Thome CMOSAIC Zurich April 2012 Lecture
Thome CMOSAIC Zurich April 2012 Lecture
Thome CMOSAIC Zurich April 2012 Lecture
10 0000
Wire Count
10 000
10 00
DRIE microchannels
Test vehicle
Flip-chip bonded (sequential) Force-controlled reflow process Total Force on chip: 12.6 [N] at 265C (2.2MPa) Force on individual joint: 0.6g
Cross section polished sample Contact area: 70% of initial plated surface
sample
Ctsv
Ccoupling
Ctsv
TSV
Si
Cooling channel
Si
A deep TSV process, where the wafer thickness is greater than 50m, is needed to accommodate cooling channels with depth greater than 50m. Aspect ratio of the TSV is more than 1:6.
60
50
40
30
20
10
0 80
4
100 120 140 160 180 200 TSV Distance [m] 220 240 260 280 300
Average TSV resistance below 1, with a peak at 13. Parasitic MOS capacitance Ctsv 0.8pF (Cu SiO2- Si) Parasitic coupling capacitance Ccoupling over the dielectric cooling liquid up to 60fF
TSV
Bottom Chip
Two 50m thick chips are bonded and electrically connected by Cu TSVs. Daisy-chain measurements demonstrate 0.5 resistance with 99% yield for 1280 TSVs.
Top Chip
Flow direction
High-speed visualization of the two-phase flow boiling of R245fa without any inlet restrictions (top), and with the 50 m-wide, 100 m-deep, and 100 m-long inlet micro-orifices (bottom). Gch=2035 kg/m2s and qb=36.5 W/cm2. The flow is from left to right. Recorded @2000fps. Slow motion @30fps.
In Out
49 48 47
IR View
6 4 2 2 4 6 8 10
46 45 44 43
z [mm]
Footprint temperature maps of the test sections base provided IR camera for two-phase flow boiling of R236fa for Gch=2299 kg/m2s, qb=48.6 W/cm2 calculated with one-dimensional conduction (left-hand side) and local width-avg. heat transfer coefficients from inlet to outlet (right-hand side).
600000 temperature pixels per second using inhouse IR camera calibration.
standard approach
surf ace
Lagrangian approach
Development: [1] Comparison of surface representations; [2] Arbitrary Lagrangian-Eulerian Technique; [3] Test case: 3D microchannel
[1]
Goals: 3D Arbitrary Lagrangian-Eulerian Finite Element code; Coupled heat transfer and two-phase flow Predict flows in microscale complex geometries;
[2]
mesh velocity
Lagrangian Eulerian
[3]
cross section d d
Integrated Water Cooled 3D Electronic Chips - Experiments PhD student: Adrian Renfer
High frequency flow fluctuations
a) Single cavity out of a 3D chip stack
flow
time c) Frequency analysis FFT spectra at different flow rates Increasing vortex shedding frequency
FFT spectra
frequency (kHz)
Publications
Integrated Water Cooled 3D Electronic Chips - Modeling PhD student: Fabio Alfieri
We investigate next generation interlayer integrated water cooled 3D chips
a) Cooling cavities with microstructures are approximated as ultrathin porous medium c) Our modeling results show good agreement with the experimental data in different layers
Temperature difference
x*
x Lchip
Undergoing investigation
Hydrodynamic entrance length
Impact on the performance of non-homogeneous micro pin-fin density and heat fluxes
4
Pe RePr
Publications
Alfieri et al., On the Significance of Developing Boundary Layers in Integrated Water Cooled 3D Chip Stacks, International Journal of Heat and Mass Transfer, accepted for publication (2012)
Since we released the first transient thermal simulator for liquidcooled ICs, 3D-ICE has seen >100 downloads and >40 citations from all over the world in one year!!!
Networks
Run it on Graphics
Processors
Sridhar et al. Neural Network-based thermal simulation of ICs on GPUs, IEEE TCAD 2011
Test case: 2 dies containing Sun Niagara Multicore processors stacked in a liquid-cooled 3D IC
Coolant Flow
Temperature Map
Red Higher Temperature
Zanini, Sabry et al. Hierarchical Thermal Management Policy for High-Performance 3D Systems with Liquid Cooling, IEEE JETCAS 2011
Superhydrophobic surfaces
Ph.D. Student: Michael Rossier
Goals Production of a highly hydrophobic surface to reduce the pressure drop in microchannel with application for water cooling systems
Approach
3
(1) Creation of a nanostructure4(silicon etching) (2) Surface modification of the created structure (fluorosiloxane)
Contact angle measurement of a water droplet on functionalized crater-like silicon structures: contact angle: 155