Stern 1972
Stern 1972
Stern 1972
Self-Consistent
15 JUNE 1972
VOLUME 5, NUMBER 12
Self-consistent results for energy levels, populations, and charge distributions are given for
n-type inversion layers on p-type silicon. Quantum effects are taken into account in the
effective-mass approximation, and the envelope wave function is assumed to vanish at the surface. Approximate analytic results are given for some special cases. Numerical results are
given for representative surface orientations, bulk acceptor concentrations, inversion-layer
electron concentrations, and temperatures.
I. INTRODUCTION
layers.
The first numerical self-consistent calculations
for inversion layers were made by Howard. Selfconsistent results have also been obtained by
Maeda~ and by Stern. Self-consistent solutions
for accumulation layers were discussed by Duke, 9
and have been studied in detail by Appelbaum and
'
Baraff
'
'"
Our calculation is based on three major approximations. We assume (i) that the effective-mass
approximation is valid, so that we can neglect the
periodic potential and use the effective masses
and the dielectric constant of the perfect crystal;
and (ii) that the envelope wave function vanishes
at the surface. Neither approximation is likely
to be valid at high surface electric fields, for
which the calculated wave functions can extend
10 A or less into the semiconductor.
The third
major approximation (iii) is that we can neglect
surface states and can replace the effect of any
charges in the oxide or insulator adjacent to the
semiconductor by an equivalent electric field.
This approximation is reasonably well justified for
the interface between silicon and silicon oxide
when it is appropriately treated. i~ Estimates of
the errors that result from use of the effectivemass approximation have been made by Howard. '
II. EQUATIONS
~ z)
(z)&f8s&lk&x+Qz&
d~f]
'z+
d
(2)
"
"
4891
F RANK STE RN
4892
where g is the dielectric constant of the semiconductor, N, is the carrier concentration in the
ith subband, given by '
E, (k) =E(+ 5
iP, /2m,
5 kz/2~,
...
0, 1, ...
0, 1, 2,
d ~(t)
~ ~
[.()--Zeel())/
z.,
p.
TABLE
I.
Surface
n2
0.
Lower
(0)
(100)
Valleys
Degeneracy
Normal mass
(4)
Higher
4
Lower
4
Higher
2
All
6
m2
916
0. 190
0. 315
Q. 190
0. 258
mj
m2
0. 190
0. 190
0. 190
0. 916
0. 190
0. 553
0. 190
0. 916
0. 190
0. 674
Conductivity
massb
ms
'1
' 15
0' 283
0'315
0' 296
Density-ofstates mass
per valleyb
m&
0. 417
0. 324
0. 417
0. 358
Longitudinal
masses
0. 190
11.7
Dielectric constant
Permi ttivity
Fermi level
T (K)
E -E (ev)
1.04xIQ
C~=K~tp
for N&-AD=10
in the bulk,
0
12
l.
F/m
300
0. 88
77
1. 11
J.
0&z &z'
Z &Zff
pp, (z) = 0,
where z is the depletion-layer thickness, given by
zp,.
"
P- e-N, z/zzo,
(0)
where the first term is the energy difference between the bottom of the conduction band in the bulk
and the Fermi level, E is the Fermi energy
relative to the nominal conduction-band edge at
the surface, and
is the average penetration
of the inversion-layer charge from the surface.
The substrate bias p, b is the voltage difference
..
'.
Potential
)]),
(10a)
(lob)
E, = (h /2m, )' ' [', z eF, (i+ -')]
The eigenvalues E, are asymptotic values for large
i, but they are amazingly close even for the ground
state i =0. The exact eigenvalues for the three
lowest states have i+ 4 in (10b} replaced by 0. 7587,
Another
1. 7540, and 2. 7525, respectively.
"
(11)
Limit
b= bp+
approximation which
we have just described is a reasonable approximation when there is little or no charge in the inversion layer, but fails when the charge density
per unit area in the inversion layer is comparable
to or exceeds that in the depletion layer. When
only one subband is occupied, i. e. , in the electric
quantum limit, a variational approach gives a good
estimate for the energy of the lowest subband.
Fang and Howard' used the trial eigenfunction
z e ~/
(12)
with a single undetermined parameter b. The energy of the lowest state is found after a straight-
forward calculation to be
(13)
&b,
bp= (12m, e
N"/z~epk )'
',
(14)
',
(15)
&b = 4N/3N*;
Zp
= Zpp+ ~zp
zpp=
Ep = Epp+ 5Ep,
(3)p/p (e pg/ml/2
5Ep =
~N
z e }2/8 (N
(2Ne zpp/3zpcepN
) (Np, + pp
}/Np1/3
N,}.
(16)
0.4
Vaepl
0.3
EF
The triangular-potential
t (z) (~ hp)&/p
N, (2/b) (NND)]
choice of b minimizes the total energy of the system, in which the coefficient &~ is replaced by, z.
The last term in (13) arises from the curvature
of the potential of the depletion charge density;
it will be small in Si, for which the inversion
layer is generally much thinner than the depletion
layer. We can therefore treat this term as a
small perturbation.
The average distance the charge density associated with the variational wave function (12}
penetrates into the semiconductor is found from
(11) to be zp= 3/b. We therefore find the following
variational results:
g)
Quantum
Pp
4893
Zo
(III) p- Si
0.2
NA
17m-2
Ninv = IQ
Np-l02lm 3
LLJ
N 4e I
p
O. l
- I 2x
Q I5m
-2
OK
I
OO
3
z (nm)
FIG. 1. Potential energy V(z) = erat (z) at 0 K for electrons near a (111) surface of p-type silicon with 10 net
acceptor ions per m3 and with 10" inversion-layer electrons per m
The Fermi energy' and the energy Eo
of the bottom of the lowest subband are shown. The dotdash curve is the potential energy with the inversionlayer contribution removed. The potential V(z) was used
to calculate the results in Table III.
F RANK STERN
4894
N.
..
(m-')
1 xlp
2 x]p'4
5 x10'4
1 x10~5
2
x10"
5 x10
1 x1Q'6
2
x10"
5 x10
1 x10"
N, e(~
')
&Eo
Eoo
1.214 x10
1.213 x10
1.213 x10
M. 052
0 050
19.91
20. 65
21 31
-0 ' 048
M. 043
l. 213 x 1p"
23 ~ 54
26. 96
1.212 x10
1.211 x1p"
1.210 x10
1.207 x10
1.204 x 10~'
1.198 x10
1. 192 x1Q
-0 029
-0 017
-0 ' 011
-0 ' 006
-0 ' 003
-0 ' 002
6zo
32 35
48 81
71 ~ 50
108~ 7
195 1
7 ~ 072
7 008
6 945
6 768
6 511
6 093
5 273
4. 522
3 760
2 858
306 8
2 ~ 294
0 ~ 018
0 ~ 018
0 017
0 ~ 015
0 012
0 ' 009
0 ~ 004
0 ~ 002
0 ~ 001
0 ~ 000
0 ~ 000
21 34
20 ~ 28
22 48
49. 81
72. 74
zoo
18 76
19.53
Eo (sc)
19~ 86
20 ~ 60
23 ~ 50
26 92
33 ~ 28
-Q. 037
33 31
49 83
72 75
110~ 4
197 9
311
Eo (var)
110 4
~
197. 9
311 2
~
08
I.
06
1.
t- I04
I.02
25. 96
~
~
~
~
II
4
inv
5 20
50
80
~depl
~
~
~
~
~
zo (var)
7. 09
zo
(sc)
2. 86
6 69
6 ~ 63
6 ~ 56
6 38
6 ~ 13
5. 72
4. 95
4 ~ 26
3 56
2 72
2 ~ 29
2 19
7 ~ 03
6. 96
6. 78
6. 52
6. 10
5 ~ 28
4. 52
3. 76
~
~
~
eE,zo,
(17)
E,
where
=eN, /vE p allcl Z g is the energy obtained from (10b) by using the depletion-layer field
E" as the surface field. The second term in (17)
is the approximate lowering of the excited-state
energy by the inversion-layer potential well. The
third term gives the approximate contribution of
the depletion-potential
curvature to the energy levels; it is much more important for the excited
states than is the corresponding term for the lowest
subband, given in (16), because of the larger spatial
extent of the excited states. The last term in (17)
gives the inversion-layer contribution to the potential energy at the surface.
Equation (17) applies to the electric quantum limit, but it may still have some validity when more
than one subband is occupied, provided zo is replaced by
z~~
I.OO
=Q&N(z&/Ng-
(1S)
the average distance of all the inversion-layer electrons from the surface.
The quantity zo in (17) can be found by combining
the variational expression (15) and the correction
factor in Fig. 2 The magnitudes of the terms in
(17) and of the energy obtained from a numerical
self-consistent calculation are given in Table III
for excited states of a sample inversion layer.
~
1
2
3
4
5
6
7
8
9
10
15
20
Ef, d
32. 43
43. 83
53. 90
63. 10
71.67
79. 75
87. 45
94. 82
101.91
108.76
140.30
168.61
T2
-10.53
7. 79
-6. 34
-5. 41
-4. 76
-4. 28
-3.91
-3.60
-3.35
-3. 14
-2. 43
-2. 03
T3
-0. 13
-0.23
-0.35
-0.48
-0.62
-0.77
-0.93
-1.09
-1.26
-1.44
-2. 39
-3.45
E &(approx)
360. 3
374. 3
385. 7
395. 7
404. S
413. 2
421. 1
42S. 6
435. 8
442. 7
474. 0
501. 6
E;(sc)
361. 9
375. 4
386. 5
396. 3
405. 2
413. 5
421. 4
428. 8
436. 0
442. 8
474. 0
501. 6
4895
1'
cessing system.
U. SELFXONSISTENT RESULTS
In this section we give some representative results of our self-consistent calculations to illustrate
properties and trends in the solutions. A set of
results complete enough to encompass the entire
range of temperatures and doping levels used by
experimenters would be too lengthy to be published
here. We hope nevertheless that this sampling will
be useful.
Figure 1 shows the potential energy at 0 K for a
(111) surface with N& N& = 10 ' m ' and with N,
=10'7 m, the same values as for Table III. This
is a case in
which
N, is
F RANK STERN
4896
= 1. 2 x10" m ', so that the electric field at the surface is much larger than the field in the depletion
layer.
As N, increases from zero at low temperatures,
the separation E~ Ep of the Fermi level from the
bottom of the lowest subband increases faster than
30
NA
ND
Io
C
gNyepi
(77K
t
(a)
30
NA
z,
-ND IIO21gn ~
Ip
E
C
hl
lower temperatures.
As the temperature is increased, inversion-layer
electrons will be excited to higher-lying subbands,
with larger average values of z, and the inversionlayer contribution to the ptoential well increases.
The temperature dependence of zp and zand of the
~N~
(77K)
IPI5
IO16
Ninv+NAp
(b)
20
Io
0I
3x10@
elec-
(100) Si OK
2)
energy-level
30
OIY
(rn
Fig.
for
N&
NA
6 N
M
C)
4897
&c
..
~
H
~ (1)
4
UJ
%+
QJ0
)CL
+U
I.O
(a)
IN LOWEST VALLEYS
FRACTION IN LOWEST SUBBAND
(b)
I20
8-
---- FRACTION
cn
pfj'Z
0.
~ 0.6
IOO
4J
4.
p
p2 04
I-
80
O
K
LLI
02-
60=
Ep
40
{a)
200
IOO
300
I.O
TEMPERATURE (K)
FIG. 5. Temperature
(n
of {a) zo and z,
the average penetration of electrons in the lowest subband
and in all subbands, respectively, and (b) the energies
of the lowest seven subbands, for a (100) surface with
Note that levels 0'
Nz-iV&=10 m and N&~=10 m
and 1 cross at about 35 K. Note also that Nd, decreases
from 1.21x10 5 m at 0 K to 0. 96x10 m at 300 K. If
the surface field were held constant at the value for 0 K,
splittings at 300 K would be about 1% larger than the
values shown here for a fixed value of N(.
dependence
8
O
~~
0.8
0.6
LLI
z 04
O
t
02
-
- FRACTION
IN
LOWEST VALLEYS
(b)
I.O
O.
VI. DISCUSSION
Sections III-V give representative results of selfconsistent calculations for n-type inversion layers
on Si. In this section we comment on the validity
of some of the approximations that we use.
The assumption that the envelope wave function
vanishes at the surface simplifies the calculation
considerably, but a more realistic boundary condition specifies the ratio of the wave function to its
derivative at the surface, a value which depends on
the nature and height of the barrier there. The energy change connected with this more general boundary condition is easily calculated for the triangular
potential, whose eigenfunctions and eigenvalues are
given in (10), by using tabulated values of the Airy
function and its derivative. ' The dependence of the
eigenvalue on the boundary condition is shown in
Fig. 7.
For a numerical estimate of the effect of more
$o
iCt
~~ 06
U
pm
Op
iO
c[ Z
K
u.
04
NA- ND
102jm
(III) Si
0.2
Nd~i (77K)
IOI5
ioj~
Ninv+ Nd
IOI7
(m-2)
I
(c)
FIG. 6. Fraction of carriers in the lowest subband,
and in all the subbands associated with the valleys having
the largest value of m3, the mass for motion perpendicular to the surface, for the (a) (100), (b) (110), and (c)
(111) surfaces. The fraction in the lowest valleys should
be 3 and ~, respectively, for the (100) and (110) surfaces
when quantum effects are negligible.
It is identically
unity for the (111) surface, for which all valleys have the
same value of m3.
F RANK STERN
4898
I
Ep
UJ
3
Ep
Q/0 (dg/dz)
IO
[, 0
0. 52
effective-mass
gin to fail when the calculated energies are comparable to the energy gaps in the bulk and when the
spatial extent of the wave function for the lowest
subband is comparable to atomic dimensions.
The
resulting errors have been estimated by Howard';
they become significant for wave functions whose
average penetration z is of order 2 nm or less.
Exchange and correlation effects in the inversion
layer have been ignored in our work, an approximation which requires further examination.
At the highest surface fields it may be necessary
to undertake a more fundamental calculation of the
effects of interfaces on wave functions and eigenvalues. This problem is somewhat like the problem
of low-energy electron diff raction, because both involve the matching of waves across an interface between two media. It may be possible to include
within the framework of a simple model both the
surface subbands associated with band bending
and the conventional surface states which arise
from the presence of the interface itself.
The most promising experimental method to
determine inversion-layer subband splittings for
comparison with the calculations appears to be
to look for structure in the photoconductivity ex-
We have assumed in Eq. (7) that the depletionlayer charge density is constant for 0 &z &z~, and
then changes abruptly to zero. The actual charge
density decays smoothly, with a characteristic
length given by the bulk screening length. Near
the surface, this effect can be accounted for by
adding a constant to the band bending used to calculate z, in Eq. (7). We must now think of z~ not
as the abrupt termination of the depletion layer,
but as a measure of its charge density, defined by
z, = N~ /(N- Ne ). We give the required correction term in this Appendix, and also give values for
the screening length. The derivation is straightforward, and has been omitted. '
If the bulk is characterized by acceptor and
donor concentrations N& and N&, respectively, and
by hole concentration p, if all the minority impurities are ionized, and if there is a negligible
minority-carrier concentration, then we find that
the bulk-screening length L is given by 5
L =KeoKT/e
where
p-N-N&,
(NNn)-
where P
I. =KeoffTN/e Ne(NNe) .
(Al)
we get
(A2)
N-N~,
(AS)
We find
= (2/zzo)((N~ Nz)eg
KT[P+N in[N/(Nz+P)]})
(A4)
"
KT)],
= (2/zzo)[(Ng Np)(eg
(A5)
].
(AS)
At very low temperatures it is necessary to consider the width of the acceptor level. If we characterize it by a Gaussian distribution whose full energy width at half-height is 4, we find the following
approximate results when KT b, :
4z z n/e'N
'"N
'"
(A7)
Nz
'
(AS)
The numerical coefficients and exponents are approximately correct for Ne/N= 0. 01.
result (A5)
We have used the high-temperature
in Eq. (9) and in our calculations over the entire
temperature range. The difference between (A5)
andthe more exact results (A4) or (AS) is negligible
~A Many, Y. Goldstein,
and N. B. Grover, Semiconductor Surfaces (North-Holland,
Amsterdam, 1965).
2D. R. Frankl, Electrical Properties of Semiconductor Surfaces (Pergamon, New York, 1967).
R. F. Greene, in Solid State Surface Science, edited
by M. Green (Marcel Dekker, New York, 1969), Vol. 1,
p. 87.
J.
4899
B: INTEGRAI. S OF AIRY
FUNCTIONS
L'-0
APPENDIX
..
Ai (z')dz'
=-z Ai
(Bl)
(z)+Ai (z),
z Ai (z
(a2)
(a3)
A.
B. Fowler, F. F.
J. Stiles,