PicoTrack SOP

PicoTrack PCT-200CRS
Standard Operating Procedure
CORAL Name: pTrack

Model: PicoTrack PCT-200CRS Coat-Develop Track
Location: ICL Photo Room
Purpose: Coat and Develop Photoresist
Author: K. Payer, November 2017
Introduction
The PicoTrack PCT-200CRS is a fully automated coat and develop track system with
integrated vapor prime and hotplate bakes. The system allows for the spin coating,
spray developing, and puddle developing of 6” and 8” wafers for both GREEN (CMOS
compatible) and RED (Au contaminated) processes. Two photoresists are available
through integrated pumps: a positive, thin resist (SPR700-1.0), and image reversal
resist (AZ5214e). Additionally the tool has syringe dispense capability to give users
flexibility to run additional varieties of photoresist in small quantities. Two
standard developers are available, each with spray, stream or puddle recipes: CD-26
is an industry standard 0.26N developer, and AZ-422 is a 0.215N developer.
The coater track and developer track operate independently and can be run
simultaneously. Both tracks have redundant hotplate stacks for GREEN and RED
processing. Recipe creation is controlled by MTL Staff to ensure separation of the
hotplate stacks and prevent users from cross-contaminating the tool. Several
standard recipes exist for a variety of thicknesses, but MTL Staff can create custom
recipes for users upon request.
Safety
Read and understand this SOP before use. Only trained personnel may operate this
system. This tool utilizes robot handling systems which can become pinch points;
the handler also uses a low power laser to map the cassettes. Standard
photolithography chemical hazards exist inside this tool, users should be familiar
with the chemicals used in the tools and know where to find the appropriate SDS for
these chemicals. The hotplate stacks have high temperature hotplates at various
temperatures up to 250C, users should not attempt to access the hotplates. Please
observe the following safety protocols:
• Do not open the tool enclosure doors while the tool is in operation, with the
exception of the send/receive cassette doors.
• Do not remove or open the enclosure panels on the lower part of the tool.
• Do not place your hand or other object in the path of the tool’s robot handler,
and do not manipulate the handler or transfer arm.
• Do not attempt to recover wafers from the system without talking to staff.
Procedure
1. Check reservations in CORAL to ensure you have reserved the correct
machine at the correct time. Engage the tool in CORAL.
2. Login to the GUI software with username USER and password USER. There
are several tabs available in the GUI, most users will primarily access the
MAIN, OPERATE, and R MONITOR tabs. If you try to access a tab that you do
not have permission for then you will be sent back to the MAIN tab. The
appendices contain descriptions of the tab operations.
3. Select the OPERATE tab, then select LINE CODE.

4. Select Track 1 for coating recipes or Track 2 for developing recipes.
5. Find the recipe sequence for your process. Recipes are named based on the
hotplate stack (RED or GREEN), be sure to select the proper recipe based on
your wafers’ properties.
a. Coat recipes are named based on resist type (SPR or AZ) and
thickness.
b. Develop recipes are based on dispense type (Spray or Puddle) and
developer type (CD26 or AZ422).
c. Other standard recipes exist for bake-only, etc. Standard recipes are
listed in the appendices. If you have a need for a recipe that does not
exist, make a comment in CORAL or contact MTL Staff and we will
create a recipe for you.
6. Double click the recipe sequence for your process, then click APPLY.
7. Back on the OPERATE tab select DOWNLOAD LINE CODE. Once the code is
downloaded, select YES to go to the MAIN tab.
8. Load your wafers into the SEND (top) cassette for the track that you wish to
run (COAT or DEVELOP). Load an empty RECEIVE (bottom) cassette in the
same side. Make sure when the cassette is place onto the indexer that it lies
flat and fits into the appropriate slots for a 6” cassette; failure to do so may
result in the transfer arm crashing into wafers or wafer breakage.
9. When you are ready to run click START or press the START button to begin
processing the wafers. The sequence will run automatically, when the
process is complete the system will beep and the green light will flash on the
RECEIVE indexer; remove the RECEIVE cassette to silence and reset the
system.
a. NOTE: Once a wafer has entered into the sequence it must be
processed through completion. Do not attempt to remove a wafer
from the robot during the process. If you wish to abort the process for
any wafers remaining in the SEND cassette, then click or press the
SEND RESET button.
b. If the system alarms during the process and you are able to correct
the problem (within your training), press CLEAR to acknowledge the
alarm and press START again to resume the process.
10. When your process is complete, remove your wafers from the cassette. Log
out of the user account, then disengage in CORAL. Be sure to enter the correct
run data in the CORAL window.
Additional Procedures
• Additional Spin Module recipes are available aside from the Standard
Sequence recipes. To use one of these recipes, select and download the
correct sequence as described above.
o When prompted to go to the MAIN tab, select NO
o Select RECIPE MODULE, then in the graphic click on the Spin Module
for Track 1 or Track 2 to bring up a menu with additional recipes.
o Select the desired recipe, then select DOWNLOAD.
o Return to the MAIN tab and run your process as normal.
o NOTE: Do NOT use this method to change hotplate recipes. If a new
hotplate sequence is needed please contact staff to create a new line
code.
• In the MAIN tab, the track status can be displayed as either a graphical or as a
text-based representation.
o The text-based representation displays the individual module recipes.

o The graphic representation allows users to change the load/unload
modes for the indexers; auto or manual from the SEND cassette as
well as wafer size.
§ Select the SEND or RECEIVE indexer to bring up a window
which allows modification.
§ If you choose to run in manual mode, please return to auto
mode when you are finished.
• The R MONITOR tab allows users to view the status of individual modules as
wafers are being processed. Hotplate temperatures, spin speeds, step times
can be monitored from this screen.
• To use the integrated syringe dispense system, refer to the PicoTrack Syringe
Dispense SOP. This system requires additional training.
Appendix 1 – Menu Tab Descriptions

• MAIN: Default screen, monitor wafers and process, software control panel.
• OPERATE: Select and load various processes for Track 1 and Track 2.
• PROCESS: Create and edit module recipes and sequences (STAFF ONLY).
• DIAGNOSTIC: Status for sensors and solenoids.
• EVENT LOG: List of commands from all users that occur on the tool.
• REPORT: Report of wafer scan, wafer complete and lot complete.
• R.MONITOR: Monitor the individual modules and recipe progress
(temperature, time, spin speed) in detail.
• MAINT.: Service mode for maintenance and calibrations (STAFF ONLY).
• HISTORY: Alarm and recipe download history log.
• E LOG: Customizable user log to track maintenance and recipe history.
• ADMIN: Manage user accounts (STAFF ONLY).
Appendix 2 – Standard Recipe Sequences

• GREEN_SPR1.0 or RED_SPR1.0
o 1 minute HMDS cycle, 20 second cool plate, coat SPR700 at 4500rpm,
softbake 60 second at 95C
• GREEN_SPR2.0 or RED_SPR2.0
o 1 minute HMDS cycle, 20 second cool plate, coat SPR700 at 1000rpm,
• GREEN_AZ1.5 or RED_AZ1.5
o 1 minute HMDS cycle, 20 second cool plate, coat AZ5214e at 5000rpm,
• GREEN_AZ1.9 or RED_AZ1.9
o 1 minute HMDS cycle, 20 second cool plate, coat AZ5214e at 3000rpm,
• GREEN_PUDDLE26_60S or RED_PUDDLE26_60S
o 30 second post exposure bake at 115C, 20 second cool plate, develop
CD26 with 3 puddles for 60 seconds total, 60 second hardbake at
120C
• GREEN_SPRAY26_45S or RED_SPRAY26_45S
o 30 second post exposure bake at 115C, 20 second cool plate, develop
CD26 with continuous spray for 45 seconds total, 60 second hardbake
at 120C.
• GREEN_PUDDLE422_90S or RED_PUDDLE422_90S
o 20 second cool plate, develop AZ422 with 3 puddles for 90 seconds
total
• GREEN_IRB_120C or RED_IRB_120C
o Image reversal bake: 120 seconds at 120C.

PicoTrack SOP

Uploaded by

Copyright:

Available Formats

PicoTrack SOP

Uploaded by

Document Information

Copyright

Available Formats

Share this document

Share or Embed Document

Sharing Options

Did you find this document useful?

Is this content inappropriate?

Copyright:

Available Formats

PicoTrack SOP

Uploaded by

Copyright:

Available Formats

PicoTrack PCT-200CRS

Standard Operating Procedure

CORAL Name: pTrack

3. Select the OPERATE tab, then select LINE CODE.

o The text-based representation displays the individual module recipes.

Appendix 1 – Menu Tab Descriptions

Appendix 2 – Standard Recipe Sequences

You might also like