ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9
SU8-Silver Photosensitive
Nanocomposite**
By SØbastien Jiguet,* Arnaud Bertsch,
Heinrich Hofmann, and Philippe Renaud
Composite materials offer a combination of properties and
a diversity of applications, which cannot be obtained with
metals, ceramics or polymers alone. In particular, the insertion of a conductive phase (metallic or inorganic powders or
conductive polymers) in an insulating polymer matrix, can
result in an enhancement of its electrical conductivity. Various studies have been focused on such electrically conductive polymer composition (ECPCs), which do not have the
disadvantages of the pure metal (high density, low chemical
resistance, complex manufacturing process). The powder
loaded polymer becomes a functional material with specific
properties, and can be used for electrical or electromagnetic
applications, etc.[1,2]
The case of ECPCs based on epoxy resins, are of particular
interest to understand the properties of binary composites
(morphology, electrical and thermal conductivity), which are
obtained in most cases after a heat treatment to crosslink the
ECPCs materials. Their main application is conductive adhesives used in the electronic field for connecting and bonding,
but it can also be used for manufacturing sensors.[3±5]
In this paper we report a new conductive photosensitive
composite material, allowing the direct manufacture of electrically conductive micro-components. It is based on a blend
containing silver particles embedded in SU-8, an epoxy
photopolymer essentially used for the fabrication of high aspect ratio structures by UV-LIGA. SU-8 components are useful for MEMS, fluidic and packaging applications,[6,7] but also
as masters for micro-injection-molding (Fig. 1).
Nanocomposite characterizations: Formulations containing
up to 40 vol.% of silver filler were produced to evaluate the
effect of the insertion of silver particles in the photopolymer
matrix, both on the photo-polymerization phenomenon and
on electrical conductivity of the resulting photo-patterned
structures.
±
[*] S. Jiguet, Dr. A. Bertsch, Prof. P. Renaud
Swiss Federal Institute of Technology
EPFL-STI-IMM-LMIS4, Lausanne, Switzerland
E-mail:
[email protected]
Prof. H. Hofmann
Swiss Federal Institute of Technology
EPFL-STI-IMX-LTP, Lausanne, Switzerland
[**] This work was supported by the Swiss National Science Foundation. We would like to thank the Interdisciplinary Center of
Electron Microscopy for their contribution to the sample preparations and observations.
DOI: 10.1002/adem.200400068
2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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Science, 2001, Chapter 21.
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Jiguet et al./SU8-Silver Photosensitive Nanocomposite
Fig. 1. Multilevel piece of watch in SU8 (Courtesy of Mimotec SA).
Fig. 3. Reflectance spectrum of SU8-silver composite material in the UV-Visible range
for different silver powder loads.
Photopolymerization: The use of silver particles as conductive filler is related to the low absorption of the silver nanoparticles at the irradiation wavelength in comparison to other
metallic fillers as gold, copper, or aluminum. However, the
absorbance of the resulting composite material is strongly
dependant of the silver content as shown in Figures 2 and 3.
Increasing the silver particle volume fraction results in a decrease of the polymerized thickness, for an irradiation dose of
900 mJ.cm±2. Above the percolation threshold determined at
around 6 vol.% (see next section), the polymerized layers
have a thickness of less than 20 micrometers, whereas for
pure SU-8 polymer, layers of more than 500 micrometers in
thickness can be obtained for the same dose.[8] The polymerized thickness, obtained with the composite resist we studied,
is of course smaller than the height of microcomponents
made of pure SU8, but still bigger than the height that can be
obtained with many photoresists.
The reduction of the polymerized thickness of the SU8-silver composite resist compared to pure SU8 is related to the
absorption of light by the silver nanoparticles and to the high
reflectance of the medium as shown in Figure 3.
Fig. 2. Evolution of the cure depth versus the silver powder load in the SU8-silver
photosensitive composite material. The incident energy is 900 mJ cm±2.
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2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
The reflectance measurements have been obtained using
an integration sphere, which allows taking into account all reflections on the sample independently of its thickness. The intrinsic optical properties of the silver particles are not the only
cause of these absorption and reflection phenomena: the size
and shape of the silver particles also contribute to enhance
them. According to several effective medium optical models
(Maxwell-Garnett, Bruggeman or Bergam) the influence of
the filler properties, such as volume fraction, aspect ratio, and
size, affects significantly the optical properties of the composite. Because of the wide range of particle shapes and sizes, as
presented in Figure 4, it is difficult to predict the optical behavior of the composite and to make a comparison between
theory and measurements.
The size and shape of the silver particles and their distribution in the SU8 matrix can be seen from the TEM pictures
presented in Figures 4 and 5. The silver nanoparticles tend to
agglomerate; this can be related to their different affinity with
the solvent and SU8 monomer, but the formulation process
and substrate coating step may also induce this particle agglomeration. The effect of the light absorption of the silver
particles can be deduced from the TEM image presented in
Figure 5: The silver particles act like a mask, preventing the
light to crosslink the SU8 monomer deep under the composite-substrate interface. However, some polymerized zones
can be observed behind the silver particles, resulting from
light scattering. As irradiation is done in backside mode, the
surface of the sample is rough, as a consequence of the inhomogeneous penetration of light in the material.
Electrical conductivity: The addition of conductive fillers
into the insulating SU8 polymer matrix in the form of silver
powder results in a conductive composite material. The physical properties of the SU8-silver composite are governed by
the properties of the clusters that are formed when contacts
are established between the dispersed filler. When the largest
cluster has the same size as the dimension of the sample, also
called infinite cluster, the percolation occurs. This phenomenon can be characterized by observing the dielectric proper-
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ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9
Jiguet et al./SU8-Silver Photosensitive Nanocomposite
a)
b)
b)
Fig. 4. TEM images of the silver powder illustrating the variety of shape and size.
ties of the composite, which evolves from insulating characteristics to conductive when increasing the filler content.
Figure 6 shows the evolution of the electrical conductivity
of the patterned composite components as a function of the
loading in silver particles. A drastic change in conductivity
appears at the percolation threshold, which can be observed
for silver volume fractions between 5 and 6 vol.%. Using a
geometric model based on a regular array on which spherical
particles are distributed statistically, simple binary composites show a percolation threshold at higher volume fraction,
around 16 vol.%.[9,10] The characteristics of the silver powder
used in our experiment (the particle size distribution as described in Tab. 1, the shape and the aspect ratio of the particles and aggregates as shown in Fig. 4) are related to the very
low powder content at the percolation threshold we measured.[11±13] For the same volume fraction, percolation can oc-
ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9
Fig. 5. (a)TEM image of the SU8-silver composite (microcut); (b) illustrates the polymerization propagation: crosslinked SU8 by direct irradiation (zone1), by scattering
phenomenon (zone 2), and non polymerized SU8 (zone 3), removed after the development step.
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cur when using elongated particles, even if it is not the case if
spherical particles were used.
The percolation threshold can be determined more precisely by impedance spectrometry by observing the change
from capacitive to conductive behavior of the composite as a
function of its powder content. A conductive composite has a
similar behavior as a resistance, and shows a constant impedance for a wide range of frequencies. For an insulating composite, the electrical behavior can be compared to the one of a
capacitor, in that case, its complex impedance changes significantly with the frequency. Figure 7 shows the variations of
the complex impedance of the composite with the frequency
for different powder loadings close to the percolation threshold. The switch between capacitive and conductive behavior
a)
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Jiguet et al./SU8-Silver Photosensitive Nanocomposite
Fig. 6. Evolution of the electrical conductivity of the SU8-silver composite versus silver
filler volume fraction, before and after thermal treatement.
Fig. 8. Evolution of the weight loss of each component of the composite during an isotherm at 120 C.
Table 1. Physical characteristics of the silver powder PUAG119 from METALOR.
Figure 8 illustrates that the composite weight loss during the
thermal treatment comes essentially from the SU8 polymer,
and is probably related to the evaporation of volatile organic
compounds (remaining solvents) trapped in the polymer matrix. The small weight loss coming from the silver powder
can be explained by the removal of the particle surface coating (surfactant).
The comparison between impedance spectrometry and
TGA characterizations (Fig. 9) shows similar evolutions.
When increasing the temperature, the composite impedance
evolves in a similar way as the weight loss of the composite,
which can be linked to a rearrangement of the particles in the
polymer matrix due to the epoxy resin shrinkage.[3,5,15]
Structures and resolution: To use this new electrically conductive composite material with photosensitive properties for
microfabrication, resolution tests have been performed. Structures in SU8-silver composite have been produced by UVLIGA in back side and in front side modes. The back side
mode has been preferred because of the better adhesion between the composite microstructures and the substrate.
Figures 10 and 11 show structures patterned in backside
mode. The ones obtained without direct contact between the
mask and the resist have a lateral resolution typically of
around 30 lm (Fig. 11a), whereas the integration of the mask
on the substrate, as explained previously, improves significantly the resolution, which becomes better than 5 lm
(Fig. 11b).
Conclusion
A new electrically conductive photoresist has been developed. It is based on silver nanoparticles embedded in SU8, a
photosensitive negative-tone resist. This composite material
becomes electrically conductive, when a sufficient quantity of
powder is added in the SU8 resin, defining the percolation
threshold. It happens for a low silver volume fraction (around
6 vol.%), which is economically interesting. Depending on the
silver volume fraction, the composite structures show a wide
range of electrical conductivities. A soft thermal treatment
can further enhance the conductivity of one order of magni-
Characteristics
Results
Density
2.5
Specific area
1.84 m2.g-1
Size distribution at 10 %
0.2
lm
Size distribution at 50 %
1.5
lm
Size distribution at 90 %
2.5
lm
g.cm-3
defines the percolation threshold,[14] and can be observed
around a 6 vol.% silver particle loading.
The application of a soft thermal treatment (an isotherm at
120 C) to the SU8-silver composite structure induces an enhancement of the electrical conductivity of the conductive
composite of more than one order of magnitude as shown in
Figure 6.
Thermogravimetric analyses have been carried out with a
DSC-TGA Mettler apparatus in order to explain this change.
Fig. 7. Complex impedance characterization of SU8-silver composites by impedance
spectrometry.
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2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9
Jiguet et al./SU8-Silver Photosensitive Nanocomposite
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Fig. 9. Comparison between the impedance evolution and the weight loss of a SU8-silver composite during an isotherm at 120 C.
(a)
tude. The SU8-silver structures made by UV-LIGA in back
side mode and with the integrated mask, show a resolution
better than 5 lm.
Experimental
The composite photoresist material is prepared by mixing
homogeneously the photosensitive SU-8 resin (from Gerstel
SA) and the silver powder (PUAG119 from METALOR). The
physical properties of the powder are presented in tab. 1; the
mean cluster size of the silver powder is of 1.5 lm, but the
primary particle size is in the nanometer range. The formulation viscosity is adapted by adding gamma-butyrolactone
(from Fluka) as solvent of the photopolymer, to allow a suitable use of the blend without sedimentation. However, the resulting formulations have a rheological behavior, which do
not allow spin-coating for spreading them on wafers, and a
scraper has been used for the deposition of the layers of composite resist on the wafer.
The SU8-silver composite structures have been manufactured by the UV-LIGA process. Once the photosensitive composite material is spread on the surface of a wafer, a pre-ex-
Fig. 10. Test structures in composite: a 5 mm diameter wheel.
ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9
(b)
Fig. 11. SEM images of 8 lm thick structures containing 10 vol.% of silver powder
(resolution test).
posure bake of a few minutes on a hotplate at 95 C is started
to evaporate the solvent. The polymerization is begun by a
UV exposure, done through a mask with a Karl Suess Mask
Aligner, either in front side or backside mode. It is followed
by a post-exposure bake of 15 min on a hotplate at 95 C. The
development of the structures is done with the appropriate
developer.
Irradiation made in backside mode allows a better adherence of the final patterned composite on the substrate, but results in a loss of resolution because the mask is not in contact
with the resist. To have both a good adherence of the patterned structures on the wafer and a good resolution, the
mask can be defined directly on the substrate.[16] This is obtained by depositing a layer of 1.5 lm of amorphous silicon
on the surface of a quartz wafer. This layer is patterned by
dry etching using a photopatterned positive photoresist layer
as mask.
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The thickness of the obtained structures in SU8-silver composite was measured by a surface profiler (Alpha-Step 500,
TENCOR) and their electrical resistivity was characterized by
resistivity meter four-point measurements (FPP-5000, VEECO). Impedance spectrometry was also employed in a fourpoint configuration to characterize the electrical behavior of
the SU8-silver composite; Two LCR-meters were used alternatively to sweep a large frequency range, from 100 Hz to
10 MHz (HP4284A was used for the frequencies between
20 Hz and 1 MHz and HP 4285A for the frequencies between
75 kHz and 30 MHz).
±
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______________________
Polyamide-6/Silica
Nanocomposites**
By Monserrat García,* Javier García-Turiel,
Ben Norder, Francisco Chavez, Bart J. Kooi,
Werner E. van Zyl, Henk Verweij,
and Dave H. A. Blank
Growing research interest is focused on hybrid materials
consisting of polymers containing nanoscale inorganic fillers,[1] because of the enhanced conductivity,[2,3] improved
mechanical properties (e.g. stiffness and toughness),[4,5] and
selective separation[6] that could result. Mechanical properties
of filled polymers are mainly influenced and characterized by
degree of dispersion, amount of filler added, crystallinity,
±
[*] Dr. M. García, Prof. D. H. A. Blank
Inorganic Materials Science and MESA+ Research Institute,
Faculty of Science and Technology
University of Twente,
P.O. Box 217, 7500 AE Enschede, The Netherlands
E-mail:
[email protected]
J. García-Turiel
Van't Hoff Institute for Molecular Sciences
University of Amsterdam,
Nieuwe Achtergracht 166 ITS, 1018 WV Amsterdam, The
Netherlands
B. Norder
Faculty of Applied Sciences
University of Technology,
Julianalaan 136, 2628 BL Delft, The Netherlands
Dr. F. Chµvez
Department of Chemical Engineering
Princeton University,
NJ 08544, Princeton, USA.
Dr. B. Kooi:
Department of Applied Physics, Materials Science Group
University of Groningen
9747 AG Groningen, The Netherlands.
Dr. W. E. van Zyl
Department of Chemistry and Biochemistry
Rand Afrikaans University
P.O. Box 524, Auckland Park, 2006, South Africa
Prof. H. Verweij
Department of Materials Science and Engineering,
The Ohio State University
Columbus, OH 43210±1178, USA
[**] The author thanks Prof. M.H. Wagner and Prof. O. Manero
for their valuable feedback and Wim Vis and Tom Nijmeijer for
the sample preparation. This work was performed with financial support from the Netherlands Organization for Scientific
Research (NWO-PPM).
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2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
DOI: 10.1002/adem.200400059
ADVANCED ENGINEERING MATERIALS 2004, 6, No. 9