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2. A silicon sample is doped to 1017 Arsenic atoms/cm3. Calculate the equilibrium hole concentration at
300k.
4. A semiconductor has a band gap energy of 0.2eV; give one possible application of this
semiconductor.
6. Should we expect the intrinsic carrier concentration of a semiconductor material with a very large
band gap energy to be large? Explain.
7. There are 1000 thermally generated electrons (and for that matter 1000 holes as well) in intrinsic
semiconductor. What is the intrinsic carrier concentration?
9. For a germanium sample at room temperature, it is known that ni = 1013 cm-3, n = 2p. Determine n
and p. Is the sample a p or n type?
11. Consider an N-type material at T = 300K doped to a concentration of Nd = 2x1016 cm-3. Assume
mobility values of µn = 6800 cm2/Vs and µp = 300 cm2/Vs.
a) Determine the resistivity of the material
b) Determine the applied electric field that will induce a drift current of 175 A/cm2.
12. a) A material is doped with 1017 cm-3 of Arsenic. What is the conductivity type of the material, and
what is the resistivity of the material?
b) What is the resistance of the a piece of this silicon material 1µm long and 0.1 µm2 in cross sectional
area?
13. A potential of 5v is applied across a 1 µm piece of n-type silicon device. The doping concentration
varies as
n(x) = 1016exp(-x/L) cm-3