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    Porosimeter

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    rael*
    The document describes an optical analysis platform for thin film metrology called GES5E. It offers both high resolution and fast variable angle spectroscopic ellipsometry, as well as additional measurement modes. Standard features include a fast CCD measurement mode and high resolution mode. The system can measure a wide spectral range from 190nm to 2500nm with high precision. It includes user-friendly software and a large material property database for analyzing measurement results. The system is suitable for characterizing a variety of materials, such as semiconductors, displays, and more.

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    Porosimeter

    Uploaded by

    rael*
    106 views4 pages
    The document describes an optical analysis platform for thin film metrology called GES5E. It offers both high resolution and fast variable angle spectroscopic ellipsometry, as well as additional measurement modes. Standard features include a fast CCD measurement mode and high resolution mode. The system can measure a wide spectral range from 190nm to 2500nm with high precision. It includes user-friendly software and a large material property database for analyzing measurement results. The system is suitable for characterizing a variety of materials, such as semiconductors, displays, and more.

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    The document describes an optical analysis platform for thin film metrology called GES5E. It offers both high resolution and fast variable angle spectroscopic ellipsometry, as well as additional measurement modes. Standard features include a fast CCD measurement mode and high resolution mode. The system can measure a wide spectral range from 190nm to 2500nm with high precision. It includes user-friendly software and a large material property database for analyzing measurement results. The system is suitable for characterizing a variety of materials, such as semiconductors, displays, and more.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PDF, TXT or read online from Scribd
    Download as pdf or txt
    106 views4 pages

    Porosimeter

    Uploaded by

    rael*
    The document describes an optical analysis platform for thin film metrology called GES5E. It offers both high resolution and fast variable angle spectroscopic ellipsometry, as well as additional measurement modes. Standard features include a fast CCD measurement mode and high resolution mode. The system can measure a wide spectral range from 190nm to 2500nm with high precision. It includes user-friendly software and a large material property database for analyzing measurement results. The system is suitable for characterizing a variety of materials, such as semiconductors, displays, and more.

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    Attribution Non-Commercial (BY-NC)
    Download as PDF, TXT or read online from Scribd
    Download as pdf or txt
    of 4

    OPTICAL SOLUTIONS for your Research

    A Unique Optical Analysis Platform for thin film metrology


    High Resolution and/or Fast Variable Angle Spectroscopic Ellipsometry Spectroscopic Scatterometry, Photometry & Reflectometry, Polarimetry Porosimetry of Thin Films and Bulk

    Standard Features
    Fast CCD Measurement Mode
    Grating based double stage Detector: CCD array 1024 + dedicated detector for NIR Spectral range: from190 nm up to 1700 nm SE Optimized Spectrograph Resolution < 0.8 nm @ 633 nm

    High Resolution Mode


    Double stage spectrometer Detector: PMT in photon counting mode + dedicated detector for NIR Spectral range: from 190 nm to 2500 nm Spectrometer Scanning Resolution <0.5 nm @ 633 nm

    SOPRA offers the possibility on the same platform to combine High Resolution and Multi-Channel measurements mode allowing advanced materials characterization as well as fast routine measurement with automation capabilities. Whatever your needs, your system will follow your evolution. Our SE design is based on achromatic modulation by industry proven rotating optical elements and uses patented optical fibers connection of the Spectrometers/Spectrographs. GES5E has a robust and advanced design for stable, reproducible and high accuracy measurements. No need of daily calibration.

    The largest set of options


    OPTICS
    Spectral Extension in NIR:
    Up to 2500 nm

    answering user needs and metrology evolution


    AUTOMATION
    CCD camera monitor Variable angle measurements
    Starting from 10 to 90 Up to 300 mm X-Y, Rho Theta, Combo X-Y & Theta

    Automatic Microspot
    Beam size down to 50 m

    Achromatic Compensators fixed/scan Mueller Matrix 12 or 16 coef Polarized Photometry Scatterometry Automatic Generalized SE for Anisotropy

    Mapping

    Automatic tilt & Autofocus Automatic Loading


    (see SE5 specs)

    EXTENDED/COMBINED METROLOGY
    Liquid cells Heater stage Inert gas cell
    (4.2 K-700 K) measurements up to 5 spectra/sec

    EPA thin film Porosimetry


    (see EPA brochure) @ 0.154 nm up to 33 m

    X-Ray Reflectometry/GXR/XRD Infra Red SE by FTIR Spectroscopic Reflectometer


    300-1700 nm

    Cryostat

    In-Situ and Real-time SE

    www.sopra-sa.com

    OPTICAL SOLUTIONS for your Research

    Softwares
    GES5 E completely benefits from redesigned software interface, with deepest hardware control allowing user to manage and use every optical elements independently, or to customize new sequences to achieve a specific measurement like optical retardance and generalized ellipsometry. GES5 E also benefits from the most recent algorithms for fast convergence. Library of dispersion laws can be added without limitation and (n,k) database has more than 1000 entries.

    WINSE automated calibration, measurement, analysis Software


    Derivated from our stable and robust production software engine, the software run under Windows XP. Push button Operator and Engineer mode architecture Full hardware sequence management and I/O inputs Regression and extraction of physical parameters (Thickness, Optical constants, R%, T%, Optical roughness, Sheet resistance, Concentration, Dopants) EMA, Alloy, Large range of models The largest n,k database available

    WinElli2 Advanced Research Software


    Full Simulation for Isotropic, Anisotropic, graded profile, interface, periodic layer system in Angular Ellipsometry, Spectroscopic Ellipsometry, Photometry, Reflectometry, Scatterometry, Porosimetry Generalized SE and Mueller matrice data handling Largest range of models and n,k for analysis.

    Performance
    Measuring time: sec (Fast CCD mode) 1 sec (High Resolution mode 120 Thickness range 0.01nm to 50m Measurement Precision: 0.01nm on 120nm ref sample Optical indexes with 10-3 precision

    www.sopra-sa.com

    OPTICAL SOLUTIONS for your Research

    Typical Applications
    As a pioneer in the SE technology SOPRA provides the widest proprietary n & k database
    Semiconductors
    High-k: SiO2 , Si3N 4 , SiNx, SiON, HfO2, Ta 2O5 , ZrO2 ... Low-k: SiOC, SiOF, SOG, Polymers... Metals & interconnects: Al, Cu, Cr, Mo, W, Pt, TiN, TaN, WSix, AlCu Lithography: AR coatings, BARC, SiO xN y, Resists, Masks... Semiconductors & Epi-layers: SOI, SiGe, Strained Si, SiC, Poly-Si, a-Si, OPO, ONO, HSG, III-V: AsGa,InP,GaN, II-VI: CdTe, ZnSe...
    N
    Si cap thickness Native oxide Silicon SiGe (9%) Silicon SiGe tickness Ge% in SiGe layer

    Flat Panel Displays


    TFT-LCDs: SiO x, SiNx, a-Si:H, N+a-Si, Photo Resists, ITO, Polymide ...
    K

    LTPS: poly-Si, crystallinity, H content in a-SiH, SiO2, ... Colour filters: RGB, Polymide, ITO, CrO 2, Cell Gap, LC... OLED: AlQ3, CuPc, doped organics layers, thin metals... STN: thin polymers, Polymides, ITO ...
    WaveL(nm)

    PDPs: Enamel, MgO, ITO, Al2O 3 ...

    OLED: refractive indices of HTL for various doping levels

    Photonics
    Waveguides, coarse filters, Reflective Coatings, ARC III-V devices (EEL, VCSEL, ECL) MEMS, AlGaN, GaN Sol-Gel/Porous

    General
    Ferroelectric materials (BST, SBT, PZT) CD-RW (AgInSbTe, ZnS,, SiO 2) Magnetic Films (GMR, thin film heads) CNT/Nanodots/rods Fuel, SOFC, porous electrode

    Organics
    Photovoltaic, DSSC, ZnO, CIS Langmuir Blodgett films Bio-sensors Polymers dyes Porous materials

    SOPRA Application Laboratory continuously supports its customers through sample characterization and data analysis assistance. SOPRA is following the procedures recommended by International Standards Organization applying a calibration process to every Reference Sample.

    Dimensions (in mm) with optional Frame


    336,5

    639

    766

    1202 750 890

    SOPRA USA Tel.: +1 650 566 1270 - Fax: +1 650 566 1267 [email protected]

    SOPRA France Tel.: +33 1 46 49 67 00 - Fax: +33 1 42 42 29 34 [email protected]

    SEIKA Corp. Japan Tel.: +81 3 52 21 71 18 - Fax: +81 3 52 21 71 35 [email protected]

    Non-contractual document. SOPRA may modify the products/specifications described in this document or any documents supplied with the product without prior notice

    SiGe: Thickness mapping in CCD mode with Si Cap, SiGe thickness and Ge%

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