Gpdk090 Spec
Gpdk090 Spec
Gpdk090 Spec
Specification
for
90nm Generic Process Design Kit
(gpdk090)
Rev 4.4
Table of Contents
1 Executive Summary................................................................................................................................4
2 Overview.................................................................................................................................................5
2.1 High-level Product Description ........................................................................................................5
2.2 Problem Statement .........................................................................................................................5
2.3 Goal.................................................................................................................................................5
3 Supported Tools .....................................................................................................................................5
4 Design Creation and Simulation .............................................................................................................7
4.1 Schematic Capture (Composer) .....................................................................................................7
4.2 Analog Design Environment (ADE) .................................................................................................7
4.3 Spectre/SpectreRF simulation ........................................................................................................7
4.4 AMS.................................................................................................................................................7
4.5 UltraSim...........................................................................................................................................7
5 Physical Implementation.........................................................................................................................8
5.1 Virtuoso (VLE) .................................................................................................................................8
5.2 Virtuoso XL......................................................................................................................................8
5.3 Toolbox............................................................................................................................................8
5.4 VLO (Optimizer) ..............................................................................................................................8
5.5 VLM (Migrator) ................................................................................................................................9
5.6 DRD (Wire Editor) ...........................................................................................................................9
5.7 Xstream ...........................................................................................................................................9
5.8 Modgens (Constraint Editor) ...........................................................................................................9
5.9 Analog Placer ..................................................................................................................................9
5.10 Cadence Chip Assembly Router (CCAR)....................................................................................9
5.11 Qcells...........................................................................................................................................9
6 Place and Route .....................................................................................................................................9
6.1 LEF/DEF..........................................................................................................................................9
6.2 Finale (Shape Based Router)........................................................................................................10
7 Physical Verification .............................................................................................................................10
7.1 Assura DRC ..................................................................................................................................10
7.2 Assura LVS ...................................................................................................................................10
7.3 Assura RCX ..................................................................................................................................10
7.4 PVS DRC ......................................................................................................................................11
7.5 PVS Extract ...................................................................................................................................11
7.6 Diva DRC ......................................................................................................................................12
7.7 Diva Extract ...................................................................................................................................12
7.8 Diva LVS .......................................................................................................................................12
7.9 QRC (Parasitic Extraction) ............................................................................................................12
7.10 SubstrateStorm (Substrate Noise Analysis) ..............................................................................12
7.11 Fire & Ice QX .............................................................................................................................13
7.12 VoltageStorm .............................................................................................................................13
7.13 ElectronStorm ............................................................................................................................13
8 Documentation .....................................................................................................................................13
9 GPDK090 directory structure................................................................................................................14
10 GPDK090 Layer Map........................................................................................................................15
11 GPDK090 Device List .......................................................................................................................17
11.1 GPDK090 Device Views ............................................................................................................18
12 GPDK090 Device CDF Parameters..................................................................................................19
12.1 Mosfet CDF ...............................................................................................................................19
12.2 Resistor CDF .............................................................................................................................19
12.3 Moscap CDF..............................................................................................................................21
12.4 Bipolar CDF ...............................................................................................................................21
12.5 Diode CDF .................................................................................................................................22
1 Executive Summary
Process Design Kits are one of the four essential pillars that make up a Design Environment or
Platform. The other being flows, tools and libraries.This document provides the specification for the
90nm Generic Process Design Kit (gpdk090) for future CIC product releases 6.x. The GPDK needs
to support the following Cadence Design Systems, Inc. products (see section 3 for a complete list):
• IC613
o VSE-L
o VSE-XL
o ADE-L
o ADE-XL
o VLS-L
o VLS-XL
o VLS-GXL
• FINALE71
• IUS81
• MMSIM70
• ASSURA32
• EXT71
• ANLS71
• SOC71
Design kits have always been required in support of product testing and demos and examples to
customers. These design kits have typically been very rudimentary and loosely supported. Now that
the Cadence desires to have a design kit with its products, a more comprehensive and robust design
kit is required to support the Custom IC Platform.
2 Overview
REQ 2.1.1 :
GPDK090 is a complete design kit based on a fictitious 90nm BiCMOS process. The elements of the
design kit will support a CIC front to back design flow based on the Custom IC Platform.
REQ 2.1.2 :
The GPDK090 for the CIC platform should target a 90nm 1.8V/2.5V BiCMOS process.
Currently the Custom IC product line does not have a consistent design kit that can support flow
testing, flow demos, flow training and flow evaluations of our products as well as for Methodology
Services in delivering services to customers and practical examples from which R&D can test their
code.
2.3 Goal
Provide a 90nm Generic Process Design Kit that is robust, complete and available. The
GPDK090should support the Custom IC Platform release.
3 Supported Tools
The following tools should be supported by the GPDK. Some tools may not require any data to be
provided by the PDK.
Tools in italic are not supported in the current version of the GPDK.
REQ 4.1.1 :
A symbol view for each device in the device list.
REQ 4.1.2 :
Skill callbacks to check for invalid inputs and calculations of derived parameters. (e.g ad,as,).
REQ 4.1.3 :
Support for inherited connections.
REQ 4.1.4 :
Symbols must contain cdsTerm(), cdsInst() and cdsParam() labels.
No requirements.
REQ 4.3.1 :
A spectre view for each device in the device list.
REQ 4.3.2 :
A spectre entry in the CDF simInfo section.
REQ 4.3.3 :
Device models . Each model name should also include the process name as a prefix to avoid name
collisions. (e.g gpdk090_nch , gpdk090_respoly,..)
REQ 4.3.4 :
Corner models for corner simulations.
REQ 4.3.5 :
Statistical models for Monte Carlo simulations.
REQ 4.3.6 :
Models for DC mismatch analysis
REQ 4.3.7 :
rdiff models for n/p-diffusion resistors.
REQ 4.3.8 :
Better model for npn/pnp device (i.e hicum/Vbic/Mextram504.)
4.4 AMS
REQ 4.4.1 :
A spectre view for each device
REQ 4.4.2 :
A spectre model for each device.
REQ 4.4.3 :
A spectre entry in the CDF simInfo section.
4.5 UltraSim
REQ 4.5.1 :
A spectre view for each device
REQ 4.5.2 :
A spectre model for each device.
REQ 4.5.3 :
A spectre entry in the CDF simInfo section
5 Physical Implementation
REQ 5.1.1 :
All layer definitions in technology file.
REQ 5.1.2 :
Basic standardVia devices in technology file.
REQ 5.1.3 :
Complete constraints section.
REQ 5.1.4 :
Complex vias with asymetric end-of-line rules in technology file.
REQ 5.1.5 :
Display resource file defining colors, line styles and fill patterns.
REQ 5.1.6 :
The user unit per dbu should be set to 2000uu/dbu.
5.2 Virtuoso XL
REQ 5.2.1 :
Complete constraints section in techfile.
REQ 5.2.2 :
Multi-part paths for n/p taps in devices section of techfile.
REQ 5.2.3 :
ROD based Pcells to showcase advanced VXL features like stretch handles and auto-abutment. All
ROD skill code and utility skill code will be packaged into a context file. The context file is loaded
through the libInit.il file when opening the GPDK library.
5.3 Toolbox
REQ 5.3.1 :
Complete constraints section in techfile.
REQ 5.3.2 :
Updated techParam section in techfile.
REQ 5.4.1 :
Complete constraints section in techfile.
REQ 5.4.2 :
Updated devices section in techfile.
REQ 5.5.1 :
External QTT file for migration.
REQ 5.6.1 :
Complete constraints section in techfile.
REQ 5.6.2 :
Updated viaDefs section in techfile.
5.7 Xstream
REQ 5.7.1 :
GDSII stream layer mapping table
REQ 5.8.1 :
Complete constraints section in techfile.
REQ 5.8.2 :
Updated viaDefs section in techfile.
REQ 5.9.1 :
Complete constraints section in techfile.
REQ 5.10.1 :
Pin and connectivity information on Pcells.
REQ 5.10.2 :
Complete constraints section in techfile.
REQ 5.10.3 :
Updated viaDefs section in techfile.
5.11 Qcells
Requirements: TBD
6.1 LEF/DEF
Requirements: TBD
Requirements: TBD
7 Physical Verification
REQ 7.1.1 :
A sample drc.rsf file for running Assura DRC.
REQ 7.1.2 :
A drc.rule file containing rules for layer processing and DRC, grouped under the section
drcExtractRules. This should also include antenna checks,density checks and fill processing.
REQ 7.2.1 :
A ‘auCdl’ view for every device.
REQ 7.2.2 :
A ‘auLvsl’ view for every device
REQ 7.2.3 :
A ‘auLvs’ entry in the CDF simInfo section.
REQ 7.2.4 :
A ‘auCdl’ entry in the CDF simInfo section.
REQ 7.2.5 :
A sample LVS.rsf file for running Assura LVS. Provided as a template.
REQ 7.2.6 :
A techRuleSets file.
REQ 7.2.7 :
A extract.rul file containing rules for layer processing and extracting drawn devices, device
parameters, and connectivity (not parasitics), grouped under the section drcExtractRules.
REQ 7.2.8 :
A compare.rul containing rules for comparing drawn devices and parameters, grouped under the
section avCompareRules.
REQ 7.3.1 :
A lvsfile, which is a converted LVS extract.rul file that provides LVS device and connectivity
information to Assura RCX.
REQ 7.3.2 :
A p2lvsfile, which matches the process file to the lvsfile, and also provides technology-based
resistance modeling information.
REQ 7.3.3 :
A process description file (procfile) for Capgen/Assura RCX.
REQ 7.3.4 :
A Perimeter Area Extraction file (paxfile). Thisfile is generated by capgen.
REQ 7.3.5 :
Commands used to run the capgen simulate and compile steps. (capgen_cmd)
REQ 7.3.6 :
caps2d intermediate file created by capgen.
REQ 7.3.7 :
RCXdspfINIT command script for running RCX
REQ 7.3.8 :
RCXspiceINIT command script for running RCX
REQ 7.3.9 :
RCXutilities Korn shell script containing various utilities for processing RCX files.
REQ 7.3.10 :
Compiled capacitance models (cap.so file). Generated by capgen.
REQ 7.4.1 :
A drc.rul file covering all rules defined in the Design Rule manual.
REQ 7.4.2 :
The diva.rul file will be stored under the pvs directory.
REQ 7.5.1 :
PVS extract file to extract all devices defined in the device list.
REQ 7.5.2 :
The extract.rul file will be stored in the pvs directory.
REQ 7.6.1 :
A divaDRC.rul file covering all rules defined in the Design Rule manual.
REQ 7.6.2 :
The divaDRC.rul file will be stored under the PDK library directory.
REQ 7.7.1 :
Diva extract file to extract all devices defined in the device list.
REQ 7.7.2 :
The divaEXT.rul file will be stored in the PDK library directory.
REQ 7.7.3 :
A ‘ivpcell’ for each device in the device list.
REQ 7.8.1 :
A ‘auLvs’ view for every device in the device list.
REQ 7.8.2 :
A Diva compare file (divaLVS.rul)
REQ 7.8.3 :
The divaLVS.rul will be located under the PDK library directory.
Requirements: TBD
REQ 7.10.1 :
Substrate Technology file defining the different cross-sections in the substrate and the electrical
properties (This is obtained from doping profiles for the process). This is the same file as for HF. This
file should be named “SCtechnology.gpdk”
REQ 7.10.2 :
Changes to Assura LVS extract and compare rules files to enable SubstrateStorm: This involves
identification of the devices, device bulk terminals, substrate regions and contacts and making them
appear in the extracted view to be identified by SubstrateStorm for purposes of back-annotation.
REQ 7.10.3 :
Additional layer purpose pairs in the technology library
REQ 7.10.4 :
“SCparameters.cds” file that maps the layers in the extracted view to the substrate technology file
REQ 7.10.5 :
“SCparameters.xtr” file that sets the substrate extraction options.
REQ 7.11.1 :
Process information in form of an ASCII-format interconnect technology (ICT) file from which
IceCaps generates the technology file for Fire & Ice QX. This technology file contains interconnect
models used by Fire & Ice QX to extract the interconnect parasitic capacitance and resistance. For
resistance extraction, it contains resistance information on each interconnect layer and via; for
capacitance extraction, it contains three-dimensional interconnect models.
The file should be named gpdk.ict.
The compiled version of the file gpdk.tch should also be part of the GPDK.
7.12 VoltageStorm
REQ 7.12.1 :
Interconnect technology file – gpdk.ict and gpdk.tch – same as those described for Fire and Ice QX .
REQ 7.12.2 :
Tablegen models – In order to use the built-in Spice-like simulators in VS product family, it is required
to provide table models for V/I curves for various lengths/widths combination. This is in the form of a
dir that is a compiled output of tablegen run. This dir should be provided as part of the GPDK.
REQ 7.12.3 :
XTC command file – this is similar to a LVS deck. XTC is the module within the libgen (library
generation process for power grid views). XTC command file contains information about the gds
layer map, boolean operations for layer manipulation, device forming statements and connectivity
statements
REQ 7.12.4 :
EM Models file - Threshold limits for current density on a per layer basis (for conductors and vias) –
this is needed for power electromigration analysis within VST .
7.13 ElectronStorm
REQ 7.13.1 :
Same as VoltageStorm VST. See section 7.12
REQ 7.13.2 :
EM Model file for Signal Electromigration. See document at
http://partner.cadence.com/gm/document-1.9.97422
8 Documentation
REQ 8.1.1 :
The GPDK needs to have a Design Rules Manual (DRM) including layout guidelines and
recommendations.
REQ 8.1.2 :
The GPDK should have a Designer Reference Guide.
Within the <pdk_install_directory> directory there are several directories to organize the
information associated with the PDK.
assura - Directory containing the Physical Verification Rule Decks for Assura
assura_tech.lib - File containing the Cadence Assura PV initialization path
cds.lib.cdb - File containing the Cadence library definition settings.
This file has the CDB version of the PDK library defined
cds.lib.oa22 - File containing the Cadence library definition settings.
This file has the OA2.2 version of the PDK library defined
dfIItechFiles - Directory containing the ASCII version of the CDB and the OA2.2 DFII techfiles
diva - Directory containing the Physical Verification Rule Decks for Diva
docs - Directory containing the Cadence PDK documentation and the Process design rule manual
fireIce – Directory containing the technology file and layer maps for Fire & Ice
lef – Directory containing the technology LEF file.
libs.cdb – The CDB version of the PDK library
libs.oa22 – The OpenAccess 2.2 version of the PDK library
pvs - Directory containing the Physical Verification Rule Decks for PVS
models - Directory containing the device spectre models
neocell - Directory containing the Neocell technology files
neocircuit - Directory containing the Neocircuit technology file
sna – Directory containing the technology files for SubstrateStorm SNA
soce – Directory containing the Capacitance tables for SOC Encounter
stream - Directory containing the GDSII stream layer map file
vavo - Directory containing the Virtuoso Analog Voltagestorm data file
vcr – Directory containing the Virtuoso Custom Router data file
vlm – Directory containing the Virtuoso Layout Migrate data file
Nwell drawing 2 0
Oxide drawing 1 0
Oxide_thk drawing 24 0
Poly drawing 3 0
Pimp drawing 5 0
Nhvt drawing 18 0
Nimp drawing 4 0
Phvt drawing 23 0
Nzvt drawing 52 0
SiProt drawing 72 0
Cont drawing 6 0
Metal1 drawing 7 0
Metal1 label 7 3
Metal1 net 7 4
Metal1 pin 7 1
Via1 drawing 8 0
Metal2 drawing 9 0
Metal2 label 9 3
Metal2 net 9 4
Metal2 pin 9 1
Via2 drawing 10 0
Metal3 drawing 11 0
Metal3 label 11 3
Metal3 net 11 4
Metal3 pin 11 1
Via3 drawing 30 0
Metal4 drawing 31 0
Metal4 label 31 3
Metal4 net 31 4
Metal4 pin 31 1
Via4 drawing 32 0
Metal5 drawing 33 0
Metal5 label 33 3
Metal5 net 33 4
Metal5 pin 33 1
Via5 drawing 34 0
Metal6 drawing 35 0
Metal6 label 35 3
Metal6 net 35 4
Metal6 pin 35 1
Via6 drawing 37 0
Metal7 drawing 38 0
Metal7 label 38 3
Metal7 net 38 4
Metal7 pin 38 1
Via7 drawing 39 0
Metal8 drawing 40 0
Metal8 label 40 3
Metal8 net 40 4
Metal8 pin 40 1
Via8 drawing 41 0
Metal9 drawing 42 0
Metal9 label 42 3
Metal9 net 42 4
Metal9 pin 42 1
CapMetal drawing 14 0
Nburied drawing 19 0
Psub drawing 25 0
Metal1 slot 7 2
Metal2 slot 9 2
Metal3 slot 11 2
Metal4 slot 31 2
Metal5 slot 33 2
Metal6 slot 35 2
Metal7 slot 38 2
Metal8 slot 40 2
Metal9 slot 42 2
Metal1 fill 7 5
Metal2 fill 9 5
Metal3 fill 11 5
Metal4 fill 31 5
Metal5 fill 33 5
Metal6 fill 35 5
Metal7 fill 38 5
Metal8 fill 40 5
Metal9 fill 42 5
Bondpad drawing 36 0
INDdummy drawing 16 0
IND2dummy drawing 17 0
IND3dummy drawing 70 0
Cap3dum drawing 84 0
Capdum drawing 12 0
Resdum drawing 13 0
BJTdum drawing 15 0
ResWdum drawing 71 0
VPNP10dum drawing 62 0
VPNP2dum drawing 60 0
VPNP5dum drawing 61 0
M1Resdum drawing 75 0
M2Resdum drawing 76 0
M3Resdum drawing 77 0
M4Resdum drawing 78 0
M5Resdum drawing 79 0
M6Resdum drawing 80 0
M7Resdum drawing 81 0
M8Resdum drawing 82 0
M9Resdum drawing 83 0
NPNdummy drawing 20 0
PNPdummy drawing 21 0
DIOdummy drawing 22 0
ESDdummy drawing 74 0
PWdummy drawing 85 0
Device Description
npn Bipolar NPN with variable emitter area
pnp Bipolar PNP with variable emitter area
vpnp2 1.2 volt Vertical substrate PNP 2x2 fixed emitter
vpnp5 1.2 volt Vertical substrate PNP 5x5 fixed emitter
vpnp10 1.2 volt Vertical substrate PNP 10x10 fixed emitter
mimcap Metal-Metal Capacitor
ndio 1.2 volt N+/psub diode
pdio 1.2 volt P+/nwell diode
nmos1v 1.2 volt nominal Vt NMOS transistor
nmos1v_hvt 1.2 volt high Vt NMOS transistor
nmos1v_iso 1.2 volt isloated nominal Vt NMOS transistor
nmos1v_nat 1.2 volt native Vt NMOS transistor
nmos2v 2.5 volt nominal Vt NMOS transistor
nmos2v_nat 2.5 volt native Vt NMOS transistor
pmos1v 1.2 volt nominal Vt PMOS transistor
pmos1v_hvt 1.2 volt high Vt PMOS transistor
pmos2v 2.5 volt nominal Vt PMOS transistor
nmoscap1v 1.2v Nmos cap
nmoscap1v3 1.2v Nmos cap with bulk node
nmoscap2v 2.5v Nmos cap
nmoscap2v3 2.5v Nmos cap with bulk node
pmoscap1v 1.2v Pmos cap
pmoscap1v3 1.2v Pmos cap with bulk node
pmoscap2v 2.5v Pmos cap
pmoscap2v3 2.5v Pmos cap with bulk node
resm1– Metal <k> resistor (k=1-9)
resm9
resnsndiff N+ diffused resistor without salicide
resnsnpoly N+ Poly resistor without salicide
resnspdiff P+ diffused resistor without salicide
resnsppoly P+ Poly resistor without salicide
resnwoxide N-Well resistor under OD
resnwsti N-Well resistor under STI
ressndiff N+ diffused resistor with salicide
ressnpoly N+ Poly resistor with salicide
resspdiff P+ diffused resistor with salicide
ressppoly P+ Poly resistor with salicide
Gate Connection – allow shorting of multi-fingered devices and addition of contact heads
to gate ends
Switch S/D – source is defined as left-most diffusion region and alternating regions to the
right. Pins are not automatically permuted and can be switched using this parameter
Bodytie Type – None, Detached, or Integrated (butting source)
• For Detached, user may select Left, Right, Top, and/or Bottom to specify the
located of bodyties. Selection of all four creates a guardring
• For Detached, the user may specify Tap Extension (in microns) which sets the
distance from the bodytie to the device. Maximum distance is 100 microns
• For Integrated, the user may select Left or Right for a device with an odd number
of fingers (1, 3, 5, …). The user may select Left and Right for an even fingered
device
Edit Area & Perim – allow Drain/Soure area and periphery be entered manually for
simulation
Drain diffusion area, etc. – several simulation parameters are presented. The area and
perimeter parameters are calculated and netlisted in accordance with the layouts or can
be entered manually if “Edit Area & Perim” is checked
Calculated Parameter – radio button that determines whether resistance or Length is the
calculated value when instantiating a new resistor device
Resistance – total resistance value equal to the sum of body resistance, contact
resistance, end resistance, and grain resistance
Left Dummy – boolean value used to place a dummy resistor strip on the left side of the
main resistor
Right Dummy – boolean value used to place a dummy resistor strip on the right side of
the main resistor
Show Tap Params – boolean value allowing the user to set the visibility of the resistor tap
properties
Left Tap – boolean value used to place a resistor tap on the left side of a device
Right Tap – boolean value used to place a resistor tap on the right side of a device
Top Tap – boolean value used to place a resistor tap on the top side of a device
Bottom Tap – boolean value used to place a resistor tap on the bottom side of a device
Tap Extension – float values to set where the left, right, top, and bottom taps would be to
its original placements. This parameter is related to the stretch handle on the taps. The
input format should be “left 1.3 right 1.0 top 0.0 bottom 2.0” without the quotes. If neither
pair is not present, a zero is assumed
End Resistance – resistance value for any salicided area near the contact heads in a
non-salicided resistor (non-editable)
Contact Resistance – resistance value for the contact heads of a particular resistor (non-
editable)
Grain Resistance – constant resistance value for any salicided area near the contact
heads in a non-salicided resistor (non-editable)
Delta Width – resistor width process variation value in meters (non-editable)
Gate Connection – allow shorting of multi-fingered devices and addition of contact heads
to gate ends
Switch S/D – source is defined as left-most diffusion region and alternating regions to the
right. Pins are not automatically permuted and can be switched using this parameter
• For Detached, user may select Left, Right, Top, and/or Bottom to specify the
located of bodyties. Selection of all four creates a guardring
• For Detached, the user may specify Tap Extension (in microns) which sets the
distance from the bodytie to the device. Maximum distance is 100 microns
• For Integrated, the user may select Left or Right for a device with an odd number
of fingers (1, 3, 5, …). The user may select Left and Right for an even fingered
device
Area capacitance – Capacitance per unit area used in parameter calculations (non-
editable)
Fringe capacitance – Fringe Capacitance of perimeter used in parameter calculations
(non-editable)
Temp rise from ambient, etc. – several simulation parameters are presented.
REQ 13.1.1 :
Multi-fingered gates.
REQ 13.1.2 :
Dog bone gate
REQ 13.1.3 :
Configurable source-drain connection for multi fingered devices.(gate,source,both)
REQ 13.1.4 :
Configurable gate straps for multi fingered devices (top, bottom, both, alternate)
REQ 13.1.5 :
Variable source/drain contact coverage with stretch handles on each contact strap.
REQ 13.1.6 :
Optional tap placement for four terminal device. Tab can be configured. (top,bottom,left,right) Spacing
between device and tab can be controlled by stretch handle.
REQ 13.1.7 :
Auto abutment enabled.
REQ 13.1.8 :
VXL ready connectivity. Pins access direction needs to allow routing with CCAR.
REQ 13.1.9 :
Permute properties on all pins.
Configurable Taps.
(Left,Right,Top,Bottom)
Number of contacts is
configurable
Stretchable
Source/Drain
Contact straps
Drain/Source
strapping
(Source,Drain,Both)
Configurable Gate
straping (None,Top,
Bottom, Both,
Alternate)
Stretchable tap
to device
spacing
REQ 13.2.1 :
Parallel/Series configuration with metal straps.
REQ 13.2.2 :
Dog bone
REQ 13.2.3 :
VXL ready connectivity
REQ 13.2.4 :
Optional etch guard resistors
REQ 13.2.5 :
Permute properties on all pins
Series or
parallel
configuration
Optional Etch
Guard
Dummies Configurable
number of
contacts
REQ 13.3.1 :
Configurable width, length or capacitance
REQ 13.4.1 :
Configurable width, length or area
REQ 13.5.1 :
Configurable width, length or area
nmos1v
Spectre Netlist
Spectre Model Name = “gpdk090_nmos1v”
NM1 (D G S B) gpdk090_nmos1v w=4u l=180.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos1v”
MNM1 D G S B nmos1v W=4u L=180.0n M=1.0
Assura Netlist
c nmos1v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i NM1 nmos1v D G S B ; m 1 l 1.8e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nimp CONTAINS Poly
G Poly
D Oxide AND Nimp NOT Poly
S Oxide AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmos1v_hvt
Spectre Netlist
Spectre Model Name = “gpdk090_nmos1v_hvt”
NM1 (D G S B) gpdk090_nmos1v_hvt w=4u l=180.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos1v_hvt”
MNM1 D G S B nmos1v_hvt W=4u L=180.0n M=1.0
Assura Netlist
c nmos1v_hvt MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i NM1 nmos1v_hvt D G S B ; m 1 l 1.8e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nimp & Nhvt
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nimp AND Nhvt CONTAINS Poly
G Poly
D Oxide AND Nimp AND Nhvt NOT Poly
S Oxide AND Nimp AND Nhvt NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
Spectre Netlist
Spectre Model Name = “gpdk090_nmos1v_iso”
NM1 (D G S B T) gpdk090_nmos1v_iso w=4u l=100.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos1v_iso”
MNM1 D G S B T nmos1v_iso W=4u L=100.0n M=1.0
Assura Netlist
Width
Length
Device Layers
Layer Color and Fill
Nburied
Oxide
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Nburied AND Oxide AND Nimp CONTAINS Poly
G Poly
D Nburied AND Oxide AND Nimp NOT Poly
S Nburied Oxide AND Nimp NOT Poly
B Isolated Pwell
T Nburied
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmos1v_nat
l:900n
w:4u
Spectre Netlist
Spectre Model Name = “gpdk090_nmos1v_nat”
NM1 (D G S B) gpdk090_nmos1v_nat w=4u l=900.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos1v_nat”
MNM1 D G S B nmos1v_nat W=4u L=900.0n M=1.0
Assura Netlist
c nmos1v_nat MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i NM1 nmos1v_nat D G S B ; m 1 l 9.0e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nimp & Nzvt
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nimp AND Nzvt CONTAINS Poly
G Poly
D Oxide AND Nimp AND Nzvt NOT Poly
S Oxide AND Nimp AND NzvtT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmos2v
l:280n
Spectre Netlist
Spectre Model Name = “gpdk090_nmos2v”
NM1 (D G S B) gpdk090_nmos2v w=4u l=280.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos2v”
MNM1 D G S B nmos2v W=4u L=280.0n M=1.0
Assura Netlist
c nmos2v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i NM1 nmos2v D G S B ; m 1 l 2.8e-07 w 4e-06 ;
Length
Device Layers
Layer Color and Fill
Oxide_thk
Oxide
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide_thk AND Oxide AND Nimp CONTAINS Poly
G Poly
D Oxide_thk AND Oxide AND Nimp NOT Poly
S Oxide_thk AND Oxide AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmos2v_
l:900n
Spectre Netlist
Spectre Model Name = “gpdk090_nmos2v_nat”
NM1 (D G S B) gpdk090_nmos2v_nat w=4u l=900.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “nmos2v_nat”
MNM1 D G S B nmos2v_nat W=4u L=900.0n M=1.0
Assura Netlist
c nmos2v_nat MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i NM1 nmos2v_nat D G S B ; m 1 l 9.0e-07 w 4e-06 ;
Length
Device Layers
Layer Color and Fill
Oxide_thk
Oxide
Nimp & Nzvt
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide_thk AND Oxide AND Nimp AND Nzvt CONTAINS Poly
G Poly
D Oxide_thk AND Oxide AND Nimp AND Nzvt NOT Poly
S Oxide_thk AND Oxide AND Nimp AND Nzvt NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmos1v
Spectre Netlist
Spectre Model Name = “gpdk090_pmos1v”
PM1 (D G S B) gpdk090_pmos1v w=4u l=100.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “pmos1v”
MPM1 D G S B pmos1v W=4u L=100.0n M=1.0
Assura Netlist
c pmos1v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i MP1 pmos1v D G S B ; m 1 l 1.0e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Oxide
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Nwell AND Oxide AND Pimp CONTAINS Poly
G Poly
D Nwell AND Oxide AND Pimp NOT Poly
S Nwell AND Oxide AND Pimp NOT Poly
B Nwell
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmos1v_hvt
Spectre Netlist
Spectre Model Name = “gpdk090_pmos1v_hvt”
PM1 (D G S B) gpdk090_pmos1v_hvt w=4u l=100.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “pmos1v”
MPM1 D G S B pmos1v_hvt W=4u L=100.0n M=1.0
Assura Netlist
c pmos1v_hvt MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i MP1 pmos1v_hvt D G S B ; m 1 l 1.0e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Oxide
Pimp & Phvt
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Nwell AND Oxide AND Pimp AND Phvt CONTAINS Poly
G Poly
D Nwell AND Oxide AND Pimp AND Phvt NOT Poly
S Nwell AND Oxide AND Pimp AND Phvt NOT Poly
B Nwell
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmos2v
Spectre Netlist
Spectre Model Name = “gpdk090_pmos2v”
PM1 (D G S B) gpdk090_pmos2v w=4u l=150.0n as=2.4e-12 ad=2.4e-12 ps=5.2u \
pd=5.2u m=(1)*(1)
CDL Netlist
CDL Device Name = “pmos2v”
MPM1 D G S B pmos2v W=4u L=150.0n M=1.0
Assura Netlist
c pmos2v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i MP1 pmos2v D G S B ; m 1 l 1.5e-07 w 4e-06 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Oxide & Oxide_thk
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Nwell AND Oxide AND Oxide_thk AND Pimp CONTAINS Poly
G Poly
D Nwell AND Oxide AND Oxide_thk AND Pimp NOT Poly
S Nwell AND Oxide AND Oxide_thk AND Pimp NOT Poly
B Nwell
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
r:320m
segW:2u
resm1 segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (MINUS PLUS) resm1_pcell1 segL=8u segW=2u
Subckt resm1_pcell1 MINUS PLUS
Parameters segL=8u segW=2u
R0 (PLUS MINUS) gpdk090_resm1 l=segL w=segW
Ends resm1_pcell1
CDL Netlist
CDL Device Name = “resm1”
Assura Netlist
Assura auLvs Device Name = “ resm1 ”
c resm1 RES PLUS B MINUS B ;;
* 2 pins
* 2 nets
S (p PLUS MINUS) ;
i R1 resm1 PLUS MINUS ; r 0.32 w 2e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
M1Resdum (Marker Layer)
Metal1
Device Derivation
Device Layer Derivation
Recognition Metal1 AND M1Resdum
PLUS Metal1 TOUCHING M1Resdum
MINUS Metal1 TOUCHING M1Resdum
LVS Comparison
Parameter Calculation
Length Metal1 AND M1Resdum Length (illustrated above)
Width Metal1 AND M1Resdum Width (illustrated above)
Resistance sheet resistance * Length / Width
r:537.333
segW:1.5u
resnsndiff
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) resnsndiff_pcell1 segL=8u segW=1.5u
Subckt resnsndiff_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnsndiff l=segL w=segW
Ends resnsndiff_pcell1
CDL Netlist
CDL Device Name = “resnsndiff”
Assura Netlist
Assura auLvs Device Name = “ resnsndiff ”
c resnsndiff RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnsndiff PLUS MINUS B ; r 537.333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nimp
SiProt & Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nimp AND SiProt AND Resdum
PLUS Oxide AND Nimp NOT Resdum
MINUS Oxide AND Nimp NOT Resdum
B Substrate
LVS Comparison
Parameter Calculation
Length SiProt Length (illustrated above)
Width Oxide Width (illustrated above)
Resistance sheet resistance * Length / Width
r:537.333
segW:1.5u
resnsnpoly
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resnspoly”
R1 (B MINUS PLUS) resnsnpoly_pcell1 segL=8u segW=1.5u
Subckt resnsnpoly_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnsnpoly l=segL w=segW
Ends resnsnpoly_pcell1
CDL Netlist
CDL Device Name = “resnsnpoly”
Assura Netlist
Assura auLvs Device Name = “ resnsnpoly ”
c resnsnpoly RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnsnpoly PLUS MINUS B ; r 537.333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Poly
Nimp
SiProt & Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Poly AND Nimp AND SiProt AND Resdum
PLUS Poly AND Nimp NOT Resdum
MINUS Poly AND Nimp NOT Resdum
LVS Comparison
Parameter Calculation
Length SiProt Length (illustrated above)
Width Poly Width (illustrated above)
Resistance sheet resistance * Length / Width
r:804
segW:1.5u
resnspdiff
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) resnspdiff_pcell1 segL=8u segW=1.5u
Subckt resnspdiff_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnspdiff l=segL w=segW
Ends resnspdiff_pcell1
CDL Netlist
CDL Device Name = “resnspdiff”
Assura Netlist
Assura auLvs Device Name = “ resnspdiff ”
c resnspdiff RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnspdiff PLUS MINUS B ; r 804 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Pimp
SiProt & Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Pimp AND SiProt AND Resdum
PLUS Oxide AND Pimp NOT Resdum
MINUS Oxide AND Pimp NOT Resdum
B Substrate
LVS Comparison
Parameter Calculation
Length SiProt Length (illustrated above)
Width Oxide Width (illustrated above)
Resistance sheet resistance * Length / Width
r:2.13733K
segW:1.5u
resnsppoly
resnsnpoly
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resnspoly”
R1 (B MINUS PLUS) resnsppoly_pcell1 segL=8u segW=1.5u
Subckt resnsppoly_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnsppoly l=segL w=segW
Ends resnsppoly_pcell1
CDL Netlist
CDL Device Name = “resnsppoly”
Assura Netlist
Assura auLvs Device Name = “ resnsppoly ”
c resnsppoly RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnsppoly PLUS MINUS B ; r 2137.33 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Poly
Pimp
SiProt & Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Poly AND Pimp AND SiProt AND Resdum
PLUS Poly AND Pimp NOT Resdum
MINUS Poly AND Pimp NOT Resdum
LVS Comparison
Parameter Calculation
Length SiProt Length (illustrated above)
Width Poly Width (illustrated above)
Resistance sheet resistance * Length / Width
r:57.3333
segW:1.5u
ressndiff
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) ressndiff_pcell1 segL=8u segW=1.5u
Subckt ressndiff_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_ressndiff l=segL w=segW
Ends ressndiff_pcell1
CDL Netlist
CDL Device Name = “ressndiff”
Assura Netlist
Assura auLvs Device Name = “ ressndiff ”
c ressndiff RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 ressndiff PLUS MINUS B ; r 57.3333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nimp
Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nimp AND Resdum NOT SiProt
PLUS Oxide AND Nimp NOT Resdum
MINUS Oxide AND Nimp NOT Resdum
B Substrate
LVS Comparison
Parameter Calculation
Length Resdum Length (illustrated above)
Width Oxide Width (illustrated above)
Resistance sheet resistance * Length / Width
r:57.3333
segW:1.5u
ressnpoly
resnsnpoly
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resnspoly”
R1 (B MINUS PLUS) ressnpoly_pcell1 segL=8u segW=1.5u
Subckt ressnpoly_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_ressnpoly l=segL w=segW
Ends ressnpoly_pcell1
CDL Netlist
CDL Device Name = “ressnpoly”
Assura Netlist
Assura auLvs Device Name = “ ressnpoly ”
c ressnpoly RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 ressnpoly PLUS MINUS B ; r 57.3333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Poly
Nimp
Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Poly AND Nimp AND Resdum NOT SiProt
PLUS Poly AND Nimp NOT Resdum
MINUS Poly AND Nimp NOT Resdum
LVS Comparison
Parameter Calculation
Length Resdum Length (illustrated above)
Width Poly Width (illustrated above)
Resistance sheet resistance * Length / Width
r:57.3333
segW:1.5u
resspdiff
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) resspdiff_pcell1 segL=8u segW=1.5u
Subckt resspdiff_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resspdiff l=segL w=segW
Ends resspdiff_pcell1
CDL Netlist
CDL Device Name = “resspdiff”
Assura Netlist
Assura auLvs Device Name = “ resspdiff ”
c resspdiff RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resspdiff PLUS MINUS B ; r 57.3333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Pimp
Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Pimp AND Resdum NOT SiProt
PLUS Oxide AND Pimp NOT Resdum
MINUS Oxide AND Pimp NOT Resdum
B Substrate
LVS Comparison
Parameter Calculation
Length Resdum Length (illustrated above)
Width Oxide Width (illustrated above)
Resistance sheet resistance * Length / Width
r: 57.3333
segW:1.5u
ressppoly
resnsnpoly
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resspoly”
R1 (B MINUS PLUS) ressppoly_pcell1 segL=8u segW=1.5u
Subckt ressppoly_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_ressppoly l=segL w=segW
Ends ressppoly_pcell1
CDL Netlist
CDL Device Name = “ressppoly”
Assura Netlist
Assura auLvs Device Name = “ ressppoly ”
c ressppoly RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 ressppoly PLUS MINUS B ; r 57.3333 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Poly
Pimp
Resdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Poly AND Pimp AND Resdum NOT SiProt
PLUS Poly AND Pimp NOT Resdum
MINUS Poly AND Pimp NOT Resdum
LVS Comparison
Parameter Calculation
Length Resdum Length (illustrated above)
Width Poly Width (illustrated above)
Resistance sheet resistance * Length / Width
r:2.14K
segW:1.5u
resnwoxide
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) resnwoxide_pcell1 segL=8u segW=1.5u
Subckt resnwoxide_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnwoxide l=segL w=segW
Ends resnwoxide_pcell1
CDL Netlist
CDL Device Name = “resnwoxide”
Assura Netlist
Assura auLvs Device Name = “ resnwoxide ”
c resnwoxide RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnwoxide PLUS MINUS B ; r 2140 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nwell
Nimp
ResWdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Oxide AND Nwell AND SiProt AND ResWdum
PLUS Oxide AND Nwell NOT ResWdum
MINUS Oxide AND Nwell NOT ResWdum
B Substrate
LVS Comparison
Parameter Calculation
Length ResWdum Length (illustrated above)
Width Nwell Width (illustrated above)
Resistance sheet resistance * Length / Width
r:2.14K
segW:1.5u
resnwsti
segL:8u
segments:1
Series
Spectre Netlist
Spectre Model Name = “gpdk090_resm1”
R1 (B MINUS PLUS) resnwsti_pcell1 segL=8u segW=1.5u
Subckt resnwsti_pcell1 B MINUS PLUS
Parameters segL=8u segW=1.5u
R0 (PLUS MINUS B) gpdk090_resnwsti l=segL w=segW
Ends resnwsti_pcell1
CDL Netlist
CDL Device Name = “resnwsti”
Assura Netlist
Assura auLvs Device Name = “ resnwsti ”
c resnwsti RES PLUS B MINUS B B I ;;
* 3 pins
* 3 nets
S (p PLUS MINUS) ;
i R1 resnwsti PLUS MINUS B ; r 2140 w 1.5e-06 l=8e-06;
Width
Length
Device Layers
Layer Color and Fill
Oxide
Nwell
Nimp
ResWdum (Marker Layer)
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Nwell AND ResWdum
PLUS Nwell NOT ResWdum
MINUS Nwell NOT ResWdum
B Substrate
LVS Comparison
Parameter Calculation
Length ResWdum Length (illustrated above)
Width Nwell Width (illustrated above)
Resistance sheet resistance * Length / Width
mimcap
Spectre Netlist
Spectre Model Name = “gpdk090_mimcap”
C1 (PLUS MINUS) gpdk090_mimcap area=16e-12 perim=16e-6 m=1
CDL Netlist
CDL Device Name = “mimcap”
CC1 PLUS MINUS 16e-12 $[mimcap] m=1
Assura Netlist
Assura auLvs Device Name = “mimcap”
c mimcap CAP PLUS B MINUS B ;;
* 2 pins
* 2 nets
S (p PLUS MINUS)
i C1 mimcap PLUS MINUS ; area 16e-12 m 1 ;
Area
Device Layers
Layer Color and Fill
Metal 2
CapMetal
Via2
Metal3
Device Derivation
Device Layer Derivation
Recognition CapMetal AND Metal2
PLUS CapMetal
MINUS Metal2 UNDER CapMetal
LVS Comparison
Parameter Calculation
Area Area of CapMetal (illustrated above)
Perimeter Perimeter of CapMetal
nmoscap1v
D/S/B
Spectre Netlist
Spectre Model Name = “gpdk090_nmoscap1v”
CDL Netlist
CDL Device Name = “nmoscap1v”
MM1 D G S B nmoscap1v W=10u L=10u M=1
Assura Netlist
c nmoscap1v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 nmoscap1v D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Capdum
Oxide
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Capdum AND Oxide AND Nimp CONTAINS Poly
TOP Poly
BOT Capdum AND Oxide AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmoscap2v
D/S/B
Spectre Netlist
Spectre Model Name = “gpdk090_nmoscap2v”
CDL Netlist
CDL Device Name = “nmoscap2v”
MM1 D G S B nmoscap2v W=10u L=10u M=1
Assura Netlist
c nmoscap2v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 nmoscap2v D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Capdum
Oxide & Oxide_thk
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Capdum AND Oxide AND Oxide_thk AND Nimp CONTAINS Poly
TOP Poly
BOT Capdum AND Oxide AND Oxide_thk AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmoscap1v
D/S/B
Spectre Netlist
Spectre Model Name = “gpdk090_pmoscap1v”
CDL Netlist
CDL Device Name = “pmoscap1v”
MM1 D G S B pmoscap1v W=10u L=10u M=1
Assura Netlist
c pmoscap1v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 pmoscap1v D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Capdum
Oxide
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Capdum AND Oxide AND Pimp AND Nwell CONTAINS Poly
TOP Poly
BOT Capdum AND Oxide AND Pimp AND Nwell NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmoscap2v
D/S/B
Spectre Netlist
Spectre Model Name = “gpdk090_pmoscap2v”
CDL Netlist
CDL Device Name = “pmoscap2v”
MM1 D G S B pmoscap2v W=10u L=10u M=1
Assura Netlist
c pmoscap2v MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 pmoscap2v D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Capdum
Oxide
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Capdum AND Oxide AND Pimp AND Nwell CONTAINS Poly
TOP Poly
BOT Capdum AND Oxide AND Pimp AND Nwell NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmoscap1v3
D/S
Spectre Netlist
Spectre Model Name = “gpdk090_nmoscap1v”
CDL Netlist
CDL Device Name = “nmoscap1v3”
MM1 D G S B nmoscap1v3 W=10u L=10u M=1
Assura Netlist
c nmoscap1v3 MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 nmoscap1v3 D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Cap3dum
Oxide
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Cap3dum AND Oxide AND Nimp CONTAINS Poly
TOP Poly
BOT Cap3dum AND Oxide AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
nmoscap2v3
D/S
Spectre Netlist
Spectre Model Name = “gpdk090_nmoscap2v”
CDL Netlist
CDL Device Name = “nmoscap2v3”
MM1 D G S B nmoscap2v3 W=10u L=10u M=1
Assura Netlist
c nmoscap2v3 MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 nmoscap2v3 D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Cap3dum
Oxide & Oxide_thk
Nimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Cap3dum AND Oxide AND Oxide_thk AND Nimp CONTAINS Poly
TOP Poly
BOT Cap3dumM AND Oxide AND Oxide_thk AND Nimp NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmoscap1v3
D/S
Spectre Netlist
Spectre Model Name = “gpdk090_pmoscap1v”
CDL Netlist
CDL Device Name = “pmoscap1v3”
MM1 D G S B pmoscap1v3 W=10u L=10u M=1
Assura Netlist
c pmoscap1v3 MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 pmoscap1v3 D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Cap3dum
Oxide
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Cap3dum AND Oxide AND Pimp AND Nwell CONTAINS Poly
TOP Poly
BOT Cap3dum AND Oxide AND Pimp AND Nwell NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
pmoscap2v3
D/S
Spectre Netlist
Spectre Model Name = “gpdk090_pmoscap2v”
CDL Netlist
CDL Device Name = “pmoscap2v3”
MM1 D G S B pmoscap2v3 W=10u L=10u M=1
Assura Netlist
c pmoscap2v3 MOS D B GB SB B B ;;
* 4 pins
* 4 nets
S (p D S);
i M1 pmoscap2v3 D G S B ; m 1 l 1e-05 w 1e-05 ;
Width
Length
Device Layers
Layer Color and Fill
Nwell
Cap3dum
Oxide
Pimp
Poly
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition Cap3dum AND Oxide AND Pimp AND Nwell CONTAINS Poly
TOP Poly
BOT Cap3dum AND Oxide AND Pimp AND Nwell NOT Poly
B Substrate
LVS Comparison
Parameter Calculation
Length Poly intersecting Oxide (illustrated above)
Width Poly inside Oxide (illustrated above)
Vpnp2
Spectre Netlist
Spectre Model Name = “gpdk090_vpnp2”
Q0 ( C B E ) gpdk090_vpnp2 area=4 m=1
CDL Netlist
CDL Device Name = “vpnp2”
QQ0 C B E vpnp2 M=1 area=4.0
Assura Netlist
Assura auLvs Device Name = “vpnp2”
c vpnp2 BJT C B BB EB ;;
* 3 pins
* 3 nets
i Q0 vpnp2 C B E; area 4 m 1 ;
E Area
vpnp2 – 1.2 volt vertical substrate PNP with 2x2 fixed emitter
Device Layers
Layer Color and Fill
BJTdummy
Nwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal3
Device Derivation
Device Layer Derivation
Recognition BJTdummy contains Nimp AND Pimp
E BJTDummy AND Pimp And Oxide AND Nwell
B BJTDummy AND Nimp And Oxide AND Nwell
C BJTDummy AND Pimp And Oxide ANDNOT Nwell
LVS Comparison
Parameter Calculation
Area Area of Emitter (illustrated above)
Vpnp5
Spectre Netlist
Spectre Model Name = “gpdk090_vpnp5”
Q0 ( C B E ) gpdk090_vpnp5 area=25 m=1
CDL Netlist
CDL Device Name = “vpnp5”
QQ0 C B E vpnp5 M=1 area=25.0
Assura Netlist
Assura auLvs Device Name = “vpnp5”
c vpnp BJT C B BB EB ;;
* 3 pins
* 3 nets
i Q0 vpnp5 C B E; area 25 m 1 ;
E Area
vpnp5 – 1.2 volt vertical substrate PNP with 5x5 fixed emitter
Device Layers
Layer Color and Fill
BJTdummy
Nwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal3
Device Derivation
Device Layer Derivation
Recognition BJTdummy contains Nimp AND Pimp
E BJTDummy AND Pimp And Oxide AND Nwell
B BJTDummy AND Nimp And Oxide AND Nwell
C BJTDummy AND Pimp And Oxide ANDNOT Nwell
LVS Comparison
Parameter Calculation
Area Area of Emitter (illustrated above)
Vpnp10
Spectre Netlist
Spectre Model Name = “gpdk090_vpnp10”
Q0 ( C B E ) gpdk090_vpnp10 area=100 m=1
CDL Netlist
CDL Device Name = “vpnp10”
QQ0 C B E vpnp10 M=1 area=100.0
Assura Netlist
Assura auLvs Device Name = “vpnp10”
c vpnp BJT C B BB EB ;;
* 3 pins
* 3 nets
E Area
vpnp10 – 1.2 volt vertical substrate PNP with 10x10 fixed emitter
Device Layers
Layer Color and Fill
BJTdummy
Nwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal3
Device Derivation
Device Layer Derivation
Recognition BJTdummy contains Nimp AND Pimp
E BJTDummy AND Pimp And Oxide AND Nwell
B BJTDummy AND Nimp And Oxide AND Nwell
C BJTDummy AND Pimp And Oxide ANDNOT Nwell
LVS Comparison
Parameter Calculation
Area Area of Emitter (illustrated above)
Spectre Netlist
Spectre Model Name = “gpdk090_npn”
Q1 ( C B E ) gpdk090_npn area=0.36 m=1
CDL Netlist
CDL Device Name = “npn”
QQ1 C B E npn area=0.36 m=1
Assura Netlist
Assura auLvs Device Name = “npn”
c npn BJT C B BB EB ;;
* 3 pins
* 3 nets
* 0 instances
i Q1 npn C B E ; area 0.36 m 1 ;
E B C
Area
Device Layers
Layer Color and Fill
NPNdummy
Nburied
Pwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition NPNdummy AND Nimp AND Pwell
E NPNdummy AND Nburied AND Nimp AND Pwell
B NPNdummy AND Nburied AND Pimp AND Pwell
C NPNdummy AND Nburied AND Nimp ANDNOT Pwell
LVS Comparison
Parameter Calculation
area Area of Emitter (illustrated above)
Spectre Netlist
Spectre Model Name = “gpdk090_pnp”
Q1 ( C B E ) gpdk090_pnp area=0.36 m=1
CDL Netlist
CDL Device Name = “pnp”
QQ1 C B E pnp area=0.36
Assura Netlist
Assura auLvs Device Name = “pnp”
c pnp BJT C B BB EB ;;
* 3 pins
* 3 nets
* 0 instances
i Q1 pnp C B E ; area 0.36 m 1 ;
E B C
Area
Device Layers
Layer Color and Fill
PNPdummy
Nburied
Nwell
Pwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition PNPdummy AND Pimp AND Pwell
E PNPdummy AND Nburied AND Pimp AND Nwell
B PNPdummy AND Nburied AND Nimp AND Nwell
C PNPdummy AND Nburied AND Pimp ANDNOT Nwell
LVS Comparison
Parameter Calculation
area Area of Emitter (illustrated above)
Spectre Netlist
Spectre Model Name = “gpdk090_ndio”
D0 ( PLUS MINUS ) gpdk090_ndio area=160f pj=1.6u m=1
CDL Netlist
CDL Device Name = “ndio”
DD0 PLUS MINUS ndio 160f 1.6u m=1
Assura Netlist
Assura auLvs Device Name = “ndio”
c ndio DIO PLUS B MINUS B ;;
* 2 pins
* 2 nets
i D0 ndio PLUS MINUS ; area 1e-12 pj 1.6e-6 m 1 ;
PLUS MINUS
Area
Device Layers
Layer Color and Fill
DIOdummy
Nimp / Oxide
Pimp / Oxide
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition DIOdummy AND Nimp
PLUS DIOdummy AND Pimp
MINUS DIOdummy AND Nimp
LVS Comparison
Parameter Calculation
area Area of MINUS (illustrated above)
Spectre Netlist
Spectre Model Name = “gpdk090_pdio”
D0 ( PLUS MINUS ) gpdk090_pdio area=160f pj=1.6u m=1
CDL Netlist
CDL Device Name = “pdio”
DD0 PLUS MINUS pdio 160f 1.6u m=1
Assura Netlist
Assura auLvs Device Name = “pdio”
c pdio DIO PLUS B MINUS B ;;
* 2 pins
* 2 nets
i D0 pdio PLUS MINUS ; area 1.6e-13 pj 1.6e-6 m 1 ;
PLUS MINUS
Area
Device Layers
Layer Color and Fill
DIOdummy
Nwell
Nimp / Oxide
Pimp / Oxide
Cont
Metal1
Device Derivation
Device Layer Derivation
Recognition DIOdummy AND Pimp AND Nwell
PLUS DIOdummy AND Pimp AND Nwell
MINUS DIOdummy AND Nimp AND Nwell
LVS Comparison
Parameter Calculation
area Area of PLUS (illustrated above)
REQ 15.1.1 :
The GPDK is packaged and distributed as a compressed tar file. The file will be available at
http://pdk.cadence.com .
The STEP tool should be used to test the GPDK. The testplan should be outlined in a separate
document.
The PCR system will be used to track bugs/enhancements for the GPDK.
Family INTERNAL
Product CDK090
ProdLevel2 GPDK090
Supported releases:
• IC 5.1.x (CDBA)
• IC 6.1.x (OA)
19 Platform Requirements
The most challenging part of the project will be the creation of ‘realistic’ yet fictious device
models.The GPDK will highly depend on the tools that will make up the CIC Platform. Lot of the tools
are still in flux, especially OA based tools. This can have a negative impact on the quality and
delivery of the GPDK.
21 Acronyms
Acronym
GPDK Generic Process Design Kit
ADE Analog Design Environment
CIC Custom IC