Oxide Nanowires For Spintronics: Materials and Devices: Cite This: Nanoscale, 2012, 4, 1529
Oxide Nanowires For Spintronics: Materials and Devices: Cite This: Nanoscale, 2012, 4, 1529
Oxide Nanowires For Spintronics: Materials and Devices: Cite This: Nanoscale, 2012, 4, 1529
Spintronics, or spin-based data storage and manipulation technology, is emerging as a very active
research area because of both new science and potential technological applications. As the
Downloaded by Nanyang Technological University on 30 March 2012
characteristic lengths of spin-related phenomena naturally fall into the nanometre regime, researchers
start applying the techniques of bottom-up nanomaterial synthesis and assembly to spintronics. It is
envisaged that novel physics regarding spin manipulation and domain dynamics can be realized in
quantum confined nanowire-based devices. Here we review the recent breakthroughs related to the
applications of oxide nanowires in spintronics from the perspectives of both material candidates and
device fabrication. Oxide nanowires generally show excellent crystalline quality and tunable physical
properties, but more efforts are imperative as we strive to develop novel spintronic nanowires and
devices.
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1529
View Online
from diamagnetic, paramagnetic, to FM and antiferromagnetic bottom-up nanostructures are potential building blocks for the
(AFM). They can also possess notable dielectric properties both nanoscale electronics and photonic devices.15–21
in the low-k and high-k regimes, and can be ferroelectric and Here, we focus on the perspective of applying oxide nanowires
piezoelelctric. Surface chemical reactivity of oxides can be in spintronic applications. On the material aspect, we will discuss
tailored from being highly active to inert. All these functionalities the physical properties of nanowires made of wide-bandgap
stem from the strong and complex coupling between charge, oxides, colossal magnetoresistance oxides, and other half-
spin, orbital, and lattice degrees of freedom in the material metallic oxides. On the device aspect, we will review some
systems (Fig. 1).10 notable examples of spintronic devices, the advantages of
Driven by the needs for miniaturization in many areas of incorporating bottom-up nanowires, and the associated
modern technology, more-and-more attention is paid to the challenges.
nanoscale systems. This is enabled by the significant break-
throughs in deposition technologies, lithography processing, and
characterization tools, which are accompanied by new insights in 2. Materials candidates for spintronic nanowires
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
part, instead they can bring about many ‘‘emergent phenomena’’ Since the theoretical prediction of a hole-mediated RTFM in
such as quantum confinement and proximity effects.11 Nano- Mn-doped ZnO at a carrier concentration around 1020 cm3,7
structures including nanowires, nanotubes, nanorods, and transition metal doped wide-bandgap oxides such as ZnO, TiO2,
nanoparticles represent an exciting and rapidly expanding In2O3, SnO2, and (In, Sn)2O3 (ITO) have been regarded as
research area that crosses the borders between physics, chem- promising candidates for high Curie temperature dilute magnetic
istry, biology, engineering, and materials science.12–14 These oxides (DMOs). Although extensive experimental investigations
have been performed on both undoped and transition-metal-
doped DMOs,22–27 the complex magnetic behavior is found to
sensitively depend on the concentrations of doped cations,
carriers, defects, and synthesis details.27
In many cases, the formation of metallic clusters or magnetic
secondary phases,28 even artefacts and contaminations are
responsible for the observed magnetic signals.29 In terms of
intrinsic mechanisms, for DMOs with high carrier concentra-
tions, long-range FM order can be Ruderman–Kittel–Kasuya–
Yoshida (RKKY) or double exchange type.10,30,31 For highly
insulating DMOs, the long range FM exchange is mediated by
localized carriers in the impurity band to form bound magnetic
polarons.27,32 RTFM was also observed in undoped oxides,
known as d0 ferromagnetism, which is closely related to the
defects.33 Coey et al. proposed a general charge transfer model,
where the FM order is linked to itinerant carriers associated with
structural defects and TM dopants.34 Despite the large number of
Fig. 1 Schematic diagram showing the intricate coupling between
studies in this field, the mechanisms of ferromagnetism in DMOs
charge, spin, orbital and lattice in transition metal oxides, as well as the
close relationship between various research fronts.
remain unclear, and the present status is discussed in several
recent reviews.10,35
Nanowires are often single phase and highly crystalline, and
they are ideal single-domain building blocks for constructing
Tom Wu obtained his bachelor spintronic nanodevices. High quality ZnO,36–38 In2O3,39,40 and
degree from Zhejing University TiO241 nanowires can be routinely synthesized. Their
(China) in 1995. After receiving morphology can be well controlled by catalyst,37,42 precursor,43
his PhD from University of pressure, and geometry44 during synthesis, also by post-growth
Maryland in 2002, he worked as treatments such as annealing45 and coating.45–48 Pioneer works
a postdoctoral scientist in indicate that ferromagnetism can be stabilized in various wide-
Argonne National Laboratory. bandgap oxides nanowires or nanorods doped with transition
In 2006, he joined Nanyang metals, including ZnO doped with Co,49–52 Mn,52–54 Ni,50 Cu,55–57
Technological University (Sin- and FeCo;58 TiO2 doped with Fe,59 Co,60,61 and Cr;60 SnO2 doped
gapore) as an assistant with Co,62 Mn,63 Ni,64 and Cu,65 and even in oxide nanowires
professor. His research group doped with nonmagnetic elements, such as ZnO doped with C66
focuses on synthesizing a wide and N.67 The large surface-to-volume ratios of nanowires can
range of oxide nanomaterials greatly enhance ferromagnetism through surface defects68 or
Tom Wu and thin films, and fabricating structural/compositional inhomogeneity.55,56 As an example, the
novel field effect and memory nanostructure and magnetic properties of well aligned Cu-doped
devices. ZnO nanowires were shown in Fig. 2.
1530 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012
View Online
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1531
View Online
1532 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012
View Online
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
Downloaded by Nanyang Technological University on 30 March 2012
Fig. 5 (a) MR of individual Fe3O4 nanowires measured at different temperatures. (b) Schematic of the device. (c) FM order of Fe3O4, where the
minority carriers are responsible for the transport. (d) Bias dependence of MR for the Fe3O4 nanowire-based devices. Copyright 2006 American
Chemical Society, reproduced from ref. 122 with permission.
2.4 Ferroelectric and multiferroic oxides 3. Spintronic devices based on oxide nanowires
Nanowires of perovskite ferroelectric oxides, e.g., BaTiO3, have 3.1 Fabrication techniques: top down vs. bottom up
been used in energy harvesting devices,136,137 photonics, and
nanoelectromechanical systems.138 Molten-salt method is effec- Perhaps the most realistic approach to realize practical nanowire-
tive to produce nanostructures of complex oxides, e.g., nano- based spintronic devices is the ‘‘top-down’’ technique, in which
particles, nanocubes, nanoblets, and nanoflowers.139 Using some form of lithography, such as electron beam/optical lithog-
a scanned probe microscope, Yun et al. demonstrated that raphy,148,149 nanoimprint lithography,150 or m-contact printing151,152
nonvolatile electric polarization can be reproducibly induced and is used to pattern desired nanostructures. Besides, focused ion
manipulated on single crystal BaTiO3 nanowires.140 The ferro- beam technique153,154 or chemical etching in conjunction with
electricity is retained in nanowires as thin as 0.8 nm, which can be suitable masks can also be used to carve out nanowires from an
attributed to surface adsorbates such as OH and carboxylates.141 oxide film. In addition, Suzuki et al. invented a unique combination
Multiferroic materials show simultaneous ferroelectric and of atomic force microscopy lithography and Mo lift-off technique
magnetic orders, promising novel applications.142 Among them, to create oxide nanowires with dimensions down to 100 nm.155
BiFeO3 (BFO) has received the most attention, due to its high The lithography process has the advantage of excellent
ferroelectric Curie temperature (1103 K) and the AFM Neel controls over position and shape of the nanowires, and making
temperature (647 K). Periodic ferroelectric domains143 and contacts and multilayers always involve lithography. However,
electrical control of AFM domains144 have been realized in top-down fabrication often entails expensive equipment and
BFO. Different from the AFM order in bulk BFO, weak complicated processing. Furthermore, most of the oxide mate-
ferromagnetism and superparamagentic behaviour at low rials need high deposition temperature, and the typical electron
temperature were observed in polycrystalline nanowires, indi- beam and photo resists are incompatible with this requirement.
cating significant size effects on the magnetic order of The bottom-up synthesis mainly refers to the self-assembly of
BFO.145,146 Synthesis of single crystalline BFO nanowires has nanowires without involving any lithography. It has advantages
not been reported yet, which is also the status for many other in terms of mass production and cost-effectiveness. In addition,
complex oxides. Ground breaking efforts are needed to realize the bottom-up nanowires are single crystalline and free from
high quality nanowires of complex perovskite oxides with defects such as edge roughness, which is a major challenge in
controlled composition and morphology. A promising lithographically patterned nanowires. So far there has been few
approach towards well ordered complex oxide nanostructures is work on using self-assembled nanowires in spintronic devices,
to combine lithography and epitaxial thin film growth,147 which and a series of baby steps need to be taken, such as rational
will hopefully facilitate future studies. nanoscale synthesis, controlled positioning of nanowires, making
multilayer structure, and creating good electrical contacts.
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1533
View Online
In some cases, combining top-down and bottom-up techniques et al.180 grew in-plane nanowire stacks of Py, Cu and Co using
have more advantages.156,157 Lithographically patterned resists interference lithography and ion milling. Core–shell nanowires
can be used as masks and then directed growth of oxide nano- were also demonstrated recently, which act as integrated spin
wires is achieved by spin coating of sol–gel precursors. Recently, valves (Fig. 6).181 The fully functional devices contain a chemical-
there have been a few reports on creating oxide nanowires by vapor-deposited Ni core nanowire which was surrounded by
using laser interference techniques.158–160 In this process a peri- sequential shell layers of CoO(10 nm)–Co(5 nm)–Cu(5 nm)–
odic interference pattern can be generated by using a laser source Co(5 nm) deposited by sputtering, and a MR effect of 9% was
and prisms with different numerical apertures, creating regular reported in this structure.
arrays of oxide nanowires. While nanowire based spin valves with transition metals have
Guided synthesis and assembly have been demonstrated in been extensively exploited, similar devices with oxide ferromag-
nanowire-based devices. Dai showed that the locations of carbon nets have been rarely reported. Recently, Gaucher et al.182
nanotubes can be controlled by using lithographically patterned successfully fabricated La2/3Sr1/3MnO3 nanowires with the
catalytic nanoparticles, and their growth directions can be smallest width of 65 nm by combining electron beam lithography
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
determined by van der Waals self-assembly forces and applied and ion beam etching. They showed that the electronic transport
electric fields.161 The electrical-field-controlled alignment of properties of these oxide nanowires are comparable to those of
Downloaded by Nanyang Technological University on 30 March 2012
nanowires was also demonstrated for semiconductor nano- unpatterned films. Goto et al. demonstrated GMR effect in
wires,162,163 and Langmuir–Blodgett (LB) technique was used for (Fe,Mn)3O4 nanowires with constrictions, which serve as lateral
similar purposes.164 In addition, structures of crossed nanowires, spin valves with pinned domain walls.183
suitable for memory devices and logic circuits, have also been Oxide nanowires are very promising to serve as building blocks
realized by using a combination of top-down and bottom-up in lateral spin valves or MTJs. One possible scheme starts with
approaches.165,166 Such fabrication techniques should be feasible bottom-up synthesized FM oxide nanowire, and a small portion
for making spintronic devices with oxide nanowires. of the nanowire can be converted into nonmagnetic by using
techniques like selective Ar+ ion milling, resulting in FM-NM-
FM lateral devices. Such nanowire-based spintronic devices are
3.2 Spin valve and magnetic tunnel junctions
attractive, but the central modified region must be thin enough to
Spin valve may be the most influential spintronic device which retain the spin coherent transport. Recently, Dai et al. theoreti-
has already found applications in magnetic data storage cally showed that by selective partial hydrogenation of C-doped
industry. Its basic working principle is the GMR effect,1,2 where ZnO nanowires, it is possible to create a nanowire-based MTJ
the resistance of a FM/NM/FM multilayer depends on the (Fig. 7).66 Electronic phase separation in manganites may be
relative alignment between the two FM layers; In general, an exploited to realize such lateral nanowire-based devices.
antiparallel alignment gives rise to larger resistance than the
parallel alignment. Most GMR research focuses on transition
metals, but spin valves have also been realized in oxides, in 3.3 Magnetic domain walls and spin transfer torque in oxide
particular FM manganites.167,168 nanowires
A related concept is the magnetic tunnel junction (MTJ)169,170 A magnetic domain wall separates two oppositely polarized
which also has vast applications in nonvolatile magnetic memory magnetic regions, and a number of data storage schemes based
devices. The basic difference between spin valve and MTJ lies in
the middle spacer layer, which needs to be insulating for MTJ,
whereas for spin valve, this layer is conducting. A number of
efforts have been devoted to create oxide based MTJ devices so
far, especially due to the 100% spin polarization in several FM
oxides, such as La1xSrxMnO3 (LSMO) with x 0.33, CrO2 and
Fe3O4. Lu et al.171 and Sun et al.172 first fabricated all-oxide MTJ
device with LSMO and SrTiO3 as FM and insulating layer,
respectively. Subsequently, a record tunneling magnetoresistance
(TMR) ratio of 1850% was reported in 2003 by Bowen et al.173
Despite these promising results, a major issue for the oxide based
MTJ devices is that the working temperature is often lower than
the room temperature, generally ascribed to the degraded
interfaces.174,175
Nanowire-based spin-valve devices were first realized in
metallic systems. Piraux et al.176 and Blondel et al.177 reported on
such devices based on NiFe/Cu and Co/Cu by using electro-
deposition in nanoporous polymer templates. In 2000, Evans
et al.178 synthesized multilayered (Co–Ni–Cu/Cu) nanowire spin Fig. 6 Schematic of a core–shell nanowire-based spin valve device. The
valves in anodic aluminum oxide (AAO) membranes which CoO shell biases the Co reference layer, and Cu acts as the nonmagnetic
showed very large GMR effect (55% at room temperature and spacer. The inset shows the scanning electron microscopy (SEM) image
115% at 77 K). Among other works, Dubois et al. used permalloy of such a device. Copyright 2010 IEEE Magnetic Society, reproduced
(Py) and Cu stacked in a vertical template,179 whereas Casta~ no from ref. 181 with permission.
1534 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012
View Online
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
Downloaded by Nanyang Technological University on 30 March 2012
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1535
View Online
1536 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012
View Online
spin-polarized carriers, which can eventually lead to all-oxide 11 E. E. Fullerton and I. K. Schuller, ACS Nano, 2007, 1, 384–389.
spin-FET devices. 12 J. I. Martın, J. Nogues, K. Liu, J. I. Vicent and I. K. Schuller, J.
Magn. Magn. Mater., 2003, 256, 449–501.
13 X. W. Lou, L. A. Archer and Z. C. Yang, Adv. Mater., 2008, 20,
4. Conclusions 3987–4019.
14 A. J. Mieszawaska, R. Jalilian, G. U. Sumanasekera and
Nanowires of wide-bandgap oxides, mixed-valence manganites, F. P. Zamborinni, Small, 2007, 3, 722–756.
15 C. M. Lieber and Z. L. Wang, MRS Bull., 2007, 32, 99–104.
half-metallic oxides, and multiferroic oxides are promising 16 S. Nadj-Perge, S. M. Frolov, E. P. A. M. Bakkers and
candidates for potential applications in spintronics. Their phys- L. P. Kouwenhoven, Nature, 2010, 468, 1084–1087.
ical properties can be genuinely different from the bulk coun- 17 X. F. Duan, C. M. Liu, V. Sahi, J. Chen, J. Wallace Parce,
terparts due to excellent crystallinity, size effects, surface states, S. Empedocles and J. L. Goldman, Nature, 2003, 425, 274–278.
18 A. M. Morales and C. M. Lieber, Science, 1998, 279, 208–211.
broken symmetry, and so on. With rational materials design, 19 O. Hayden, A. B. Greytak and D. C. Bell, Adv. Mater., 2005, 17,
multiple functionalities such as enhanced ferromagnetism, 701–704.
improved low-field MR, and polarized light emission can be 20 L. J. Lauhon, M. S. Gudiksen, D. Wang and C. M. Lieber, Nature,
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1537
View Online
47 H. Y. Yang, S. F. Yu, G. P. Li and T. Wu, Opt. Express, 2010, 18, 82 X. Qiu, L. Li, C. Tang and G. Li, J. Am. Chem. Soc., 2007, 129,
13647–13654. 11908–11909.
48 K. W. Liu, R. Chen, G. Z. Xing, T. Wu and H. D. Sun, Appl. Phys. 83 K. F. Eid, B. L. Sheu, O. Maksimov, M. B. Stone, P. Schiffer and
Lett., 2010, 96, 023111. N. Samarth, Appl. Phys. Lett., 2005, 86, 152505.
49 J. B. Cui, Q. Zeng and U. J. Gibson, J. Appl. Phys., 2006, 99, 84 X.-W. Zhang, W.-J. Fan, Y.-H. Zheng, S.-S. Li and J.-B. Xia, Appl.
08M113. Phys. Lett., 2007, 90, 253110.
50 J. B. Cui and U. J. Gibson, Appl. Phys. Lett., 2005, 87, 133108. 85 A. J. Chiquito, A. J. C. Lanfredi, R. F. M. de Oliveira, L. P. Pozzi
51 B. D. Yuhas, D. O. Zitoun, P. J. Pauzauskie, R. He and P. D. Yang, and E. R. Leite, Nano Lett., 2007, 7, 1439–1443.
Angew. Chem., Int. Ed., 2006, 45, 420–423. 86 W. Liang, B. D. Yuhas and P. Yang, Nano Lett., 2009, 9, 892–896.
52 G. Clavel, N. Pinna and D. Zitoun, Phys. Status Solidi A, 2007, 204, 87 Z. Liu, D. Zhang, S. Han, C. Li, T. Tang, W. Jin, X. Liu, B. Lei and
118–124. C. Zhou, Adv. Mater., 2003, 15, 1754–1757.
53 J. J. Liu, M. H. Yu and W. L. Zhou, Appl. Phys. Lett., 2005, 87, 88 L. Liao, H. J. Fan, B. Yan, Z. Zhang, L. L. Chen, B. S. Li,
172505. G. Z. Xing, Z. X. Shen, T. Wu, X. W. Sun, J. Wang and T. Yu,
54 U. Philipose, S. V. Nair, S. Trudel, C. F. de Souza, S. Aouba, ACS Nano, 2009, 3, 700–706.
R. H. Hill and H. E. Ruda, Appl. Phys. Lett., 2006, 88, 263101. 89 B. Lei, C. Li, D. Zhang, Q. F. Zhou, K. K. Shung and C. Zhou, Appl.
55 G. Z. Xing, J. B. Yi, J. G. Tao, T. Liu, L. M. Wong, Z. Zhang, Phys. Lett., 2004, 84, 4553–4555.
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
G. P. Li, S. J. Wang, J. Ding, T. C. Sum, C. H. A. Huan and 90 Z. Zhang, Y. H. Sun, Y. G. Zhao, G. P. Li and T. Wu, Appl. Phys.
T. Wu, Adv. Mater., 2008, 20, 3521–3527. Lett., 2008, 92, 103113.
56 T. Kataoka, Y. Yamazaki, V. R. Singh, A. Fujimori, F.-H. Chang, 91 C.-H. Chen, S.-J. Chang, S.-P. Chang, M.-J. Li, I.-C. Chen,
Downloaded by Nanyang Technological University on 30 March 2012
H.-J. Lin, D. J. Huang, C. T. Chen, G. Z. Xing, J. W. Seo, T.-J. Hsueh and C.-L. Hsu, Appl. Phys. Lett., 2009, 95, 223101.
C. Panagopoulos and T. Wu, Phys. Rev. B: Condens. Matter 92 S. Jin, T. H. Tiefel, M. McCormack, R. A. Fastnacht, R. Ramesh
Mater. Phys., 2011, 84, 153203. and L. H. Chen, Science, 1994, 264, 413–415.
57 M. Shuai, L. Liao, H. B. Lu, L. Zhang, J. C. Li and D. J. Fu, J. Phys. 93 J. Hemberger, A. Krimmel, T. Kurz, H.-A. Krug von Nidda,
D: Appl. Phys., 2008, 41, 135010. V. Yu. Ivanov, A. A. Mukhin, A. M. Balbashov and A. Loidl,
58 L. Q. Liu, B. Xiang, X. Z. Zhang, Y. Zhang and D. P. Yu, Appl. Phys. Rev. B: Condens. Matter, 2002, 66, 094410.
Phys. Lett., 2006, 88, 063104. 94 C. Israel, M. J. Calder
on and N. D. Mathur, Mater. Today, 2007, 10,
59 Y. Ding, W.-Q. Han and L. H. Lewis, J. Appl. Phys., 2007, 102, 24–32.
123902. 95 J. M. D. Teresa, A. Barthelemy, A. Fert, J. P. Contour, F.Montaigne
60 D. W. Chu, Y.-P. Zeng, D. L. Jiang and Y. Masuda, Sci. Adv. and P. Seneor, Science, 1999, 286, 507–509.
Mater., 2009, 1, 227–229. 96 K. Jin, H. Lu, K. Zhao, C. Ge, M. He and G. Yang, Adv. Mater.,
61 Y.-H. Lee, J.-M. Yoo, D.-H. Park, D. H. Kim and B. K. Ju, Appl. 2009, 21, 4636–4640.
Phys. Lett., 2005, 86, 033110. 97 T. Wu, S. B. Ogale, S. Shinde, A. Biswas, T. Polletto, R. L. Greene,
62 S. Ge, J. Yin and H. Zhang, J. Appl. Phys., 2008, 104, 063906. T. Venkatesan and J. J. Millis, J. Appl. Phys., 2003, 93, 55007.
63 J. Chi, H. Ge, J. Wang, Y. Zuo and L. Zhang, J. Appl. Phys., 2011, 98 T. Wu and J. F. Mitchell, Appl. Phys. Lett., 2005, 86, 062502.
110, 083907. 99 K. Zhao, K.-J. Jin, H.-B. Lu, M. He, Y.-H. Huang, G.-Z. Yang and
64 K. Srinivas, S. M. Rao and P. V. Reddy, Nanoscale, 2011, 3, 642– J. D. Zhang, Appl. Phys. Lett., 2008, 93, 252110.
653. 100 T. Wu, S. B. Ogale, J. E. Garrison, B. Nagaraj, A. Biswas, Z. Chen,
65 L. Li, K. Yu, Z. Tang, Z. Zhu and Q. Wan, J. Appl. Phys., 2010, 107, R. L. Greene, R. Ramesh and T. Venkatesan, Phys. Rev. Lett., 2001,
014303. 86, 5998–6001.
66 Z. Dai, A. Nurbawono, A. Zhang, M. Zhou, Y. P. Feng, G. W. Ho 101 C. H. Ahn, J.-M. Triscone and J. Mannhart, Nature, 2003, 424,
and C. Zhang, J. Chem. Phys., 2011, 134, 104706. 1015–1018.
67 Q. Wang, Q. Sun and P. Jena, New J. Phys., 2009, 11, 063035. 102 C. H. Ahn, A. Bhattacharya, M. D. Ventra, J. N. Eckstein,
68 G. Z. Xing, J. B. Yi, D. D. Wang, L. Liao, T. Yu, Z. X. Shen, C. D. Frisbie, M. E. Gershenson, A. M. Goldman, I. H. Inoue,
C. H. A. Huan, T. C. Sum, J. Ding and T. Wu, Phys. Rev. B: J. Mannhart, A. J. Millis, A. F. Morpurgo, D. Natelson and
Condens. Matter Mater. Phys., 2009, 79, 174406. J.-M. Triscone, Rev. Mod. Phys., 2006, 78, 1185–1212.
69 A. Kolmakov, Y. Zhang, G. Cheng and M. Moskovits, Adv. Mater., 103 T. Wu and J. F. Mitchell, Phys. Rev. B: Condens. Matter Mater.
2003, 15, 997–1000. Phys., 2006, 74, 214423.
70 X. Xue, L. Xing, Y. Chen, S. Shi, Y. Wang and T. Wang, J. Phys. 104 T. Wu and J. F. Mitchell, Appl. Phys. Lett., 2005, 86, 252505.
Chem. C, 2008, 112, 12157–12160. 105 Y. G. Zhao, W. Cai, J. Zhao, X. P. Zhang, B. S. Cao, M. H. Zhu,
71 D. Zhang, Z. Liu, C. Li, T. Tang, X. Liu, S. Han, B. Lei and L. W. Zhang, S. B. Ogale, T. Wu, T. Venkatesan, L. Lu,
C. Zhou, Nano Lett., 2004, 4, 1919–1924. T. K. Mandal and J. Gopalakrishnan, Phys. Rev. B: Condens.
72 B. Liu and E. S. Aydil, J. Am. Chem. Soc., 2009, 131, 3985–3990. Matter, 2002, 65, 144406.
73 Y.-L. Chueh, C.-H. Hsieh, M.-T. Chang, L.-J. Chou, C. S. Lao, 106 Y. G. Zhao, W. Cai, J. Zhao, X. P. Zhang, R. Fan, B. S. Cao,
J. H. Song, J.-Y. Gan and Z. L. Wang, Adv. Mater., 2007, 19, M. H. Zhu, T. Wu, S. B. Ogale, S. R. Shinde, T. Venkatesan,
143–149. Q. Y. Tu, T. K. Mandal and J. Gopalakrishnan, J. Appl. Phys.,
74 H. Wu, L. Hu, T. Carney, Z. Ruan, D. Kong, Z. Yu, Y. Yao, 2002, 92, 5391–5394.
J. J. Cha, J. Zhu, S. Fan and Y. Cui, J. Am. Chem. Soc., 2011, 107 Z. Chen, A. Biswas, I. Zutic, T. Wu, S. B. Ogale, R. L. Greene and
133, 27–29. T. Venkatesan, Phys. Rev. B: Condens. Matter, 2001, 63, 212508.
75 Z. P. Wei, D. L. Guo, B. Liu, R. Chen, L. M. Wong, W. F. Yang, 108 B. Nagaraj, T. Wu, S. B. Ogale, T. Venkatesan and R. Ramesh, J.
S. J. Wang, H. D. Sun and T. Wu, Appl. Phys. Lett., 2010, 96, Electroceram., 2002, 8, 233–241.
031902. 109 J. J. Urban, L. Ouyang, M.-H. Jo, D. S. Wang and H. K. Park, Nano
76 J. Gao, R. Chen, D. H. Li, L. Jiang, J. C. Ye, X. C. Ma, X. D. Chen, Lett., 2004, 4, 1547–1550.
Q. H. Xiong, H. D. Sun and T. Wu, Nanotechnology, 2011, 22, 110 A. Carretero-Genevrier, N. Mestres, T. Puig, A. Hassini, J. Or o,
195706. A. Pomar, F. Sandiumenge, X. Obradors and E. Ferain, Adv.
77 R. Chen, G. Z. Xing, J. Gao, Z. Zhang, T. Wu and H. D. Sun, Appl. Mater., 2008, 20, 3672–3677.
Phys. Lett., 2009, 95, 061908. 111 K. S. Shankar, S. Kar, A. K. Raychaudhuiri and G. N. Subbanna,
78 H. Y. Yang, H. Y. Yang, S. F. Yu, S. P. Lau, S. H. Tsang, G. Z. Xing Appl. Phys. Lett., 2004, 84, 993–995.
and T. Wu, Appl. Phys. Lett., 2009, 94, 241121. 112 B. Jugdersuren, S. Kang, R. S. DiPietro, D. Heiman, D. McKeown,
79 H. Y. Yang, S. F. Yu, S. P. Lau, J. Gao and T. Wu, Appl. Phys. Lett., I. L. Pegg and J. Philip, J. Appl. Phys., 2011, 109, 016109.
2009, 95, 131106. 113 Z. Zhang, R. Ranjith, B. T. Xie, L. You, L. M. Wong, S. J. Wang,
80 Q. Kuang, Z.-Y. Jiang, Z.-X. Xie, S.-C. Lin, Z.-W. Lin, S.-Y. Xie, J. L. Wang, W. Prellier, Y. G. Zhao and T. Wu, Appl. Phys. Lett.,
R.-B. Huang and L.-S. Zheng, J. Am. Chem. Soc., 2005, 127, 2010, 96, 222501.
11777–11784. 114 M. Egilmez, K. H. Chow and J. A. Jung, Mod. Phys. Lett. B, 2011,
81 Y. Huang, X. Duan, Q. Wei and C. M. Lieber, Science, 2001, 291, 25, 697–722.
630–633. 115 J. Wei and D. Natelson, Nanoscale, 2011, 3, 3509–3521.
1538 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012
View Online
116 R. A. de Groot, F. M. Mueller, P. G. van Engen and 149 T. Arnal, M. Bibes, A. V. Khvalkovskii, A. Aassime, Ph. Lecoeur,
K. H. J. Buschow, Phys. Rev. Lett., 1983, 50, 2024–2027. A. M. Haghiri-Gosnet, B. Mercey, A. K. Zvezdin and
117 J.-H. Park, E. Vescovo, H.-J. Kim, C. Kwon, R. Ramesh and K. A. Zvezdin, J. Magn. Magn. Mater., 2006, 300, e274–e276.
T. Venkatesan, Nature, 1998, 392, 794–796. 150 S. Y. Chou, P. R. Krauss and P. J. Renstorm, Appl. Phys. Lett.,
118 Y. Ji, G. J. Strijkers, F. Y. Yang, C. L. Chien, J. M. Byers, 1995, 67, 3114.
A. Anguelouch, G. Xiao and A. Gupta, Phys. Rev. Lett., 2001, 86, 151 Y. Xia and G. M. Whitesides, Annu. Rev. Mater. Sci., 1998, 28, 153–
5585–5588. 184.
119 H. Y. Hwang and S.-W. Cheong, Science, 1997, 278, 1607–1609. 152 A. Javey, S. Nam, R. S. Friedman, H. Yan and C. M. Lieber, Nano
120 M.-T. Chang, L.-J. Chou, C.-H. Hsieh, Y.-L. Chueh, Z. L. Wang, Lett., 2007, 7, 773–777.
Y. Murakami and D. Shindo, Adv. Mater., 2007, 19, 2290– 153 Y. Du, S. Atha, R. Hull, J. F. Groves, I. Lyubinetsky and
2294. D. R. Baer, Appl. Phys. Lett., 2004, 84, 5213.
121 Q.-L. Ye, Y. Kozuka, H. Yoshikawa, K. Awaga, S. Bandow and 154 Y. Du, J. F. Groves, I. Lyubinetsky and D. R. Baer, J. Appl. Phys.,
S. Iijima, Phys. Rev. B: Condens. Matter Mater. Phys., 2007, 75, 2006, 100, 094315.
224404. 155 N. Suzuki, H. Tanaka and T. Kawai, Adv. Mater., 2008, 20, 909–
122 Z.-M. Liao, Y.-D. Li, J. Xu, J.-M. Zhang, K. Xia and D.-P. Yu, 913.
Nano Lett., 2006, 6, 1087–1091. 156 S. Donthu, T. Sun and V. Dravid, Adv. Mater., 2007, 19, 125–128.
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
123 J. Bachmann, J. Jing, M. Knez, S. Barth, H. Shen, S. Mathur, 157 S. Donthu, Z. Pan, B. Myers, G. Shekhawat, N. Wu and V. Dravid,
U. G€ osele and K. Nielsch, J. Am. Chem. Soc., 2007, 129, 9554–9555. Nano Lett., 2005, 5, 1710–1715.
124 Z. Liu, D. Zhang, S. Han, C. Li, B. Lei, W. Lu, J. Fang and C. Zhou, 158 N. Shirato, J. Strader, A. Kumar, A. Vincent, P. Zhang,
Downloaded by Nanyang Technological University on 30 March 2012
J. Am. Chem. Soc., 2005, 127, 6–7. A. Karakoti, P. Nacchimuthu, H.-J. Cho, S. Seal and
125 S. Han, C. Li, Z. Liu, B. Lei, D. Zhang, W. Jin, X. Liu, T. Tang and R. Kalyanaraman, Nanoscale, 2011, 3, 1090–1102.
C. Zhou, Nano Lett., 2004, 4, 1241–1246. 159 M. Mathews, R. Jansen, G. Rijnders, J. C. Lodder and
126 D. Zhang, Z. Liu, S. Han, C. Li, B. Lei, M. P. Stewart, J. M. Tour D. H. A. Blank, Phys. Rev. B: Condens. Matter Mater. Phys.,
and C. Zhou, Nano Lett., 2004, 4, 2151–2155. 2009, 80, 064408.
127 I. C. Lekshmi, R. Buonsanti, C. Nobile, R. Rinaldi, P. D. Cozzoli 160 N. I. Polushkin, S. A. Gusev, M. N. Drozdov, Y. K. Verevkin and
and G. Maruccio, ACS Nano, 2011, 5, 1731–1738. V. N. Petryakov, J. Appl. Phys., 1997, 81, 5478.
128 V. Skumryev, S. Stoyanov, Y. Zhang, G. Hadjipanayis, D. Givord 161 H. Dai, Acc. Chem. Res., 2002, 35, 1035–1044.
and J. Nogues, Nature, 2003, 423, 850–853. 162 X. Duan, Y. Huang, Y. Cui, J. Wang and C. M. Lieber, Nature,
129 M. Casavola, A. Falqui, M. A. Garcıa, M. Garcıa-Hernandez, 2001, 409, 66–69.
C. Giannini, R. Cingolani and P. D. Cozzoli, Nano Lett., 2009, 9, 163 P. A. Smith, C. D. Nordquist, T. N. Jackson and T. S. Mayer, Appl.
366–376. Phys. Lett., 2000, 77, 1399.
130 D. W. Kavich, J. H. Dickerson, S. V. Mahajan, S. A. Hasan and 164 S. Jin, D. Whang, M. C. McAlpine, R. S. Friedman, Y. Wu and
J.-H. Park, Phys. Rev. B: Condens. Matter Mater. Phys., 2008, 78, C. M. Lieber, Nano Lett., 2004, 4, 915–919.
174414. 165 D. Whang, S. Jin and C. M. Lieber, Jpn. J. Appl. Phys., 2004, 43,
131 R. S. Keizer, S. T. B. Goennenwein, T. M. Klapwijk, G. Miao, 4465–4470.
G. Xiao and A. Gupta, Nature, 2006, 439, 825–827. 166 G. Yu and C. M. Lieber, Pure Appl. Chem., 2010, 82, 2295–2314.
132 Y. Song, A. L. Schmitt and S. Jin, Nano Lett., 2008, 8, 2356–2361. 167 Y. Tokura, A. Urushibara, Y. Moritomo, T. Arima, A. Asamitsu,
133 Q. Zhao, G. Wen, Z. Liu, Y. Fan, G. Zou, L. Li, R. Zheng, G. Kido and N. Furukawa, J. Phys. Soc. Jpn., 1994, 63, 3931–3935.
S. P. Ringer and K.-K. Mao, Nanotechnology, 2011, 22, 168 Y. Moritomo, A. Asamitsu, H. Kuwahara and Y. Tokura, Nature,
125603. 1996, 380, 141–144.
134 A. Schmehl, V. Vaithyanathan, A. Herrnberger, S. Thiel, C. Richter, 169 M. Julliere, Phys. Lett., 1975, 54A, 225–226.
M. Liberati, T. Heeg, M. R€ ockerath, L. F. Kourkoutis, 170 J. Moodera, L. Kinder, T. Wong and R. Meservey, Phys. Rev. Lett.,
S. M€ uhlbauer, P. B€oni, D. A. Muller, Y. Barash, J. Schubert, 1995, 74, 3273–3276.
Y. Idzerda, J. Mannhart and D. G. Schlom, Nat. Mater., 2007, 6, 171 Y. Lu, W. Li, G. Gong, G. Xiao, A. Gupta, P. Lecoeur, J. Sun,
882–887. Y. Wang and V. Dravid, Phys. Rev. B: Condens. Matter, 1996, 54,
135 M. J. Bierman, K. M. Van Heuvelen, D. Schmeiber, T. C. Brunold R8357–R8360.
and S. Jin, Adv. Mater., 2007, 19, 2677–2681. 172 J. Z. Sun, W. J. Gallagher, P. R. Ducombe, L. Krusin-Elbaum,
136 Z. Wang, J. Hu, A. P. Suryavanshi, K. Yum and M.-F. Yu, Nano R. A. Atman, A. Gupta, Y. Lu, G. Q. Gong and G. Xiao, Appl.
Lett., 2007, 7, 2966–2969. Phys. Lett., 1996, 69, 3266.
137 L. Huang, Z. Jia, I. Kymissis and S. O’Brien, Adv. Funct. Mater., 173 M. Bowen, M. Bibes, A. Barthelemy, J.-P. Contour, A. Anane,
2010, 20, 1–7. Y. Lemaitre and A. Fert, Appl. Phys. Lett., 2003, 82, 233.
138 L. Louis, P. Gemeiner, I. Ponomareva, L. Bellaiche, G. Geneste, 174 T. Obata, T. Manako, Y. Shimakawa and Y. Kubo, Appl. Phys.
W. Ma, N. Setter and B. Dkhil, Nano Lett., 2010, 10, 1177–1183. Lett., 1999, 74, 290.
139 H. Liu, C. Hu and Z. L. Wang, Nano Lett., 2006, 6, 1535–1540. 175 J. O’Donnel, A. E. Andrus, S. Oh, E. V. Colla and J. Eckstein, Appl.
140 W. S. Yun, J. J. Urban, Q. Gu and H. Park, Nano Lett., 2002, 2, 447– Phys. Lett., 2000, 76, 218.
450. 176 L. Piraux, J. M. George, J. F. Despres, C. Leroy, E. Ferain,
141 J. E. Spanier, A. M. Kolpak, J. F. Urban, I. Grinberg, L. Ouyang, R. Legras, K. Ounadjela and A. Fert, Appl. Phys. Lett., 1994, 65,
W. S. Yun, A. M. Rappe and H. Park, Nano Lett., 2006, 6, 735–739. 2484.
142 R. Ramesh and N. A. Spaldin, Nat. Mater., 2007, 6, 21–29. 177 A. Blondel, J. P. Meier, B. Doudin and J.-Ph Ansermet, Appl. Phys.
143 Y.-H. Chu, Q. Zhan, L. M. Martin, M. P. Cruz, P.-L. Yang, Lett., 1994, 65, 3019.
G. W. Pabst, F. Zavaliche, S.-Y. Yang, J.-X. Zhang, L.-Q. Chen, 178 P. R. Evans, G. Yi and W. Schwarzacher, Appl. Phys. Lett., 2000, 76,
D. G. Schlom, I.-N. Lin, T.-B. Wu and R. Ramesh, Adv. Mater., 481.
2006, 18, 2307–2311. 179 S. Dubois, L. Piraux, J. M. G. K. Ounadjela, J. L. Duvail and
144 T. Zhao, A. Scholl, F. Zavaliche, K. Lee, M. Barry, A. Doran, A. Fert, Phys. Rev. B: Condens. Matter, 1999, 60, 477–484.
M. P. Cruz, Y. H. Chu, C. Ederer, N. A. Spaldin, R. R. Das, 180 F. J. Casta~ no, S. Haratani, Y. Hao, C. A. Rossb and H. I. Smith,
D. M. Kim, S. H. Baek, C. B. Eom and R. Ramesh, Nat. Mater., Appl. Phys. Lett., 2002, 81, 2809.
2006, 5, 823–829. 181 K. T. Chan, C. Doran, E. G. Shipton and E. E. Fullerton, IEEE
145 F. Gao, Y. Yuan, K. F. Wang, X. Y. Chen, F. Chen, J.-M. Liu and Trans. Magn., 2010, 46, 2209–2211.
Z. F. Ren, Appl. Phys. Lett., 2006, 89, 102506. 182 F. Gaucher, A. Pautrat, S. A. Laurent, C. David, L. E. Calvet,
146 C. J. Cheng, C. L. Lu, Z. H. Chen, L. You, L. Chen, J. L. Wang and Ph. Lecoeur and A. M. Haghiri-Gosnet, Microelectron. Eng., 2009,
T. Wu, Appl. Phys. Lett., 2011, 98, 242502. 86, 820–823.
147 W. Ma, D. Hesse and U. G€ osele, Nanotechnology, 2006, 17, 2536– 183 K. Goto, T. Kanki, T. Kawai and H. Tanaka, Nano Lett., 2010, 10,
2541. 2772–2776.
148 Y. Takamura, R. V. Chopdekar, A. Scholl, A. Doran, J. A. Liddle, 184 S. S. P. Parkin, M. Hayashi and L. Thomas, Science, 2008, 320,
B. Harteneck and Y. Suzuki, Nano Lett., 2006, 6, 1287–1291. 190–194.
This journal is ª The Royal Society of Chemistry 2012 Nanoscale, 2012, 4, 1529–1540 | 1539
View Online
185 R. Cowburn, U.S. patent WO/2007/132174 (22 November 2007). 203 J. J. Versluijs, M. A. Bari and J. M. D. Coey, Phys. Rev. Lett., 2001,
186 J. Z. Sun, J. Magn. Magn. Mater., 1999, 202, 157–162. 87, 026601.
187 J. C. Slonczewski, J. Magn. Magn. Mater., 1996, 159, L1–L7. 204 Y. Jiang, S. Abe, T. Ochiai, T. Nozaki, A. Hirohata, N. Tezuka and
188 L. Berger, Phys. Rev. B: Condens. Matter, 1996, 54, 9353–9358. K. Inomata, Phys. Rev. Lett., 2004, 92, 167204.
189 E. R. Lewis, D. Petit, L. Thevenard, A. V. Jausovec, L. O’Brien, 205 T. Yang, A. Hirohata, T. Kimura and Y. Otani, J. Appl. Phys., 2006,
D. E. Read and R. P. Cowburn, Appl. Phys. Lett., 2009, 95, 152505. 99, 073708.
190 M. Kl€ aui, C. A. F. Vaz, J. Rothman, J. A. C. Bland, 206 J. Dho, Y. N. Kim, Y. S. Hwang, J. C. Kim and N. H. Hur, Appl.
W. Wernsdorfer, G. Faini and E. Cambril, Phys. Rev. Lett., 2003, Phys. Lett., 2003, 82, 1434.
90, 097202. 207 R. Desfeux, S. Bailleul, A. Da Costa, W. Prellier and A. M. Haghiri-
191 S. R. Bakaul, W. Lin and T. Wu, Appl. Phys. Lett., 2011, 99, 042503. Gosnet, Appl. Phys. Lett., 2001, 78, 3681.
192 T. Fukumara, H. Sugawara, T. Hasegawa, K. Tanaka, H. Sakaki, 208 S. Datta and B. Das, Appl. Phys. Lett., 1990, 56, 665.
T. Kimura and Y. Tokura, Science, 1999, 284, 1969–1971. 209 Y. Ohno, D. K. Young, B. Beschoten, F. Matsukura, H. Ohno and
193 E. P. Houwman, G. Maris, G. M. De Luca, N. Niermann, D. D. Awschalom, Nature, 1999, 402, 790–792.
G. Rijnders, D. H. A. Blank and S. Speller, Phys. Rev. B: 210 R. Feiderling, M. Keim, G. Reuscher, W. Ossau, G. Schmidt,
Condens. Matter Mater. Phys., 2008, 77, 184412. G. Waag and L. W. Molenkamp, Nature, 1999, 402, 787–
194 Y. Wu, Y. Matsushita and Y. Suzuki, Phys. Rev. B: Condens. 790.
Published on 06 January 2012 on http://pubs.rsc.org | doi:10.1039/C2NR11767C
Matter, 2001, 64, 220404R. 211 A. Y. Bychkov and E. I. Rashba, J. Phys. C: Solid State Phys., 1984,
195 C. K€ onig, M. Fonin, M. Laufenberg, A. Biehler, W. B€ uhrer, 17, 6039–6045.
M. Kl€ aui, U. R€
udiger and G. G€ untherodt, Phys. Rev. B: Condens. 212 S. Bandyopadhyay and M. Cahay, Appl. Phys. Lett., 2004, 85,
Downloaded by Nanyang Technological University on 30 March 2012
1540 | Nanoscale, 2012, 4, 1529–1540 This journal is ª The Royal Society of Chemistry 2012