OXFORD APPLIED RESEARCH

NC200U-B RF/DC Nanocluster source

RF/DC Nanocluster Source

NC200U-B

OXFORD APPLIED RESEARCH

NC200U-B Operation and Maintenance

Oxford Applied Research

Nanotech House, Nursery Rd North Leigh Business Park
Witney Oxfordshire
OX29 6SN
United Kingdom
Telephone: (0)1993 880005
Fax: (0)1993 880060

http://www.oaresearch.co.uk
Sales: [email protected]

Table of Contents
Safety

System Description

Principle of Operation
Installation and Maintenance

3
5

Magnetron Sputter Target Loading

Target Removal

Target replacement

Connections

Water cooling

Gas inlets

Electrical

Aggregation tube cooling

10

Aggregation Tube, Differential Pumping TPiece and Apertures

11
Vacuum Gauge & Differential Pump

13

Bake-out

13

Operation

14

Start-Up (DC Mode)

14

Start-Up (RF Mode)

15

Shut Down (RF and DC mode)

16

Maintenance
Cleaning the isolator

18
18

Options

20

Specifications

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Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U-B

Section

Version: 4.00

1
Safety

sers of this equipment must be made aware of the hazards associated

with its use. Throughout this manual attention is drawn to the safety
hazards as follows;

!WARNING!
Failure to observe a warning could lead to injury or
death to personnel.

!CAUTION!
Failure to observe a caution could lead to damage to
the equipment. Failure to observe these cautions will
invalidate the warranty

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

(i.)

Become familiar with the principle of operation of the equipment and

be aware of the function and operating voltage of each part of it.

(ii.)

Disconnect the power supply from the mains before adjusting any of
the cables.

(iii.)

Disconnect the electrical feedthrough leads before handling the

equipment.

(iv.)

Do not probe the power supply or the connector leads. There are no
user serviceable components within them.

(v.)

Ensure that all electrical, water and gas connections are properly made.

(vi.)

Ensure that all of the equipment is properly earthed (grounded).

(vii.)

Ensure that there is sufficient ventilation for the electronics unit. The
air intakes are in the base of the box with the outlet at the rear.

!WARNING!
Failure to earth the equipment could lead to high
voltages appearing on exposed surfaces.

Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U

Section

Version: 4.00

System Description
This section introduces the principles of operation of the NC200U-B cluster
source.

Principle of Operation

he NC200U-B is a nanocluster source designed for use in an ultra high

vacuum environment. A DC or RF magnetron discharge is used to

generate the clusters, DC for targets of conducting materials and RF
where the material to be sputtered is an electrical insulator. Inside the liquid
nitrogen-cooled aggregation tube, a rare gas, typically argon or helium, cools
and sweeps the atoms and clusters from the aggregation region towards an
aperture. The cluster size can be varied by adjusting several parameters such as
the power supplied to the magnetron, the aperture size, the rate of rare gas
flow, type of rare gas(es) being used, temperature of the aggregation region
and distance between the magnetron and the aperture. The following gives a
general description of the instrument and its application:

A 2 magnetron designed specifically for high pressure operation is used to

provide the sputtered species. The magnetron has been designed
specifically for high operating pressure in the aggregation region and for a
high sputter rate. Rare earth magnets are positioned at the back of the

magnetron behind the target and the assembly is water cooled. Standard 2
targets can be used for most metals (for magnetic materials it is necessary to
use thin targets see section 3).
The separation between the magnetron and the aperture can be adjusted
using a linear motion-drive. This allows the user to vary the residence time
of the clusters in the aggregation region, and hence the cluster size.

Design concept licensed from Prof. Hellmut Haberland of the University of Freiburg.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Three gas inlets to the magnetron are provided: two for a combination of
gases such as argon and helium and a third for a vacuum gauge to monitor
the pressure in the aggregation region.
Liquid nitrogen or water can be used to cool the aggregation tube.
A T-piece is provided for differential pumping. A number of apertures of
different sizes are provided to suit the customer's deposition system.

Connections for
water cooling and
gas inlets

Magnet
assembly

Magnetron

Pressure
gauge flange
Apertures

Aggregation
gas feed

To system
Linear drive
to move
magnetron

Liquid
Nitrogen

Ar gas feed
to magnetron

Differential
pumping
port

Aggregation
region

Figure 1: Schematic showing the NC200U-B nanocluster source.

Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U

Section

Version: 4.00

Installation and Maintenance

Standard UHV practice should be adopted in installing the NC200U-B
nanocluster source.

Magnetron Sputter Target Loading

The magnetron uses targets of 50.8mm (or 2) diameter with a maximum
thickness of 6mm and a minimum thickness of 1mm. A thin molybdenum
back-plate is supplied to prevent sputtering of the magnetron head once the
target is worn through.

NOTE
Magnetic Materials
The magnetic field created to confine the electrons in
the magnetron plasma can be adsorbed by ferromagnetic target materials. For these materials it is
therefore necessary to use thinner standard targets. For
Element
Fe
Co
Ni

Target thickness (mm)

1 mm
2-3mm
2-4mm

NOTE
Fe Gencoa Loop Targets
For Fe the Gencoa Loop targets can be used on the
source. This target design allow thicker Fe to be
sputtered giving a longer target lifetime (see section 5
for ordering details).

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Target Removal
(i)

Undo the 150mm / 6 inch flange and remove the magnetron from
the aggregation tube and T-piece assembly (fig. 2). The flange
between the aggregation tube and differential pumping T-piece
may be left in place.

Figure 2: NC200U-B components

(ii)

Remove the three nuts (a spanner is provided with the source for
these) from the base of the magnetron cover and gently ease the
cover away from the main body and gas line (fig. 3). Remove any
flaky deposits that may have accumulated during the previous
operation.
Nut

Nut

Remove

Magnetron cover

Figure 3: Removal of the magnetron cover

Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Target
Magnetron

Back plate

Target

Target holder

Target holder

Figure 4: Removing the target

(iii)

Rotate the target holder anti-clockwise and remove it from the

main body (fig.4). The target and Mo back-plate can now be
removed.

Target replacement
(i)

Ensure that the molybdenum back-plate is inserted behind the

target to prevent sputtering of the head after extended use. The
target and back plate must be inserted so that they sit in the recess
in the magnetron head. The recess will centralise the target.
!WARNING!
If inserting a ferro-magnetic material take extra care as
the magnetic field of the magnetron is very strong!

(ii)

Replace the target holder and tighten gently while holding the
target in position. DO NOT OVERTIGHTEN! Ensure that the
target is still central and that no gaps can be seen between the
target and the target holder.

(iii)

Replace the magnetron cover, aligning the gas feed pipe with the
gas feed holes, and the three threaded studs with the holes in the
support ring.

(iv)

Insert a thickness gauge (supplied with the source) between the

magnetron cover and the target holder. Adjust the nuts on the
reverse of the magnetron cover so that the magnetron cover- target
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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

separation is either 0.3 or 0.2mm (fig. 6). The separation should be

the same all the way round the circumference of the target to
ensure even gas flow.
(v)

Ensure that there is high resistance between the target and the
magnetron cover using a resistance meter. A low resistance may
indicate that the cover is touching the target holder, that there are
flakes of sputtered material between the cover and the holder, or
that the main isolator for the source requires cleaning. See the next
section for information on how to access the isolator.

Figure 6: Setting magnetron cover-target holder separation

(vi)

Re-insert magnetron into the aggregation tube.

NOTE
For non-magnetic materials, the separation between the
magnetron cover and the target holder should be about
0.3mm. For magnetic materials, the separation should
be reduced to 0.2mm.

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Gas Condensation RF/DC Nanocluster Source NC200U
Version: 4.00

Connections
Water cooling
Connect the water cooling pipes to the magnetron. Either connection can be
used as the inlet/outlet. It is advisable to use de-ionised water with a flow rate
that exceeds 1l/min.
Source mounting flange
RF or DC Power
Input (N-Type)
Sputter gas (VCR)

Water
(1/4 Swagelok)

Water
(1/4 Swagelok)

Aggregation gases (VCR)

Figure 7: Connections at the back of the magnetron.

Gas inlets
There are three VCR fittings for the gas inlets. The inlet in the centre is for
argon and is used for the magnetron discharge. The other two VCR inlets to
the left and right can be used for introducing gases into the aggregation tube.
A vacuum gauge can also be attached to one of these two inlets for monitoring
the aggregation region pressure. If any of these gas inlets are not used, they
must be sealed with a blank VCR fitting. Each time a VCR fitting is removed,
a new mini VCR gasket must be used for refitting in order to maintain the
vacuum seal.
Electrical
Connect the magnetron power supply to the N-type connector. The central
pin of the connector should be biased negative when using the source in DC
mode. Ensure that the positive connection is also connected to ground on the
power supply. For operation in RF mode, the short RF cable from the
matching unit must be connected to the N-type connector, and a further RF
connection made between the RF power supply and the matching unit. All

Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

power supplies provided with the NC200 have their own product manual
which should be read in conjunction with this manual.
!WARNING!
Ensure that the power supply is turned off before
connecting and disconnecting the magnetron
connector.

Aggregation tube cooling

Connect the water or liquid nitrogen supply to one of the connections via a
Swagelok coupling. If using liquid nitrogen the other connection should be
coupled via a Swagelok fitting to an exhaust, which should be ducted to
outside the building.

Figure 8: Nitrogen cooling connections.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Aggregation Tube, Differential Pumping T-Piece

and Apertures
There are a number of standard aggregation tube aperture plates that are
supplied with the source (plates with 3 screw holes).
(i)

Load the nozzle into the aperture plate, and fit the desired aperture
plate to the end of the dome using the screws provided (fig.9 and
10)

Figure 9: Dome, nozzle, and aperture plate.

Figure 10: Fixing the dome with nozzle and aperture plate to the end of the
aggregation tube.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

(ii)

Fit one of the flat aperture plates to the double -sided flange
(fig.11)

Figure 11: Fitting the aperture to the double-sided flange.

(iii)

Fit the double-sided flange to the end of the T-piece. Position the
two flanges, as shown in fig. 12, so that the holes for the five M5
fixing bolts are aligned. Fix the flange using the M5 bolts. Use a
copper gasket between the flange and the T-piece.
T-piece
Double-sided
flange

M5 bolt holes

Figure 12: Fitting the double-sided flange to the T-piece.

(iv)

Fit the T-piece, with the double-sided flange attached, to the

deposition system and then fit the aggregation tube into the Tpiece assembly (fig. 2)

(v)

Fit the magnetron inside the aggregation tube.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Vacuum Gauge & Differential Pump

A vacuum gauge can be attached to the NW35CF conflat flange on the Tpiece for monitoring the pressure inside the T piece. A vacuum gauge may also
be connected to one of the auxiliary VCR gas connections to measure the
pressure inside the aggregation zone.
A pump can be connected to the differential pumping port to reduce the gas
load in the deposition chamber. A 500l/s or 1000l/s turbo pump is most
suitable.

Bake-out
The nanocluster source can be baked to 250C. Before commencing bake-out
ensure that all water connections are disconnected and the water blown out
from the system using compressed air. The electrical connections should also
be disconnected.
!CAUTION!
Ensure that the cooling water has been purged from the
water jacket and that the water lines are open to
atmosphere. A build up of steam within the water jacket
may damage the instrument

!CAUTION!
The maximum bake-out temperature of the instrument
with the water, liquid nitrogen and electrical
connections removed is 250C.

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Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U
Version: 4.00

Section

Operation

efore operation ensure that the pressure of the system is less than
1x10-4 mbar and that there is sufficient coolant flow through the
magnetron.

Start-Up (DC Mode)

(i)

Ensure that the required DC mode power supply is connected to

the N-Type connector on the NC200. Ensure that you have read
the separate product manual for the DC power supply before
starting. For operation in DC mode the magnetron target must be
made from an electrically conducting material.

(ii)

Set the aggregation length by rotating the hand-wheel. This may

also be adjusted during operation of the source.

(iii)

Introduce water or liquid nitrogen into the aggregation tube and

allow the tube to reach an equilibrium temperature.

(iv)

Ensure that the cooling water for the NC200 source is switched
on.

(v)

Increase the voltage from the power supply to about 4-500V. At

this time the power supply will be in voltage control mode. The
current limit should also be increased above zero, otherwise it will
not be possible to strike a plasma.

(vi)

Introduce argon into the magnetron until a discharge is struck.

This is indicated by a current reading on the power supply
(>0.02A), and the power supply switching from voltage to current
control mode.

(vii)

Adjust the current limit (and if necessary also the voltage limit) to
give the required power and introduce the aggregation gas(es) if
required.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
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(viii)

A quartz crystal monitor can be used to measure the deposition

rate. A quadrupole mass filter, or other device, can be used to
measure the cluster size.

!CAUTION!
Throughout the operation, make sure water is constantly
flowing through the magnetron so that it will not freeze and
damage the cluster source. Failure to ensure constant water
flow throughout the operation and shutdown procedures will
damage the cluster source and invalidate the warranty.

The lifetime of a 5mm thick Cu target, using Ar as the sputtering gas, is about
~2kW hours. Targets made of other materials will have a different lifetime due
varying sputter rates. The thickness of the target material is obviously an
important factor for the lifetime.

!CAUTION!
Ensure that the power and running time during each
experiment are noted so that the target wear can be
estimated. The magnetron is supplied with a Mo backplate which should be used to prevent the sputtering of
the instrument head. After extended use if the
conditions change dramatically, possibly with jumps in
the current on the power supply, the magnetron should
be removed and the target inspected.

Start-Up (RF Mode)

(i)

Ensure that the RF matching unit is connected to the NC200

source and the RF power supply is connected to the matching unit.
Ensure that you have read the separate product manuals for these
units before starting.

(ii)

Set the aggregation length by rotating the hand-wheel. This may

also be adjusted during operation of the source.

(iii)

Introduce water or liquid nitrogen into the aggregation tube and

allow the tube to reach an equilibrium temperature.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

(iv)

Ensure that the cooling water through the NC200 source is

switched on.

(v)

Introduce argon into the magnetron up to a gas flow of ~20 sccm.

(vi)

Turn on the RF power supply and set a forward power in the range
50-100W. Turn the RF power on. Do not turn on the RF power
if there is no gas flowing through the source!

(vii)

The reflected power should stay below 5W at all times during

operation and will be tuned automatically by the auto-tune
unit. If the reflected power is above this level or is fluctuating it is
likely that there is an RF short in the source. This can usually be
cured by cleaning the insulator or cleaning any flakes of sputtered
material from the inside surface of the magnetron cover. Do not
run the source for more than a few seconds if the reflected
power is above 5 W as this will cause damage to the source.
The cause of the high reflected power must be investigated
before proceeding.

(viii)

Adjust the RF power and gas flow as required. The auto- tune unit
should automatically compensate for any changes in the operating
conditions and reduce the reflected power. When using RF powers
greater than 200 W, it is wise to check the outlet temperature of
the water at regular intervals. If this rises significantly above
ambient temperature, then a higher water flow should be used.

(ix)

A quartz crystal monitor can be used to measure the deposition

rate. A quadrupole mass filter, or other device, can be used to
measure the cluster size.

Shut Down (RF and DC mode)

(i)

Switch off the magnetron DC or RF power supply.

(ii)

Turn off the gas valves.

(iii)

If liquid nitrogen is used turn off the control valve. Due to the subzero temperature in the aggregation region, make sure water is
constantly flowing through the magnetron for at least one hour
after the liquid nitrogen control valve is turned off. This will
ensure the cooling water will not freeze. If water is used for the
aggregation zone cooling, it is still necessary to keep the water
running for 30 minutes after source shut down to remove the
residual heat from the source.
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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

(iv)

Allow the aggregation tube to reach room temperature before

venting the vacuum chamber. This will minimise atmospheric
water condensation on the cluster source.

!WARNING!
On venting the vacuum system, cluster-particles may
emanate as a fine dust which may be hazardous if
inhaled. A suitable respiratory mask should be worn.

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Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U

Section

Version: 4.00

Maintenance
Cleaning the isolator
The main isolator for the NC200 is shielded inside a metal casing to protect it
from any sputtered materials, however because it must electrically isolate the
head of the source, it cannot be completely enclosed. Over time it is likely that
there will be a build-up of material on the isolator from the sputter target, and
if this material is electrically conducting then it will eventually short out the
source. If no other reason can be found for a short, then this is the most likely
explanation. For access to the isolator for inspection and cleaning, the isolator
shield must be removed. This section describes how to do this.
i) Remove the magnetron cover, target holder and target from the source
as described in section 3.
ii) Remove the magnetron cover securing ring from the source. This is
secured to three support legs by three cap-head screws (marked by white
arrows in fig 13) which must first be removed. The ring may then be
withdrawn from the source by pulling it carefully and evenly in the
direction away from the source flange (direction of red arrows, fig 13).
Note for re-installation that the cut-out section in this ring fits over the Ar
gas pipe.
Isolator shield
Gas feed pipe

Magnetron cover
securing ring

Plus one more screw underneath

Figure 13: Removing the cover securing ring

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

iii) Remove the two recessed securing screws from the isolator shield
marked by red arrows in figure 14. The two halves of the shield may now
be removed separately through the gaps between the support legs for the
magnetron cover securing ring. The covers are asymmetric and the
position of the narrow end (on the source flange side of the isolator)
should be noted for re-installation. For re-installation also note that the
isolator shield can be rotated to any orientation, the rotational orientation
does not matter.
Magnetron cover securing ring
support legs

Isolator shield

Isolator

Magnetron cover
securing ring and
securing screws

Gas feed pipe

Figure 14: Removing the isolator shield

iv) The isolator can now be seen. This should be white in colour, so any
build up of deposited material can be clearly seen. If such material is
present, the isolator should be gently cleaned with an abrasive.
v) Re-assembly of the isolator shield is the reverse of removal, taking note
of the notes for re-assembly above.

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Gas Condensation RF/DC Nanocluster Source NC200U-B
Version: 4.00

Section

Options
Oxford Applied Research supplies a number of options for the NC200U-B
source. The table below shows these options. Details of these options can be
found in the respective manuals. If you require further information or pricing
please contact your local representative.
Option
Quadrupole
Mass Filter

RF
sputtering
upgrade
Nanocluster
deposition
system

Description
The QMF200 quadrupole mass filter has been
specifically designed for the purpose of highresolution analysis and filtering of nanoclusters
between 100 and 1x106a.m.u. It is compatible with
the NC200 and can be tailored to the deposition
system.
The electronics unit allows control either from a
front panel or a PC equipped with the optional
software package. Other options to this item
include a differential pumping T-piece and an inline filter to remove neutral clusters from the beam
axis.
For sources supplied with only the DC mode power
supply, it is possible to purchase the necessary
power supplies for RF mode operation from OAR.
This allows the sputtering of targets of insulating
materials.
The Nanodep60 integrates the NC200U-B and
QMF200 with a full deposition system. The system
configuration provides for numerous entry ports for
the addition of a variety of other deposition sources
and analysis tools for optimal process flexibility. A
heated rotary work-table substrate manipulator,
substrate ion cleaning facility and system load-lock
are among the options available.

20

Part no.
QMF200

NC200RFU

Nanodep60

Oxford Applied Research

Gas Condensation RF/DC Nanocluster Source NC200U
Version: 4.00

Section

Specifications
Mounting flange:
Differential pumping flange:
Vacuum gauge flange:
Minimum water cooling flow rate:
Water cooling fittings:
Gas inlet fittings:
Target diameter:
Maximum target thickness:
Minimum target thickness:
Maximum power handling:
Maximum separation between target & aperture:
Minimum separation between target & aperture:
Maximum bake out temperature:

21

NW150CF
NW150CF
NW34CF
1 l/min
Swagelok
VCR
50.8mm (2)
6mm
1mm
1000 W DC
600 W RF
198mm
48mm
250oC

Section

Oxford Applied Research

Nanotech House, Nursery Rd North Leigh Business Park
Witney Oxfordshire
OX29 6SN
United Kingdom
Telephone: (0)1993 880005
Fax: (0)1993 880060

http://www.oaresearch.co.uk
e-mail: [email protected]

22