Digest Journal of Nanomaterials and Biostructures Vol. 9, No. 1, January - March 2014, p.

27 - 33




EFFECT OF PHOSPHOROUS ACID AND UREA ON THE FERROUS
TUNGSTEN PHOSPHOROUS MAGNETIC THIN FILM


N.THANGARAJ
*
, K.TAMILARASAN
a
, D.SASIKUMAR

Department of Physics, Velalar College of Engineering and Technology, Erode
638 012, India

a
Department of Physics, Kongu Engineering College, Perundurai - 638 052,
India



The properties of hard magnetic Ferrous Tungsten Phosphorous (Fe-W-P) films
electrodeposited in the presence of urea as additive and phosphorous as precursor with
varying concentrations were studied for different current densities in order to get different
thickness and uniform deposits. The magnetic saturation (M
s
), retentivity (M
r
) and
coercivity (H
c
) of the films were studied using vibrating sample magnetometer. Magnetic
properties of the deposited films were increased with the increase of organic additive and
phosphorous. The crystallite size and stress of the deposited thin films were calculated
using X-ray diffraction (XRD) studies. Percentages of elemental analysis of Fe-W-P films
were obtained using energy dispersive X-ray analysis (EDAX). Surface morphology
analysis was carried using scanning electron microscope (SEM). The magnetic properties
and structural characteristics of the thin films deposited under various experimental
conditions are discussed. Hardness and adhesion of the deposited thin films were also
studied.

(Received October 8, 2013; Accepted December 16, 2013)

Keywords: Electrodeposition, Fe-W-P, EDAX, SEM, XRD, Hardness

1 Introduction

The electrodeposition technique has become the dominant manufacturing technology in all
new applications such as micro electromechanical system (MEMS) devices, nano
electromechanical system (NEMS) devices, magnetic recording head and data storage media [1].
Ferromagnetic materials like Fe, Co and Ni play a vital role in the magnetic data storage. Ferrous
tungsten coating is considerably cheaper than those of nickel and cobalt and is characterized by
higher physicochemical properties in comparison with pure iron. The introduction of tungsten into
metal deposits allows for a significant improvement of the properties of the obtained coatings,
increasing their hardness, corrosion stability, and heat resistance. It is found that tungsten-
containing alloys obtained through the galvanic method exceed pure metals of the iron group in
corrosion stability due to the tungsten inertia and the lower porosity of the coatings. An iron
tungsten alloy has a higher wear resistance than pure iron. FeW alloys are used in both mechanics
and micromechanics. The addition of P promotes the formation of the fully amorphous structure of
Fe-based alloys and maintains high corrosion resistance [2]. There are also some literary reports in
the electrodeposition of Ni-Fe-W-P [3], Co-W-P [4] and Co-W [5] films.
In the present study, we investigated in detail that the effects of various concentration of
phosphorous and urea on the magnetic and structural properties of electrodeposited Fe-W-P thin
film.

*
Corresponding author: [email protected]
28
2 Experimental

2.1 Synthesis and Deposition

A copper substrate of size 1.5 x 5 cm as cathode and stainless steel plate is used as anode
for galvanostatic electrodeposition method. A d.c current for electrodepostion has passed from a
regulated power supply. Analytical grade chemicals were used to prepare bath solution. An
adhesive tape was used as mask for all the substrate except the area on which deposition of film
desired. The copper electrode was buffed for removing scratches by using mechanical polishing
wheel with a buffing cloth containing aluminum oxide abrasive. After buffed the substrates were
cleaned by con H
2
SO
4
or acetone. Before electrodeposition, these substrates were cleaned in an
alkaline electro cleaning bath then the substrates were rinsed in distilled water. The
electrodeposion was done with different concentration of urea and phosphorous.
Electrodeposition of Fe-W-P magnetic thin film was plated from a bath contained ferrous
sulphate (FeSO
4
.7H
2
O) 0.1 M, sodium tungstate (Na
2
WO
4
.2H
2
O) 0.05 M, tri sodium citrate
(Na
3
C
6
H
5
O
7
.2H
2
O) 0.3 M, boric acid (H
3
BO
3
) 0.16 M and ammonium sulphate (NH
4
)
2
SO
4
0.3
M, with this composition 0.1 and 0.2 M of Phosphorous acid (H
3
PO
3
) and 2.5 g l
-1
and 5 g l
-1
of
urea were added to this bath and their effect on the properties of Fe-W-P films was investigated
with different current density like 20 mA cm
2
, 25 mA cm
2
and 30 mA cm
2
and 45 minutes
deposition time. The pH value was fixed at 8.0 for all the electrodeposition baths.

2.2 Characterization

The thickness of the deposited films was measured using digital micrometer (Mitutoyo,
Japan). Magnetic properties of deposited films were studied with vibrating sample magnetometry.
The structure and morphology of the magnetic films were studied using X-ray diffractometer (Rich
Seifert, model 3000) and scanning electron microscope (JEOL) respectively. The crystallite size
and stress of the deposited Fe-W-P film has been calculated from the XRD data. Percentage of
elemental analysis of Fe-W-P film was obtained using EDAX. Hardness of the deposited thin film
was obtained using Vickers hardness tester through diamond intender method. Adhesion of the
films was tested by bend test and scratch test. These tests are widely used in the field of
electroplating.


3 Results and Discussion

3.1 Thickness Study

Table 1 summarizes the effect of various concentration of phosphorous acid and urea on
the thickness and magnetic properties of Fe-W-P films obtained under different experimental
conditions. The thickness of the film was increased with increase in urea and phosphorous as well
as increases in current density. The magnetic properties of the thin films were increased with the
increase of thickness.












29
Table 1. Effect of the thickness and magnetic properties of Fe-W-P films electrodeposited for different
current densities with 0.1 M and 0.2 M of H
3
PO
3
.


S.
No.
Bath additive Current
density
(mA
cm
2
)
Thickness
of
deposit
(m)
Magnetic
saturation
(A/m)
Remanent
polarization
(A/m)
Coercivi
ty
(Oe)
Squaren
ess
H
3
PO
3
(M) Urea
(g/l)
1
2
3
4
5
6
7
8
9




0.1

0


2.5


5
20
25
30
20
25
30
20
25
30
3.2
3.4
3.8
3.4
3.6
3.9
3.7
4.2
4.5
9.269
10.656
12.604
11.541
13.834
15.692
18.543
20.468
23.223
0.934
1.211
1.578
1.385
2.075
2.933
3.370
4.707
6.130
1401
1548
1754
2009
2142
2219
2164
2258
2336
0.10
0.11
0.13
0.12
0.15
0.19
0.18
0.23
0.26
10
11
12
13
14
15
16
17
18




0.2

0


2.5


5
20
25
30
20
25
30
20
25
30
4.2
4.4
4.8
4.7
4.8
4.9
4.8
5.1
5.3
11.564
13.762
15.829
21.214
27.539
32.437
30.380
37.732
41.453
1.865
2.754
3.634
4.667
7.711
11.114
9.418
12.829
16.224
1648
1720
1819
2100
2189
2242
2272
2396
2421
0.16
0.20
0.23
0.22
0.28
0.34
0.31
0.34
0.39


3.2 Surface analysis

3.2.1 Structural analysis

Electrodeposited Fe-W-P films were obtained from the baths maintained at 30 mA cm
2

current density in the absence of urea and the presence of urea with different concentration of
phosphorous acid were subjected to XRD studies and are reported in Fig. 1. The X-ray wavelength
was used 1.5405 of Cu K radiation. The data obtained from the XRD pattern were compared
with Joint committee for powder diffraction studies data and were found to have Rhombohedral
structure with Fe
7
W
6
(0210) plane [6] and Hexagonal structure with Fe
2
P (312) plane [7]
predominantly. The XRD peaks of thin film and metal were shifted due of the stress of the film
[8]. Stress of the films were calculated from XRD data, using the formula,
Youngs modulus = Stress / Strain (1)


30
0 20 40 60 80 100
0
2000
4000
6000
8000
(312)
(0210)
(021) (112)
a)
I
n
t
e
n
s
i
t
y

(
c
p
s
)
2 Theta (deg)

20 40 60 80 100
0
1000
2000
3000
4000
5000
(312)
(0210)
(021)
(112)
b)
I
n
t
e
n
s
i
t
y

(
c
p
s
)
2Theta(deg)

20 40 60 80 100
0
3000
6000
9000
12000
15000
c)
(312)
(0210)
(021)
(112)
I
n
t
e
n
s
i
t
y

(
c
p
s
)
2Theta(deg)

20 40 60 80 100
0
2000
4000
6000
8000
(312)
(0210)
(112)
(021)
d)
I
n
t
e
n
s
i
t
y
(
c
p
s
)
2 Theta (deg)

Fig.1. XRD images of Fe-W-P films electrodeposited at 30 mA cm
2
with 0.1 M H
3
PO
3
(a) 2.5 g1
-1
urea (b) 5.0 g1
-1
urea and with 0.2 M H
3
PO
3
(c) 2.5 g1
-1
urea (d) 5.0 g1
-1
urea


The results are shown in Table 2. Stress of the film was low when the bath was in lower
concentration of urea. The stress of the film increased and crystalline sizes of the film decreased
[9] when the concentration of urea is increased. Crystallite size of the deposits were calculated
from XRD data using Debye-Scherrer formula

Crystallite size = 0.9/ cos (2)

Crystallite sizes were obtained in the nano scale range.

3.2.2 Morphological observation

Electrodeposited Fe-W-P thin films were obtained from the baths maintained at 30 mA
cm
2
current density in the absence of urea and the presence of urea with different concentration of
phosphorous acid were subjected to SEM are reported in Fig.2. The crystallinity of Fe-W-P film
mainly depends on the amount of urea and phosphorous which are present in the bath. The surface
31
scans shown the crystalline sizes are decreased when the urea is increased which are accompanied
with the XRD data reported in Table 2.




Fig.2. SEM images of Fe-W-P films electrodeposited at 30 mA cm
2
with 0.1 M H
3
PO
3

(a) 2.5 g1
-1
urea (b) 5.0 g1
-1
urea and with 0.2 M H
3
PO
3
(c) 2.5 g1
-1
urea (d) 5.0 g1
-1
urea



Table 2 - Crystalline size, hardness and composition of Fe-W-P films at 30 mA cm
2
current density.

H
3
PO
3
(M)
Urea
(g/l)
Crystalline
size
(nm)
Stress
(MPa)
Vicker
Hardness
(VHN)
Film Composition
(at %)
Fe W P

0.1
0
2.5
5
28.29
27.84
26.17
611
621
660
189
197
208
87.40
88.96
89.32
10.64
8.82
7.58
1.96
2.22
3.10

0.2
0
2.5
5
27.93
25.86
25.79
619
668
670
192
201
219
87.64
89.12
89.74
10.20
8.57
7.04
2.16
2.31
3.22


3.3 Mechanical Properties

Fe-W-P films, which were selected for XRD and SEM studies, were tested for their
Vicker's hardness number. The results are shown in Table 1. Higher concentration of urea in the
bath increased the hardness of the film. It was happened due to the stress present in the film.
Adhesion of the film with the substrate was found to be good.
32
3.4 Elemental Analysis

Table 2 represents the results of EDAX. It was observed that all the films obtained from
various baths had less than 4 % phosphorous. In the higher phosphorous acid content the films
showed high magnetic properties. It was due to the addition of urea in the bath, which improved
the crystalline structure of Fe-W-P films.

3.5 Magnetic Studies

The VSM images of Fe-W-P electrodeposited thin films obtained from the baths contained
in the absence of urea and the presence of urea with different concentration of phosphorous acid
are shown in Fig. 3. On increasing the urea from 0 to 5 g l
-1
at 0.2 M H
3
PO
3
, the coercivity
increased from 1819 Oe to 2421 Oe. The magnetic properties of the film are enhanced due to
increase in urea. The electrodeposited films were uniform and bright. The morphology of the film
was found to be poor when the absence of urea in the electrodeposition bath. The effect of
phosphorous with urea was investigated. With the increase in urea there was significant
improvement in the thickness as well as magnetic properties of the film as shown in Table 1.
Under the best conditions, 30 mA cm
2
current density with 0.2 M H
3
PO
3
and 5.0 g 1
-1
urea, the
thickness of the film was found to be 5.3 m with coercive and remanent values about 2421 Oe
and 16.224 A/m respectively.




Fig.3- VSM images of Fe-W-P films electrodeposited at 30 mA cm
2
with 0.1 M H
3
PO
3

(a) 2.5 g1
-1
urea (b) 5.0 g1
-1
urea and with 0.2 M H
3
PO
3
(c) 2.5 g1
-1
urea (d) 5.0 g1
-1
urea


33
4. Conclusions

The Fe-W-P thin film having good hard magnetic properties can be electrodeposited from
the higher concentration bath of urea. When the urea was increased the stress of the deposited thin
film also increased, which is a cause for cracks in the thin film. Hardness of the film also increased
at 5.0 g 1
-1
urea. Also these films have good adhesion with the substrate and their crystalline sizes
are in nano scale. High coercivity, remanent and Squareness values achieved about 2421 Oe,
16.224 A/m and 0.39 respectively at 30 mA cm
2
current density with 0.2 M H
3
PO
3
and 5.0 g 1
-
1
urea. This Fe-W-P thin film has enhanced magnetic, structural and mechanical properties which
can be used in MEMS devices and magnetic data storages.


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