Quantum Dot Sensitized Solar Cells
Quantum Dot Sensitized Solar Cells
Quantum Dot Sensitized Solar Cells
1. Introduction
As the modern world requires alternating energy sources with the rapid
depletion of fossil fuels and the imminent threats of global warming, several
technologies are currently working on developing a reliable, cost-effective, and
environmental-friendly energy source. Many renewable energy sources such as wind
energy, tidal energy, hydro-electrical and geothermal energies are currently being
used as alternative sources of energy and the generation of energy by the direct
conversion of sunlight into electricity using photovoltaic (PV) cells has been one of
the most promising among them. But the greatest challenges when developing new
types of advanced materials have been the development of new materials, which are
robust and inexpensive and have the desired electrical and optical properties while
giving the capability of ease of fabrication, higher efficiencies to the PVs. Since the
first generation, silicon-based PV cells have been dominating the solar energy
industry because of the robustness and the cheaper price of silicon. But all the silicon-
based PV cells are currently limited to an efficiency of 33.7% and it hugely affects the
amount of energy that can be supplied to the current demand. The Shockley−Queisser
limit, which is the thermodynamic limit of light conversion efficiency is also at
around 32.9% for a cell of the single junction. Due to such reasons, solar energy still
haven been able to use as the primary source of energy rather than used as an
additional supply.
To overcome this limitation many attempts are being carried out resulting in the
advancement of the third and fourth generation of solar cells. Some of those
advancements are the solar cell family of photoelectrochemical solar cells (PESC).
They include technologies such as dye-sensitized solar cells (DSSCs) and quantum
dot (QD)- sensitized solar cells (QDSSCs). Those technologies are currently showing
promising advancements in the terms of high conversion efficiency and low-cost
fabrication. Among those two, QDSSC has the most attention as the quantum dot
technology has many advantages when used as sensitizers such as their large
absorption coefficient, absorption spectrum tunability, hot electron injection,
multiplication, etc. With those advantages, those solar cells have been able to achieve
higher efficiencies such as 44.7%.
The first DSSC was introduced in 1991 along with optically active sensitizing
material. When considering the making of DSSCs, they consist of two electrodes, a
sensitized photo-anode, and a counter electrode with appropriate electrolyte. A
transparent conductive substrate, usually Fluorine doped tin oxide – FTO or Indium
doped tin oxide – ITO or PET-ITO, is used for making the sensitized photo-anode by
depositing a wide bandgap semiconductor material over it. Then an optically active
sensitized dye layer is deposited over it. The dye-based on Ru was used to achieve
higher efficiencies and lower costs. Along with liquid electrolytes based on iodide-
triiodide (I -–I3-), platinum (Pt) is used as a common counter electrode in DSSC.
DSSC is usually preferable over conventional p-n junction solar cells because that
they do not require very pure and defect-free semiconductors. But their efficiencies
are limited due to some reasons such as absorption spectrum performance of the dye,
breakdown of the dye, and the low thermal and long-term stability.
So after some time, the dye was replaced by quantum dots, which are light-
absorbing materials. Hence the design of QDSSC was introduced. These QDs consist
of some unique characteristics related to optoelectronics such as size-dependent
tunable energy band gap, carrier multiplication, etc. And to increase the overall
performance of solar cells, those unique characteristics are optimized. Also, the
QDSSC is capable of absorbing a wide range of solar radiation wavelengths from UV
to infrared.
QDSSCs
3. Working principles
To excite and form electron and hole pairs, the QDs must be irradiated with sunlight
having energy equal to its bandgap energy. Different chemical processes occur during
charge separation and transit
Here, the letters e and h stand for electron and hole, respectively.
Following the above process, the transportation of chargers at wide bandgap (WBG)
SC/QD interface as follows.
Here, Red and Ox denote the reduction and oxidation of electrolytes respectively.
Also, the size of the QD is the parameter that determines the separation of charges at
the WBG SC/QD interface. The reduction of the size of QD results in the
improvement of electron transport.
Working of (a) DSSC and (b) QDSSC
4. Fabrication techniques
Usually, screen printing is the most suited process to fabricate photoanode with
mesoporous spherical shape while spin coating or spray pyrolysis is used for seed
layer deposition. The hydrothermal process is most suited for processes such as
creating vertical one-dimensional or hierarchical structures.
5. QD sensitizing layer
And in the preparation of the QD sensitizing layer, the in-situ method or the
ex-situ methods are used to deposit the QD layer on a semiconductor coated electrode.
In-situ methods are often used as a manufacturing process in QDSSC technologies as
they are simple and low cost. Which makes them an ideal choice for large-scale
manufacturing. There are two processes which mainly used in in-situ QD deposition
namely, chemical bath deposition (CBD) and sequential ionic layer absorption and
reaction (SILAR).
The sequential ionic layer absorption and reaction method is mostly used for thin film
deposition of large-area thin films because of its economical, easy, and convenient
capabilities. It primarily depends on processes of absorption and reaction of ions from
solutions. Also to avoid homogeneous precipitation in the solution, washing with
deionized water in between each immersion is done.
The growth mechanism consists of three main phases. First, the compound’s most
strongly adsorbed ions which have been grown by the substrate while immersed in a
solution of one of its cationic precursors were specifically adsorbed. Then the excess
solution which still adheres to the substrate is water rinsed. And finally, chemical
reactions occur between the adsorbed cations and anions. Factors such as optimization
of precursor concentrations, pH of the solutions, adsorption, reaction and washing
times, etc. determine the quality of the thin films.
When depositing ex-situ grown QDs, the size and the form of the
monodisperse QDs are adjusted by synthesizing using organic capping ligands. After
the production, the QDs are removed from the additional organic ligands. Next, they
are dissolved in an organic solvent and then connected the TiO2 electrodes. In order
to address the issue of not bonding between the layers of QDs and mesoporous TiO2,
mercapto-carboxylic acid is used as a bifunctional molecular linker. In the dipping
process of electrode in mercapto-carboxylic acid ligands, the change in surface of
TiO2 occurs. This process is known as the dip coating. This allows the carboxylic
acid groups to be bonded with TiO2 surface. Then this modified TiO2 electrode is
submerged in the QDs solution which allows the QDs to diffuse into the pores and the
binding the QDs with TiO2 surface is done by the mercapto groups using partial
ligand exchange.
Another method of depositing particles on TiO2 surface is the electrophoretic QD
deposition process.
6.1.Sensitizer Materials
When it comes to the semiconductor sensitizer materials in QDSSCs, most widely
used materials are CdS and CdSe. That is due to the reasons such as their harvesting
ability sun’s spectrum’s several regions and their good charge separation properties.
This is the process of hole removal with the use of electron injection into wide band
gap oxide and redox electrolyte. Based on the numerous studies done in recent years,
the possibility of using sensitizer materials such as QD sensitizers have been
improved rapidly. It has resulted a rapid growth of QDSSC conversion related
efficiencies too. Those boost in performanes were done making canges to the
semiconductor materials such as CdS or CdSe structures.
Recombination losses are also can be reduced in the triple junction. This is done by
the use of semiconductor quantum rods (QR). The semiconductor quantum rods are
used to replace the QD particles which are typically used at the TiO2/QDs/electrolyte
triple junction. By this method, the photogenerated charges are efficiently separated
by the rodlike particles which have a high aspect ratio. Because of that the holes
diffuse to one end of the particle while the electrons diffuse to the other.
References
[1] S.A. McDonald, G. Konstantatos, S. Zhang, P.W. Cyr, E.J.D. Klem, L. Levina, E.
H. Sargent, Solution-processed PbS quantum dot infrared photodetectors and
photovoltaics, Nat. Mater. 4 (2005) 138–142,doi.org/10.1038/
nmat1299.
[2] H.S. Kim, C.R. Lee, J.H. Im, K.B. Lee, T. Moehl, A. Marchioro, S.J. Moon,
R. Humphry-Baker, J.H. Yum, J.E. Moser, M. Grätzel, N.G. Park, Lead iodide
perovskite sensitized all-solid-state submicron thin film mesoscopic solar
cell efficiency exceeding 9%, Sci. Rep. 2 (2012) 591,doi.org/10.1038/
srep00591.
[3] M.C. Hanna, A.J. Nozik, Solar conversion efficiency of photovoltaic and
photoelectrolysis cells with carrier multiplication absorbers, J. Appl. Phys. 100
(2006) 074510,doi.org/10.1063/1.2356795.
[4] B. O’Regan, M. Grätzel, A low-cost, high-efficiency solar cell based on
dyesensitized colloidal TiO2 films, Nature 353 (1991) 737–740,doi.org/
10.1038/353737a0.
[7] O.E. Semonin, J.M. Luther, M.C. Beard, Quantum dots for next-generation
photovoltaics, Materials Today 15 (11) (2012) 508–515, doi.org/
10.1016/S1369-7021(12)70220-1.
[8] A.J. Nojik, Quantum dot solar cells, Physica E 14 (2002) 115–120,
doi.org/10.1016/S1386-9477(02)00374-0.
[10] P.V. Kamat, Quantum dot solar cells. The next big thing in photovoltaics, J.
Phys. Chem. Lett. 4 (2013) 908–918, http://dx.doi.org/10.1021/jz400052e.
[11] I. Hod and A. Zaban, “Materials and Interfaces in Quantum Dot Sensitized
Solar Cells: Challenges, Advances and Prospects,” Langmuir, vol. 30, no. 25.
American Chemical Society (ACS), pp. 7264–7273, Dec. 26, 2013. doi:
10.1021/la403768j.
[12] S.M. SZE, and M. K. LEE, “Semiconductor Devices: Physics and Technology”
3rd edition, 2012 John Wiley & Sons, Inc., USA.
[13] Ben G. Streetman and S. K. Banjeerjee, “Solid state electronic devices”, 6th
edition, 2006 Prentice - Hall, Inc. Upper Saddle River, New Jersey, U.S.A.
[14] Greg Parker, “Introductory Semiconductor Devices Physics”, 2004 Taylor &
France Group, LLC, New York, USA.