Top Down Technique in Nanotechnology

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Outline of Presentation

1/ what is Nanotechnology
2/ Classification of Techniques for synthesis of Nanomaterials
3 / Top- down approach
4/ the difference between Top- down and Bottom–up
5/ Top-down methods
6/ Advantages and Disadvantages of Top-Down
1 What is Nanotechnology ?
Nanotechnology is a field of research and innovation concerned with building 'things'
- generally, materials and devices - on the scale of atoms and molecules. A nanometre
is one-billionth of a metre: ten times the diameter of a hydrogen atom. The diameter
of a human hair is, on average, 80,000 nanometres. At such scales, the ordinary rules
of physics and chemistry no longer apply

2 Classification of Techniques for Synthesis of Nanomaterials


Nanotechnology has grown at an enormous rate for the past decades, and recent
advances in nanostructured materials and nanodevices have opened up new
opportunities in a variety of applications, ranging from information and
communication technology to healthcare and medicine
There are two general approaches for the synthesis of nanomaterials as shown in
Figure below :
a) Top- down approach
b) Bottom–up approach

3 Top- down approach


Top-down approach involves the breaking down of the bulk material into nanosized
structures or particles.
Top-down synthesis techniques are extension of those that have been used for
producing micron sized particles.
Top-down approaches are inherently simpler and depend either on removal or
division of bulk material or on miniaturization of bulk fabrication processes to
produce the desired structure with appropriate properties.
4 The Difference Between Top-down and Bottom–up

5/ Top-down methods
1- Mechanical methods :

* Cutting, etching , grinding

* Ball milling

2- Lithographic techniques:

- Photo lithography

- Electon Beam Lithography


Advantages of Top-Down
- Large scale production: Deposition over a large substrate is possible

- Chemical purification is not required

Disadvantages of Top-Down
- Cost of new machines and clean room environments grows exponentially with
newer technologies

- Physical limits of photolithography are becoming a problem

- With smaller geometries and conventional materials , heat dissipation is a problem

Conclusion
Currently Top-down processing has been and will be the dominant process in semi-
conductor , mainly because of the huge existing infrastructure in the microelectronics
industry which utilises top-down etching approaches to create electronic features on
the surface of silicon wafers.

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