Chapter 5
Chapter 5
Chapter 5
Layout Design
1
5.1 Understand integrated circuit layout
5.1.1 Explain integrated circuit layout
2
5.1.2 Explain function of integrated circuit
layout
3
5.1.3 Explain two types of circuit layout
a. Stick diagram
b. Actual layout
Stick diagrams and layout representation are used
to convey layer information through the use of a
color code.
5
5.1.4 Relate the connection between stick diagram,
real layouts and photo mask
6
7
Complete mask layout of the CMOS inverter
10
5.1.5 Explain stick diagram color codes
Stick Diagrams
N+ N+
11
Stick Diagrams
VDD
VDD
X
X
x Stick x x
x Diagra X
m
Gnd Gnd
12
Stick Diagrams
VDD
VDD
X
X
x x x
x X
Gnd Gnd
13
Stick Diagrams
14
Stick Diagrams
15
stick diagram colour codes
Layer Color Representation
16
Stick Diagrams – Notations
Metal 1
poly
ndiff
pdiff
Can also draw
in shades of
gray/line style.
17
5.1.6 Explain stick diagram layout rules
Rule 1.
When two or more „sticks‟ of the same type cross
or touch each other that represents electrical
contact.
18
Stick Diagrams
19
Stick Diagrams
21
S.N.Bhat, Faculty, Dept. of E&C Engineering, M.I.T Manipal
22
5.1.7 Explain the stick diagram of a CMOS
inverter using:
a. Weinberger technique
b. Standard cell technique
23
Weinberger Structuring
Is a structured approach that simplifies structural
layout and improves layout density. Method
presented by Weinberger in 1967.
Weinberger Arrays:
• Are created by placing transistors on the chip
in a geometrically regular manner. Horizontal
and vertical interconnect patterns are used to
wire the devices together.
Using one type of gate (ex. NOR) complex
NMOS circuits can be realized.
Regularity of Weinberger Arrays is very suitable
for automatic layout generation. 24
25
Standard cell technique
26
27
Power
A Out
Ground
28
5.1.8 Convert static CMOS logic circuit into
stick diagram using Euler Path method
29
Euler Path
The Euler path technique has been used in what
is called the “standard cell technique”, which
results in a dense layout for CMOS gates and
one polysilicon strip that can serve as the input to
both NMOS and PMOS devices.
30
Method: Stick diagrams are
constructed in two steps.
A) Identify each transistor by a unique
name of its gate signal (A, B, C in the
example of Figure 1).
31
The second step is to construct one Euler path for both the
Pull up and Pull down network.
32
33
Two Versions of C • (A + B)
A C B A B C
VDD VDD
X X
GND GND
34
Logic Graph
A C
B D
X = (A+B)•(C+D)
C D
A B
A
B
C
D
35
36
37
38
5.2 Apply knowledge of integrated circuit layout in drawing
stick
5.2.1 draw stick diagram for:
a. CMOS inverter
b. 2-input NAND gate
c. 2-input NOR gate
39
5.3 Design stick diagram for basic logic gates and complex
Boolean function
5.3.1 design stick diagram for:
40
5.4 Understand integrated circuit design
rules in designing the integrated circuit
layout
41
5.4.1 Explain purpose of design rules
Design Rules
Interface between the circuit designer and process engineer
Guidelines for constructing process masks
Unit dimension: minimum line width
scalable design rules: lambda parameter
absolute dimensions: micron rules
Rules constructed to ensure that design works even when small
fab errors (within some tolerance) occur
A complete set includes
set of layers
intra-layer: relations between objects in the same layer
inter-layer: relations between objects on different layers
43
Why Have Design Rules?
To be able to tolerate some level of
fabrication errors such as:
1. Mask misalignment
2. Dust
3. Process parameters
(e.g., lateral diffusion)
4. Rough surfaces
5.4.2 Explain at least four general design rules
Intra-Layer Design Rule Origins
Minimum dimensions (e.g., widths) of objects on each layer to
maintain that object after fab
minimum line width is set by the resolution of the patterning
process (photolithography)
Minimum spaces between objects (that are not related) on the
same layer to ensure they will not short after fab
0.3 micron
0.15
0.3 micron
0.15
Inter-Layer Design Rule Origins
1. Transistor rules – transistor formed by overlap of
active and poly layers
Transistors
Catastrop
hic error
Thinner diffusion,
but still working
Inter-Layer Design Rule Origins, Con’t
2. Contact and via rules
M1 contact to p-diffusion
M1 contact to n-diffusion
M1 contact to poly
Contact Mask
mask misaligned
both materials0.3 Contact: 0.44 x 0.44
0.14
5.4.3 Explain two measurement units used in geometry rules:
Lambda, Micron
49
5.4.4 Explain basic geometry rules:
a.Minimum layer size/width
b.Minimum layer separation
c.Minimum layer overlap
MOSIS portable cmos design rules
53
CMOS Joining Rules
56
Layout editor
5.5 Design integrated circuit layout:
5.5.1 Design layout of simple digital circuit system using
appropriate CAD tools for Half adder/ Full adder/ BCD
58
5.5.2 Produce Design Rule Check(DRC) of the circuit layout