Silicon PDF
Silicon PDF
Silicon PDF
Electronics Components
J. C. Zolper
Defense Advanced Research Projects Agency
3701 North Fairfax Drive
Arlington, VA 22203
I. INTRODUCTION
Just as silicon-based digital electronics manufacturers
continue to improve circuit performance by advancing the
core transistor technology to follow Moores Law,
manufacturers of silicon power electronics components
continuously improve on the component performance
through enhanced device designs and more aggressive
processing techniques. However, just as high speed silicon
CMOS transistors are facing fundamental limits in scaling
that may force the industry to radically different transistor
concepts, power component performance is also faced with
the intrinsic limitations of silicon technology leading to the
emergence of a new class of power electronics components
based on silicon carbide (Sic) material.
The ideal power switch should have low on-state
resistance, IOW switching loss, high operation frequency,
and good thermal capability. In selecting the ideal switch
for an application, circuit designers may trade-off between
the switching speed and the on-state voltage drop. Other
important considerations include: high temperature
capability; radiation hardness; ease of current control; ease
of protection under abnormal modes of operation; and
whether the device is normally-on or normally-off [I].
Beyond
these
technical
considerations,
the
designerslproduct engineers also seek to minimize costs.
Power devices made with Sic are expected to show great
performance advantages compared to those made with Si.
S i c has a ten times higher critical electric field and three
times higher thermal conductivity (attributed to the strong
silicon to carbon covalent bond). Both these material
102
103
104
11
B. 4 H - S i c PiN Diode
The 4H-Sic diodes are attractive choices as high power
rectifiers compared to Si PiNs due to their extremely high
blocking voltage potential (2 10 kV) and 10 times faster
switching speeds than a silicon device [8]. However,
growth of pure, low defect density epitaxial layers with
sufficiently high minority carrier lifetimes has been a
challenge for commercialization of such high voltage
rectifiers.
Recently, high quality I00 pm and 200 pm epitaxial drift
layers have been grown for 10 and 20 kV PiN devices with
forward voltage drops 2 3.9 and 6.3 V, respectively, at IO0
A h 2 (See Fig. 4). This level of reverse blocking has never
been achieved with silicon diodes. However, these early
demonstrations have suffered from device instabilities due
to defect generation under forward bias operation, and from
poor device yield due to inconsistent reverse leakage in
large devices. These limitations are being overcome with
demanded.
111.
A . Sic S c h o f t bDiode
50
40
0
8 10 12 $4 16 16 20 22 24 26 28 30
Current (A)
Figure 3 . The reverse characteristics of a 10A1600 V 4H-Sic SBD.
12
D. 4H-Sic IGBT
0.5
0.0
1.5
1.0
25
20
3.0
3.1
4.0
180
Forward Voltage M
zE
140
.-C 100
E
n
E
a
U
I
.-0
20
60
Drain-Source
Figure 5. On-state characteristics for a lOkV Sic MOSFETs with
active area = 4 . 2 ~ 1 0 cm.
13
A
Tncdon
* M W
t,n m k d l d
14
d Ubb
15
[GBT
Topology
Total D e v i c e
V o l u m e (cm')
Total
H eatsink
3-Level
IGCT
Sic MOSFET
3 - L e v e l NPC
(% volume reduction)
2-level V S I
N P C VSI
VSI
148,300
124,200
39.210
2 @4,43 0
154,800
51,120
(-66)
(-68)
TABLE 11
SIZE ANDWEIGHT COMPARISONS BETWEEN Sic-BASED
SSPS
ANDCONVENTIONAL POWER TRANSFORMER.
I
I
Conventional
I IO
0.313
I
16
SSPS
1.724*
0.0185
2.63**
10
I
v.
ACKNOWLEDGMENTS
CONCLUSfONS
17