Focused Ion Beam Intro
Focused Ion Beam Intro
Focused Ion Beam Intro
Overview
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
Generating a focused ion beam Ion sources Ion optics FIB-Applications Scanning ion microscopy (SIM) Focused ion beam lithography
Resistlithography Micromachining
FIBApplications
Sample of a FIB-system
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics
FIBApplications
Figure:
http://www.fzd.de/db/PicOri?pOid=24361, 01/17/2009
Ion sources
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics
FIBApplications
Gas eld ion source (GFIS) Liquid metal ion source (LMIS) (Plasma ion gun)
FIBApplications
Figure:
http://www.smt.zeiss.com/nts, 01/17/2009
Imaging Gas ionized at tip as electron tunnels into the tip Ions accelerated to the extractor Virtual source size < possible A
FIBApplications
Figure:
http://www.freepatentsonline.com, 01/17/2009
Atoms form a Taylor-Cone (end radius 101 nm very strong electric eld E ) Electric eld ionize atoms Virtual source size 50nm
Figure:
http://www.ehdtg.com/images, 01/17/2009
FIBApplications
Figure:
http://www.freepatentsonline.com, 01/17/2009
Atoms form a Taylor-Cone (end radius 101 nm very strong electric eld E ) Electric eld ionize atoms Virtual source size 50nm
Figure:
http://www.ehdtg.com/images, 01/17/2009
Ion optics
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics
FIBApplications
Aperture: reduces ion beam current, spherical aberration, helps mass separating EB mass lter (Wien lter): separates ions after mass and charge if an alloy is used (only LMIS)
Further features
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics
FIBApplications
Deector plates: Steering ion beam over sample with eletric elds in x- and y-direction (compare oscilloscope) Beam blanker: Deects ion beam so much that it will not penetrate the sample
FIB-Applications
Figure:
http://www.crystaltexture.com/jpg 01/17/2009
Detected particles: low-energy secondary electrons (< 10eV ), secondary ions and photons
Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Ion mass electron mass Ion e almost no diraction if an ion beam is used
Figure:
http://www.smt.zeiss.com/nts, 01/17/2009
currently best resolution: 0.24nm Ion beam modies sample during observation (sputtered ions)
Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Ion mass electron mass Ion e almost no diraction if an ion beam is used
Figure:
http://www.smt.zeiss.com/nts, 01/17/2009
currently best resolution: 0.24nm Ion beam modies sample during observation (sputtered ions)
Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Secondary electrons much more sensitive to details of surface structure in the target than in SEM, sensitive to work function of surface Using ion-induced secondary ions and electrons to gain much information of the sample Chemical surface analysis by means of secondary ions
Figure:
http://bp1.blogger.com/rWWz5HvJNko/ RYVRwwxZ2I/AAAAAAAAABE,01/17/2009
Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Very strong contrast with ion-induced secondary electron images in case of crystalline targets
Figure:
http://www.crystaltexture.com/jpg, 01/17/2009
Resistlithography
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Figure:
http://www.techbriefs.com/images/stories/techbriefs/2007, 01/17/2009
Resistlithography
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Thickness of resist adjusted to range of ion beam Avoid doping by using a two layer resist system No proximity eect (compare e-beam) Possible resolution: 20 30nm
Micromachining
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Creating nanometer structures by sputtering material from a surface induce deposition on a surface
Applications: Failure analysis Lithographic mask repair Modication and repair of integrated circuits
Sputtering
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Figure:
http://www.eaglabs.com/training/tutorials/sims-theory-tutorial, 01/17/2009
Sputtering
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Figure:
Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Figure:
http://cim.aamu.edu/Activities, 01/17/2009
Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Figure:
Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining
Literature
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
J.Orlo, High-resolution focused ion beams, Rev. Sci.Instrum.64,1105(1993) M. Hillmann, 3-dimensionale Nanostrukturierung mittels fokussierter Ionenstrahllithographie, (2001) http://www.smt.zeiss.com http://www.freepatentsonline.com/6531811-0-large.jpg http://physics.pdx.edu/ esanchez/Research/ChargedBeam http://www.ehdtg.com/images http://www.fzd.de/db/PicOri?pOid=24361 http://bp1.blogger.com/rWWz5HvJNko/ http://www.crystaltexture.com/jpg http://www.techbriefs.com/images/stories/techbriefs/2007 http://cim.aamu.edu/Activities