electromigration reliability of Al and Cu metallization interconnect trees demonstrates significant differences because of the differences in interconnect architectural schemes. In Cu technology, the low... more
A review on applications of metal-based inkjet inks for printed electronics with a particular focus on inks containing metal nanoparticles, complexes and metallo-organic compounds. The review describes the preparation of such inks and... more
In Direct Reduction (DR) processes, the characteristics and cost of available iron ores play a very important role. The selection of suitable raw materials will optimize productivity, energy consumption and the overall economy of... more
An aligning and fixing method for fiber optics is described in this letter. The alignment is performed using a chevrontype thermal microactuator while the fixing is achieved by ultraviolet curing of an epoxy adhesive once the optical... more
In this work, a short review is presented for results utilizing the technique of laser-assisted metallization of dielectrics. Experimental efforts and results related to the metal (palladium (Pd), copper (Cu) and silver (Ag)) deposition... more
Vertical interconnect accesses (VIAs) were fabricated between the source electrode on the front and the ground on the backside of high-power microwave AlGaN/GaN high-electron mobility transistors (HEMTs) on ∼ 400-µm-thick silicon carbide... more
This paper provides a new method for the patterned metallization of self-assembled monolayers. Colloidal Au micropatterns were formed on photolithographed self-assembled monolayers (SAMs) of (3-mercaptopropyl)-trimethoxysilane (MTS) on... more
Lucrarea analizează rezistenţa la coroziune în medii corozive a straturilor depuse prin metalizarea în arc electric cu două sârme diferite, realizate din Al şi Zn. S-a pornit de la presupunerea că depunerea obţinută este diferită de un... more
It is well known that the chemical reaction between an oxide layer and a water-based slurry produces a softer hydroxylated interface layer. During chemical-mechanical polishing (CMP), it is assumed that material removal occurs by the... more
Inkjet printing of metal nanoparticles is an attractive method for front-side metallization of silicon solar cells. It is owing to noncontact, low-cost, lowwaste, and simple process. In this work, we proposed the ink-jet printing and... more
Self-heating in a 0.25 m BiCMOS technology with different isolation structures, including shallow and deep trenches on bulk and silicon-on-insulator (SOI) substrates, is characterized experimentally. Thermal resistance values for... more
waveguides for use at millimeter wavelengths have been fabricated by deposition of a metallic film onto the compocite-modified inside surface of Teflon tubing. The attenuation characteristics in the range 80 to 115 GHz show lossec of the... more
Copper (II) salts were used as metallizing agents in the synthesis of new direct dyes for cotton. In this regard, direct dyes possessing ortho-propoxy, ortho 0 -hydroxy-substituted systems formed the corresponding dye-metal complexes. The... more
Electromigration is caused by high current density stress in metallization patterns and is a major source of breakdown in electronic devices. It is therefore an important reliability issue to verify current densities within all stressed... more
The chemical vapor deposition of copper and copper alloys for very large scale integrated interconnects is described using a series of Lewis base stabilized copper(I) 1 ,l, 1,5,5,5-hexafluoro-2,4_pentanedionato (hfac) complexes. When the... more
Electroless nickel bumping of Al bondpads followed by solder paste printing is seen as one of the lowest cost routes for the bumping of wafers prior to flip-chip assembly. However, the electroless nickel bumping of Al bondpads is not... more
1Solartec s.r.o., Televizni 2618, 756 61 Roznov pod Radhostem, Czech Republic, 2Faculty of Electrical Engineering and Communication BUT, Technicka 3058/10, 602 00 Brno, Czech Republic; Author for correspondence: Ondřej Frantík,... more
On-chip interconnects with copper metallization and polymer interlevel dielectrics (ILDs) have the lowest R-C delay, lowest parasitic coupling and highest electromigration resistance of currently proposed room temperature material sets.... more
The paper analyzes the corrosion resistance in corrosive environments of some metallization layers obtained by metal-arc process, using two different wires made of Al and Zn. It has been started from the assumption that the deposit... more
This paper reports the development of a thermal chemical vapor deposition process for pure cobalt from the source precursor cobalt tricarbonyl nitrosyl for incorporation in integrated circuit silicide applications. Studies were carried... more
Four-point probing of electrical parameters on various components of IGBT modules is suggested as approach for estimation of degradation in stressed devices. By comparison of these parameters for stressed and new components one can... more
Tungsten carbide layers were prepared by sputtering from a stoichiometric WC target and subsequent annealing. Carbide formation was found at temperatures above 8008C. Annealing in pure hydrogen ambient results in a carbon depletion in the... more
Thermosonic copper ball bonding is an absorbing interconnection technology that serves as a viable and cost saving alternative to gold ball bonding. Its excellent mechanical and electrical characteristics make copper ball bonding... more
The performance optimization of solar cells comprising a locally contacted rear surface is a trade-off between rear surface recombination losses and resistive losses. Considering local aluminum (Al)-alloyed contacts formed by... more
Ž . Ar laser radiation CW, 488 nm is used to induce deposition of palladium Pd thin films onto polyimide surfaces from Äw Ž . x 2q 4 palladium᎐amine Pd NH solutions. The chemical reaction is carried out by formaldehyde-assisted reduction... more
A modeling technique to analyze the radiation onto arbitrary 1-D periodic metallizations residing on a microstrip substrate is presented. In particular, straight and meandering lines are being studied. The method is based on a boundary... more
a [email protected]*, b [email protected], b [email protected], b [email protected], c [email protected] Keywords: Electrospinning, metallization, metallic nanofiber and nanotubes.
Silver (Ag) is a promising material for interconnect metallization with improved electromigration properties which reduces the resistivity increase due to size effect that becomes substantial for metallization structures below 100 nm. In... more
The paper exemplifies the development of a surface acoustic wave (SAW) temperature measurement system, showing the advantages of wireless data transmission and passive sensor operation. It includes results of research on lithium niobate,... more
Dry etching of copper interconnect lines in a chlorine-based plasma has been investigated. Copper dry etching was carried out in a modified diode-type reactive ion etch (RIE) system and in an inductively coupled plasma (ICP) etch system.... more
Tungsten W-plug via failure in multi-level interconnects is one of the key reliability issues, due to electromigration and stress Ž. migration concerns. Electromigration EM failure of the interconnects is usually accelerated after thermal... more
A study on gold/n-type Gallium arsenide (Au/n-GaAs) Schottky barrier diode (SBD) parameters with and without thin native oxide layer fabricated on n-type GaAs was made. The native oxide layer for metal/oxide/semiconductor (MIS) SBD was... more