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Summary
| Description | The subject of this image is a silicon integrated circuit wafer in the region between two circuit die. The five pink and blue iregularly-shaped rectangles in the image are areas of photoresist that should have been fully developed and rinsed away (purple) but in fact was not - because of a defect in processing. The height of this photoresist is highlighted by the Nomarski Differential Interference Contrast microscopy (DIC). From knowledge of other geometries of the subject, it can be determined that the purple centers of the iregularly-shaped rectangles are in fact lower than the edges. |
| Date | |
| Source | Own work |
| Author | Richstraka |
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 22:10, 27 September 2009 | | 2,124 × 1,620 (536 KB) | Richstraka~commonswiki | {{Information |Description=The subject of this image is a silicon integrated circuit wafer in the region between two circuit die. The five pink and blue iregularly-shaped rectangles in the image are areas of photoresist that should have been fully etched |
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